C08G18/18

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING SYSTEM
20230010649 · 2023-01-12 ·

A method of manufacturing a semiconductor device, includes forming a sacrificial film made of a polymer having a urea bond on a substrate by supplying an amine and an isocyanate to a surface of the substrate, wherein the sacrificial film is provided in a specific region of the substrate; performing a predetermined process on the substrate on which the sacrificial film is formed; and removing the sacrificial film by heating the substrate to depolymerize the polymer, wherein a carbon bonded to a nitrogen atom contained in an isocyanate group of the isocyanate is a secondary or tertiary non-aromatic carbon.

Isocyanate trimerization catalyst for making polyisocyanurate comprising foams

A trimerization catalyst composition suitable for making a polyisocyanurate comprising (insulation) foam, said composition comprising at least a trimerization catalyst compound selected from one or more organic salts from alkoxides wherein said organic salt is selected from alkali metal, earth alkali metal, a transition metal such as Ti and/or quaternary ammonium organic salts.

Method for producing an object from a precursor, and use of a radically crosslinkable resin in an additive production method

A process for producing an object from a precursor comprises the steps of: I) depositing a free-radically crosslinked resin atop a carrier to obtain a ply of a construction material joined to the carrier which corresponds to a first selected cross section of the precursor; II) depositing a free-radically crosslinked resin atop a previously applied ply of the construction material to obtain a further ply of the construction material which corresponds to a further selected cross section of the precursor and which is joined to the previously applied ply; III) repeating step II) until the precursor is formed; IV) treating the precursor obtained after step III) under conditions sufficient to at least partially trimerize to isocyanurate groups NCO groups present in the free-radically crosslinked resin of the obtained precursor to obtain the object.

Partially coated films and packages formed from same

The present invention provides coated films and packages formed from such films. In one aspect, a partially coated film comprises (a) a film having two outer surfaces, wherein a first outer surface is provided by a film layer that comprises from 70 to 100 percent by weight of a polyolefin having a density of 0.860 to 0.965 g/cm.sup.3; and (b) a coating on the first outer surface of the film comprising polyurethane, wherein the coating covers less than 25% of the surface area of the first outer surface of the film and wherein the coated portion of the film exhibits an Elmendorf tear in at least one of the machine direction or cross direction that is at least 20% less than the Elmendorf tear of the uncoated portion in the same direction, with the Elmendorf tear being measured in accordance with ASTM D1922.

THERMOPLASTIC POLYURETHANE (TPU) FOAM PRODUCT WITH HIGH FLATNESS, AND PREPARATION METHOD AND USE THEREOF

A thermoplastic polyurethane (TPU) foam product with high flatness, and a preparation method and a use thereof are provided. The TPU foam product is prepared by processing aliphatic thermoplastic polyurethane (ATPU) beads with a melting range of 20° C. to 50° C. and a melting point of 90° C. to 160° C. by a physical gas foaming process to obtain foamed ATPU beads and heating the foamed ATPU beads with a heat source to make the foamed ATPU beads fused. The TPU foam product with high flatness has a density of 0.08 g/cm.sup.3 to 0.8 g/cm.sup.3 and a flatness value of less than 2 mm, and the flatness value is determined by a fixed-length ruler. The TPU foam product not only has high flatness such that diversified designs are allowed for a surface of the product, but also has high resilience.

RESIN COMPOSITION, RESIN FILM COMPRISING SAID RESIN COMPOSITION, AND GLASS LAMINATE INCLUDING SAID RESIN FILM

The resin composition of the present invention has a phase separation structure including a continuous phase of a thermoplastic resin A and a dispersion phase of a thermoplastic resin B, wherein the thermoplastic resin A and the thermoplastic resin B each have a glass transition temperature of −50° C. or more and 50° C. or less, an absolute value of a difference between glass transition temperatures Tg1 and Tg2, which are each in a range of −50° C. or more and 50° C. or less, is 17° C. or less, and a haze at 23° C. is less than 1.5%. The present invention can provide a resin composition excellent in transparency at low temperature, a resin film containing the resin composition, and a glass laminate including the resin film.

A METHOD FOR IMPROVING THE FLAME, SMOKE AND/OR TOXICITY RETARDANCY IN POLYISOCYANURATE / POLYURETHANE (PIR/PUR) COMPRISING MATERIALS

A polyisocyanurate and/or polyurethane (PIR/PUR) comprising material having improved Flame, Smoke and/or Toxicity (FST) retardancy is disclosed and a method for forming said PIR/PUR comprising material. The PIR/PUR material is comprising at least 0.2 wt % of compounds having a number average equivalent weight <160 g/mol and at least one non-polymerized ethylenically unsaturated moiety based on the total weight of the PIR/PUR comprising material, and optionally 0.01 wt % up to 1 wt % of one or more radical initiator compounds based on the total weight of the PIR/PUR comprising material.

A METHOD FOR IMPROVING THE FLAME, SMOKE AND/OR TOXICITY RETARDANCY IN POLYISOCYANURATE / POLYURETHANE (PIR/PUR) COMPRISING MATERIALS

A polyisocyanurate and/or polyurethane (PIR/PUR) comprising material having improved Flame, Smoke and/or Toxicity (FST) retardancy is disclosed and a method for forming said PIR/PUR comprising material. The PIR/PUR material is comprising at least 0.2 wt % of compounds having a number average equivalent weight <160 g/mol and at least one non-polymerized ethylenically unsaturated moiety based on the total weight of the PIR/PUR comprising material, and optionally 0.01 wt % up to 1 wt % of one or more radical initiator compounds based on the total weight of the PIR/PUR comprising material.

Water blocking material
11708448 · 2023-07-25 · ·

Provided is a water blocking material prepared by reacting and foaming a starting material composition that contains a polyol, a polyisocyanate, a catalyst, a foaming agent, a foam stabilizer and a crosslinking agent, in which the polyol contains a dimer acid polyol, the content of the dimer acid polyol in the starting material composition is 85% by mass or more of the entire polyol, the polyisocyanate contains a diphenylmethane diisocyanate, the content of the diphenylmethane diisocyanate in the starting material composition is 70 to 85% by mass of the entire polyisocyanate, and the foam stabilizer contains a reactive silicone. The water blocking material is excellent in heat resistance and water blocking performance and is further excellent in flexibility.

MODIFIED LIGNIN PRODUCTS FOR RIGID FOAMS
20230025729 · 2023-01-26 ·

Modified lignin products, processes for making them, and their use to produce rigid polyurethane or polyisocyanurate foams are disclosed. The processes comprise heating a lignin source with a nitrogen source and a starved concentration of a C.sub.1-C.sub.5 aldehyde to give a reaction mixture comprising a Mannich condensation product, neutralizing the reaction mixture, and isolating the modified lignin product. The process is performed at a mass ratio of lignin source to nitrogen source within the range of 1:1 to 1:5 and at a molar ratio of nitrogen source to C.sub.1-C.sub.5 aldehyde within the range of 3.5:1 to 1:1. Polyol blends and performance additives that contain the modified lignin products are described. Rigid foams that process well and incorporate up to 60 wt.%, based on the amount of polyol component, of the modified lignin contribute to excellent flame retardancy and low-temperature R-value performance.