C08F220/382

Positive resist composition and patterning process

A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of N-carbonylsulfonamide having an iodized aromatic ring, and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group exhibits a high sensitivity, high resolution, low edge roughness and dimensional uniformity, and forms a pattern of good profile after exposure and development.

BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR MANUFACTURING BIO-ELECTRODE

A bio-electrode composition contains (A) a silicone bonded to an ionic polymer and having a structure containing a T unit shown by the following general formula (T1): (R.sup.0SiO.sub.3/2) (T1), the structure excluding a cage-like structure. In the formula, R.sup.0 represents a linking group to the ionic polymer. The ionic polymer is a polymer containing a repeating unit having a structure selected from the group consisting of salts of ammonium, lithium, sodium, potassium, and silver formed with any of fluorosulfonic acid, fluorosulfonimide, and N-carbonyl-fluorosulfonamide. Thus, the present invention provides a bio-electrode composition capable of forming a living body contact layer for a bio-electrode which is excellent in electric conductivity, biocompatibility, stretchability, and adhesion, soft, light-weight, and manufacturable at low cost, and which prevents significant reduction in the electric conductivity even when wetted with water or dried.

BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR MANUFACTURING BIO-ELECTRODE

A bio-electrode composition contains (A) a silicone bonded to an ionic polymer and having a structure containing a T unit shown by the following general formula (T1): (R.sup.0SiO.sub.3/2) (T1), the structure excluding a cage-like structure. In the formula, R.sup.0 represents a linking group to the ionic polymer. The ionic polymer is a polymer containing a repeating unit having a structure selected from the group consisting of salts of ammonium, lithium, sodium, potassium, and silver formed with any of fluorosulfonic acid, fluorosulfonimide, and N-carbonyl-fluorosulfonamide. Thus, the present invention provides a bio-electrode composition capable of forming a living body contact layer for a bio-electrode which is excellent in electric conductivity, biocompatibility, stretchability, and adhesion, soft, light-weight, and manufacturable at low cost, and which prevents significant reduction in the electric conductivity even when wetted with water or dried.

Curable high refractive index ink compositions and articles prepared from the ink compositions

Curable ink compositions include at least one aromatic (meth)acrylate, at least one multifunctional (meth)acrylate with heteroaromatic groups, fused aromatic groups, heteroalkylene groups, or a group containing both heteroalkylene and aromatic groups, and a photoinitiator. The curable ink composition is Inkjet printable, having a viscosity of 30 centipoise or less at a temperature of from room temperature to 35° C., and is free from solvents. The ink composition, when printed and cured has a refractive index of 1.55 or greater, and is optically clear. The cured ink composition, when cured to a thickness of from 1-16 micrometers, has a surface roughness of less than or equal to 5 nanometers.

Multifunctional polymers

A negative-tone resist composition is provided that contains a free photoacid generator and a multifunctional polymer covalently bound to a photoacid-generating moiety, where the composition is substantially free of cross-linking agents. Multifunctional polymers useful in conjunction with the resist composition are also provided, as is a process for generating a resist image on a substrate using the present compositions and polymers.

Multifunctional polymers

A negative-tone resist composition is provided that contains a free photoacid generator and a multifunctional polymer covalently bound to a photoacid-generating moiety, where the composition is substantially free of cross-linking agents. Multifunctional polymers useful in conjunction with the resist composition are also provided, as is a process for generating a resist image on a substrate using the present compositions and polymers.

Low sheen paint composition with effective opacity

The present invention provides an aqueous paint composition comprising by dry weight based on total dry weight of the pigment composition, from 11% to 35% of a polymeric duller of (co)polymeric particles having an average diameter of from 1 to 20 μm, and from 25% to 70% of titanium dioxide particles; wherein from 50% to 100% of the titanium dioxide particles are encapsulated by polymer shell of (co)polymeric particles.

Low sheen paint composition with effective opacity

The present invention provides an aqueous paint composition comprising by dry weight based on total dry weight of the pigment composition, from 11% to 35% of a polymeric duller of (co)polymeric particles having an average diameter of from 1 to 20 μm, and from 25% to 70% of titanium dioxide particles; wherein from 50% to 100% of the titanium dioxide particles are encapsulated by polymer shell of (co)polymeric particles.

Resin, resist composition and method for producing resist pattern

Disclosed is a resin including a structural unit represented by formula (I) and a structural unit represented by formula (a2-A), and a resist composition: ##STR00001## wherein R.sup.1 represents a hydrogen atom or a methyl group; L.sup.1 and L.sup.2 each represent —O— or —S—; s1 represents an integer of 1 to 3; s2 represents an integer of 0 to 3; R.sup.a50 represents a hydrogen atom, a halogen atom, or an alkyl group which may have a halogen atom; R.sup.a51 represents a halogen atom, a hydroxy group, an alkyl group, an alkoxy group, an alkylcarbonyl group or the like; A.sup.a50 represents a single bond or *—X.sup.a51-(A.sup.a52-X.sup.a52).sub.nb—; A.sup.a52 represents an alkanediyl group; X.sup.a51 and X.sup.a52 each represent —O—, —CO—O— or —O—CO—; nb represents 0 or 1; and mb represents an integer of 0 to 4.

Resin, resist composition and method for producing resist pattern

Disclosed is a resin including a structural unit represented by formula (I) and a structural unit represented by formula (a2-A), and a resist composition: ##STR00001## wherein R.sup.1 represents a hydrogen atom or a methyl group; L.sup.1 and L.sup.2 each represent —O— or —S—; s1 represents an integer of 1 to 3; s2 represents an integer of 0 to 3; R.sup.a50 represents a hydrogen atom, a halogen atom, or an alkyl group which may have a halogen atom; R.sup.a51 represents a halogen atom, a hydroxy group, an alkyl group, an alkoxy group, an alkylcarbonyl group or the like; A.sup.a50 represents a single bond or *—X.sup.a51-(A.sup.a52-X.sup.a52).sub.nb—; A.sup.a52 represents an alkanediyl group; X.sup.a51 and X.sup.a52 each represent —O—, —CO—O— or —O—CO—; nb represents 0 or 1; and mb represents an integer of 0 to 4.