The present invention belongs to the technical field of marine anti-fouling materials, and discloses a self-polishing zwitterionic anti-fouling resin having a main chain degradability and the preparation therefor and the use thereof. The self-polishing zwitterionic anti-fouling resin is formed by copolymerizing the following three monomers (in the total mass of the monomers): 1% to 80% of an olefinic reactive monomer, 1% to 80% of a cycloketene acetal monomer, and 1% to 80% of a betaine type precursor. The anti-fouling resin has a main chain degradability and a side chain hydrolyzability, and the transition of a coating from being hydrophobic to being hydrophilic is achieved by the hydrolysis of a surface to produce a super-hydrophilic zwitterionic surface, in order to further enhance the anti-fouling ability of the system. The material not only overcomes the disadvantages of poor mechanical properties and poor solubility in an organic solvent of a zwitterionic material, but can also effectively control the long-term stable release of an anti-fouling agent, so as to achieve a synergistic anti-fouling effect of the anti-fouling agent and an anti-protein. The method of the present invention is simple, has a relatively low cost, and is suitable for industrial production. The material is used in the field of marine anti-fouling coatings.

A water-responsive interpenetrating polymer network, a preparation method and use thereof are provided. The water-responsive interpenetrating polymer network comprises an interpenetrating polymer network formed by a cholesteric liquid crystal polymer and a polyionic liquid; wherein the cholesteric liquid crystal polymer is formed by polymerization of a liquid crystal mixture; and the polyionic liquid contains a hydrophilic group or is a hydrophilic salt. The interpenetrating polymer network is water responsive without needs of activation with an alkaline solution, which simplifies the preparation process, and has stable water responsiveness performance after prolonged and/or repeated exposure to water. The water-responsive interpenetrating polymer network can be used to prepare light reflective coatings and reflective devices, and has higher commercial value.

A water-responsive interpenetrating polymer network, a preparation method and use thereof are provided. The water-responsive interpenetrating polymer network comprises an interpenetrating polymer network formed by a cholesteric liquid crystal polymer and a polyionic liquid; wherein the cholesteric liquid crystal polymer is formed by polymerization of a liquid crystal mixture; and the polyionic liquid contains a hydrophilic group or is a hydrophilic salt. The interpenetrating polymer network is water responsive without needs of activation with an alkaline solution, which simplifies the preparation process, and has stable water responsiveness performance after prolonged and/or repeated exposure to water. The water-responsive interpenetrating polymer network can be used to prepare light reflective coatings and reflective devices, and has higher commercial value.

A water-absorbent copolymer may include a vinyl alcohol constituent unit x and a constituent unit z other than the vinyl alcohol constituent unit x and a vinyl ester constituent unit y, wherein a ratio of a content of an average sequence of the constituent unit z to a content of the constituent unit z is 50.0 mol % or less.

A water-absorbent copolymer may include a vinyl alcohol constituent unit x and a constituent unit z other than the vinyl alcohol constituent unit x and a vinyl ester constituent unit y, wherein a ratio of a content of an average sequence of the constituent unit z to a content of the constituent unit z is 50.0 mol % or less.

The present invention relates to a chemically amplified photoresist composition including an alkali-soluble resin including a (meth)acrylate-based resin containing a (meth)acrylate-based repeating unit in which a heterocyclic compound is substituted via a divalent functional group containing an alkylene sulfide having 1 to 20 carbon atoms.

The present invention relates to a chemically amplified photoresist composition including an alkali-soluble resin including a (meth)acrylate-based resin containing a (meth)acrylate-based repeating unit in which a heterocyclic compound is substituted via a divalent functional group containing an alkylene sulfide having 1 to 20 carbon atoms.

This invention relates to a process for forming an azide-grafted polymer. The process comprises mixing a free-radical-reactive polymer with a free-radical initiator and an azide monomer that contains at least one unsaturated C═C bond capable of reacting with a radical, under solid-state grafting conditions, to form an azide-grafted polymer. The formed azide-grafted polymer can be used to prepare a long-chain branched or cross-linked polymer.

This invention relates to a process for forming an azide-grafted polymer. The process comprises mixing a free-radical-reactive polymer with a free-radical initiator and an azide monomer that contains at least one unsaturated C═C bond capable of reacting with a radical, under solid-state grafting conditions, to form an azide-grafted polymer. The formed azide-grafted polymer can be used to prepare a long-chain branched or cross-linked polymer.

The present invention pertains to composition suitable for manufacturing membranes based on vinylidene fluoride (VDF) polymers, to porous membranes thereof, to methods for their manufacture and to uses thereof, especially for the filtration of water phases. Said composition comprising vinylidene fluoride (VDF) polymers and polymer additives comprising zwitterionic moieties delivers outstanding hydrophilization performances of manufactured membranes.