Patent classifications
C08F220/36
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition having excellent defect suppressing properties, a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition according to an embodiment of the present invention is an actinic ray-sensitive or radiation-sensitive resin composition including a resin A having a repeating unit a1 having a group represented by any one of General Formula (1), . . . , or (6), which is a nonionic group that decomposes upon irradiation with actinic rays or radiation, and an additive B that is at least any one of an acid having an acid group having a pKa of −3.60 or more, or a salt having a structure in which a hydrogen atom of an acid group having a pKa of −3.60 or more is substituted with a cation.
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Polymerizable composition and optically anisotropic body using same
A polymerizable composition containing: a) a polymerizable compound having one or two or more polymerizable groups and satisfying formula (I): Re(450 nm)/Re(550 nm)<1.0 (I); b) at least one photopolymerization initiator selected from the group consisting of alkylphenone-based compounds, acylphosphine oxide-based compounds, and oxime ester-based compounds; and c) a polymerization inhibitor. An optically anisotropic body, a retardation film, an antireflective film, and a liquid crystal display device that are produced using the polymerizable liquid crystal composition. The polymerizable composition is excellent in solubility and has high storage stability, so that no precipitation of crystals etc. occurs. When a film-shaped polymer is produced by polymerizing the above composition, the unevenness of the surface of the coating film is small while the alignment of the liquid crystal is maintained, and high durability is obtained. Therefore, the polymerizable composition is useful.
Electrode protective layer polymer and secondary battery to which same is applied
A polymer for an electrode protective layer including a polymer (A) including a fluorine-based polymer in which a monomer unit including poly(alkylene oxide) and a monomer unit including a curable functional group (e.g., a thermocurable functional group or a photocurable functional group) are grafted on the fluorine-based polymer, and when preparing an electrode by coating an electrode active material layer using the polymer and curing (e.g., thermally curing or photocuring) the result, excellent lithium ion conductivity is obtained since lithium ion flow is not inhibited, chemical resistance for an electrolyte liquid is high, and voltage stability of a secondary battery may be enhanced by suppressing side reactions with the electrolyte liquid occurring on an electrode active material surface due to properties of a uniform and flexible protective layer.
Electrode protective layer polymer and secondary battery to which same is applied
A polymer for an electrode protective layer including a polymer (A) including a fluorine-based polymer in which a monomer unit including poly(alkylene oxide) and a monomer unit including a curable functional group (e.g., a thermocurable functional group or a photocurable functional group) are grafted on the fluorine-based polymer, and when preparing an electrode by coating an electrode active material layer using the polymer and curing (e.g., thermally curing or photocuring) the result, excellent lithium ion conductivity is obtained since lithium ion flow is not inhibited, chemical resistance for an electrolyte liquid is high, and voltage stability of a secondary battery may be enhanced by suppressing side reactions with the electrolyte liquid occurring on an electrode active material surface due to properties of a uniform and flexible protective layer.
POSITIVE TONE RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
The present invention provides a positive tone resist composition containing (A) an ionic compound and (B) a resin that has a repeating unit (b1) having an interactive group which interacts with an ionic group in the ionic compound and of which a main chain is decomposed by an irradiation with X-rays, electron beam, or extreme ultraviolet rays; a resist film formed of the positive tone resist composition; a pattern forming method; and a method for manufacturing an electronic device.
POSITIVE TONE RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
The present invention provides a positive tone resist composition containing (A) an ionic compound and (B) a resin that has a repeating unit (b1) having an interactive group which interacts with an ionic group in the ionic compound and of which a main chain is decomposed by an irradiation with X-rays, electron beam, or extreme ultraviolet rays; a resist film formed of the positive tone resist composition; a pattern forming method; and a method for manufacturing an electronic device.
Free-standing non-fouling polymers, their compositions, and related monomers
Free-standing non-fouling polymers and polymeric compositions, monomers and macromonomers for making the polymers and polymeric compositions, objects made from the polymers and polymeric compositions, and methods for making and using the polymers and polymeric compositions.
Free-standing non-fouling polymers, their compositions, and related monomers
Free-standing non-fouling polymers and polymeric compositions, monomers and macromonomers for making the polymers and polymeric compositions, objects made from the polymers and polymeric compositions, and methods for making and using the polymers and polymeric compositions.
Free-standing non-fouling polymers, their compositions, and related monomers
Free-standing non-fouling polymers and polymeric compositions, monomers and macromonomers for making the polymers and polymeric compositions, objects made from the polymers and polymeric compositions, and methods for making and using the polymers and polymeric compositions.
Self-polishing zwitterionic anti-fouling resin having main chain degradability and preparation therefor and use thereof
The present invention belongs to the technical field of marine anti-fouling materials, and discloses a self-polishing zwitterionic anti-fouling resin having a main chain degradability and the preparation therefor and the use thereof. The self-polishing zwitterionic anti-fouling resin is formed by copolymerizing the following three monomers (in the total mass of the monomers): 1% to 80% of an olefinic reactive monomer, 1% to 80% of a cycloketene acetal monomer, and 1% to 80% of a betaine type precursor. The anti-fouling resin has a main chain degradability and a side chain hydrolyzability, and the transition of a coating from being hydrophobic to being hydrophilic is achieved by the hydrolysis of a surface to produce a super-hydrophilic zwitterionic surface, in order to further enhance the anti-fouling ability of the system. The material not only overcomes the disadvantages of poor mechanical properties and poor solubility in an organic solvent of a zwitterionic material, but can also effectively control the long-term stable release of an anti-fouling agent, so as to achieve a synergistic anti-fouling effect of the anti-fouling agent and an anti-protein. The method of the present invention is simple, has a relatively low cost, and is suitable for industrial production. The material is used in the field of marine anti-fouling coatings.