Polymeric materials and methods for making the polymeric materials utilizing bisphenolic stillbottoms, lignosulfonates, or both are disclosed. In one embodiment, a polymer is provided that includes a condensate of bisphenolic stillbottoms, an optional phenolic compound independent of bisphenolic stillbottoms, an aldehyde, and a lignosulfonate compound. The condensate may further include an amino compound, a catalyst, or combinations thereof. Alternatively, the polymer may be free of a phenolic compound independent of bisphenolic stillbottoms. The polymers may be used in the manufacture of articles including composites, laminates and paper products.

Disclosed herein is a polycondensation method for preparing SH-terminated polymers having at least two terminal SH-groups and including sulfur-carbon-sulfur linkages in its polymer backbone, where the method includes a step of reacting at least at least one organic constituent a1 including at least one carbonyl group with at least one organic constituent a2 including at least two thiol groups, where the molar ratio r of constituent(s) a1 and a2 to each other is <1. Further disclosed herein are polymers obtained by the method, a 2K sealing system including such polymers in one of its components, a sealant composition obtained from the method, a method of sealing a substrate by making use of the sealant composition, and a sealed substrate obtained by the method.

The method includes mixing an aldehyde and a first solvent to form a mixture. The method further includes mixing an organosulfur phenol and an aromatic compound to the mixture to form a phenol mixture and heating the phenol mixture in the presence of an acid to form a solid. The solid is dried to obtain the cross-linked porous polymer. The obtained cross-linked porous polymer has repeat pyrrole units bonded to one another, and the cross-linked porous polymer has a thiol group which separates non-adjacent pyrrole units. The cross-linked porous polymer obtained after drying is in a form of solid particles having a spherical particle structure.

The present disclosure provides compounds, compositions, and methods for reducing or preventing fouling in an industrial processes. A compound or composition may include a methylnaphthalene sulfonate-formaldehyde polymer and/or a sulfonated dispersant. An industrial process may include, for example, a chemical manufacturing process, such as an acrylonitrile manufacturing process. The disclosure also provides methods of manufacturing the compounds and compositions disclosed herein.

A resist underlayer film forming composition exhibits excellent filling properties and planarization properties with respect to a substrate with level difference, while having high storage stability of a polymer that serves as a main component of a resist underlayer film; a resist pattern forming method uses this resist underlayer film forming composition; and a method for producing a semiconductor device using this resist underlayer film forming composition. A resist underlayer film forming composition contains (a) a thermal acid generator that is represented by formula (1), (b) a polymer that contains an aromatic ring, (c) a base B.sup.2 and (d) a solvent. In formula (1), A.sup.1 represents an optionally substituted linear, branched or cyclic, saturated or unsaturated aliphatic hydrocarbon group, or an optionally substituted aromatic ring residue. In formula (1), B.sup.1 represents a counter base; and at least one base among B.sup.1 and B.sup.2 has a higher pKa than pyridine.

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