C08F220/30

(METH)ACRYLATE ADHESIVE COMPOSITION
20230123272 · 2023-04-20 · ·

The disclosure relates to a (meth)acrylate adhesive composition comprising a (meth)acrylate polymer, a cross-linking agent and a reactive siloxane copolymer with the acid value of the (meth)acrylate polymer is between 0 and 15 mgKOH/g, and the reactive siloxane copolymer derived from the copolymerization of a silane compound represented by the formula: X—R.sup.1—SiR.sup.2.sub.3-a(OR.sup.3).sub.a (I), a non-hydroxyl acrylate monomer containing C.sub.1-C.sub.4 alkyl group and a hydroxyl (meth)acrylate monomer, wherein the use amount of the reactive siloxane copolymer is between 0.1 parts to 6 parts by weight per hundred parts by weight of the (meth)acrylate polymer, wherein X is an acryl group or a (methyl)acryloxy group, R.sup.1 is a C.sub.1-C.sub.4 alkyl group or alkoxy group, R.sup.2 and R.sup.3 respectively are C.sub.1-C.sub.4 alkyl group, and a is an integer between 1 to 3. The present (meth)acrylate adhesive composition can provide an enhanced adhesion and weather resistance, also an enhanced stability over time and storage stability, when be used in polarizer bonding, can show a satisfied adhesion reliability and a proper rework ability.

CURABLE COMPOSITION AND STEREOLITHOGRAPHIC RESIN COMPOSITION COMPRISING SAME
20220325025 · 2022-10-13 · ·

To provide a curable composition that is readily modeled with low viscosity and excellent curing capability in modeling by stereolithography, and provides a cured article excellent in toughness and water resistance, and a resin composition for stereolithography prepared therefrom. To provide a resin composition for stereolithography that is favorable particularly for a dental mouthpiece and a denture base material. A curable composition containing 79.0 to 99.0% by mass of a polymerizable monomer (a), 0.1 to 10.0% by mass of a photopolymerization initiator (b), and 0.01 to 20.0% by mass of a compound represented by the following general formula (I) as a polyfunctional polymerizable compound (c):

##STR00001##

wherein R.sup.1 and R.sup.2 each independently represent at least one kind selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an aryl group, and an aralkyl group; R.sup.3 represents at least one kind of a polymerizable functional group selected from the group consisting of a (meth)acryloyl group, a 4-vinylphenyl group, and an alkenyl group having 2 to 5 carbon atoms; and n represents an arbitrary integer of 0 to 5.

CURABLE INK COMPOSITION, CURED PRODUCT AND NANOCOMPOSITE

A curable ink composition capable of forming a cured product with a high refractive index and applicable to the inkjet method, a cured product of the curable ink composition, and a nanocomposite having a film composed of the cured product of the curable ink composition. The curable ink composition includes a photopolymerizable compound and metal compound nanocrystals, using a sulfide compound having specific structure and a (meth)acrylate compound (as the photopolymerizable compound, and using zirconium oxide nanocrystals as the metal compound nanocrystals.

CURABLE INK COMPOSITION, CURED PRODUCT AND NANOCOMPOSITE

A curable ink composition capable of forming a cured product with a high refractive index and applicable to the inkjet method, a cured product of the curable ink composition, and a nanocomposite having a film composed of the cured product of the curable ink composition. The curable ink composition includes a photopolymerizable compound and metal compound nanocrystals, using a sulfide compound having specific structure and a (meth)acrylate compound (as the photopolymerizable compound, and using zirconium oxide nanocrystals as the metal compound nanocrystals.

POLYMERS FOR PHOTORESIST AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME

The present disclosure relates to a polymer for photoresist and a photoresist composition including the same. The polymer for photoresist may include a polymerization unit comprising a sensitizer, and a protection group. The polymerization unit may include a structure of chemical formula 1:

##STR00001##

wherein R.sub.1 is hydrogen, a halogen element, a methyl group, a trifluoromethyl group, a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms, a substituted or unsubstituted aryl group having 6 to 18 carbon atoms, or a substituted or unsubstituted arylalkyl group having 6 to 18 carbon atoms, and n is an integer of 1 to 100,000.

THREE-DIMENSIONAL MODELING PATTERN MATERIAL, CURED PRODUCT, CUBIC MOLDED ARTICLE, AND METHOD FOR PRODUCING MOLD BY USING SAID CUBIC MOLDED ARTICLE

A three-dimensional pattern material capable of forming a cured product having excellent hardness and castability, a cured product, a cubic molded article, and a method for producing a mold by using the cubic molded article are provided. The three-dimensional modeling pattern material contains a curable resin composition containing a (meth) acrylate compound (A) represented by Structural Formula (1) and an aliphatic (meth) acrylate compound (B). The three-dimensional modeling pattern material has a content of the (meth) acrylate compound (A) of 50% by mass or more in a total mass of the (meth) acrylate compound (A) and the (meth) acrylate compound (B).

Maintenance liquid and maintenance method

There is provided a maintenance liquid, which is used in maintenance of a device equipped with a discharge head for discharging an ultraviolet ray curable-type composition containing the acyl phosphine oxide-based photopolymerization initiator toward an attachment object, including a polymerizable compound in which a saturation solubility of an acyl phosphine oxide-based photopolymerization initiator at 20° C. is equal to or greater than 5.0% by mass.

Ink, ink accommodating unit, recording method, recording device, and method of manufacturing ink

An ink contains water, a pigment, and a polymer having a structure unit represented by the following Chemical structure 1, ##STR00001## where R.sub.1 represents an organic group having at least carbon and oxygen.

Ink, ink accommodating unit, recording method, recording device, and method of manufacturing ink

An ink contains water, a pigment, and a polymer having a structure unit represented by the following Chemical structure 1, ##STR00001## where R.sub.1 represents an organic group having at least carbon and oxygen.

Light-shielding composition, cured film, color filter, light-shielding film, solid-state imaging element, and image display device

A light-shielding composition includes a light-shielding pigment, a resin, a polymerizable compound, which is a low-molecular-weight compound containing an ethylenically unsaturated group, and a polymerization initiator, in which the light-shielding pigment contains an inorganic particle, and an inorganic compound coating the inorganic particle, the inorganic particle contains one or more nitrogen-containing metal compounds selected from the group consisting of zirconium nitride, zirconium oxynitride, vanadium nitride, vanadium oxynitride, niobium nitride, and niobium oxynitride, the inorganic compound contains a silicon atom, and a contained atom number ratio of a total content of metallic atoms, which are selected from the group consisting of a zirconium atom, a vanadium atom, and a niobium atom, to a content of the silicon atom in a surface of the light-shielding pigment, as determined by X-ray photoelectron spectroscopy, is greater than 1.0.