A resin composition useful for additive manufacturing is provided, which resin composition may exhibit improved shelf life through inhibition of crystallization. Such resin composition may include a crystallization inhibitor as taught herein, and/or a prepolymer produced by reaction of an isocyanate with multiple isomers and comprising a lower percentage of the structurally symmetric isomer. Methods of forming a three-dimensional object using such resin composition are also provided.

A resin composition useful for additive manufacturing is provided, which resin composition may exhibit improved shelf life through inhibition of crystallization. Such resin composition may include a crystallization inhibitor as taught herein, and/or a prepolymer produced by reaction of an isocyanate with multiple isomers and comprising a lower percentage of the structurally symmetric isomer. Methods of forming a three-dimensional object using such resin composition are also provided.

A method of manufacturing a semiconductor device, includes forming a sacrificial film made of a polymer having a urea bond on a substrate by supplying an amine and an isocyanate to a surface of the substrate, wherein the sacrificial film is provided in a specific region of the substrate; performing a predetermined process on the substrate on which the sacrificial film is formed; and removing the sacrificial film by heating the substrate to depolymerize the polymer, wherein a carbon bonded to a nitrogen atom contained in an isocyanate group of the isocyanate is a secondary or tertiary non-aromatic carbon.

A process for producing an object from a precursor comprises the steps of: I) depositing a free-radically crosslinked resin atop a carrier to obtain a ply of a construction material joined to the carrier which corresponds to a first selected cross section of the precursor; II) depositing a free-radically crosslinked resin atop a previously applied ply of the construction material to obtain a further ply of the construction material which corresponds to a further selected cross section of the precursor and which is joined to the previously applied ply; III) repeating step II) until the precursor is formed; IV) treating the precursor obtained after step III) under conditions sufficient to at least partially trimerize to isocyanurate groups NCO groups present in the free-radically crosslinked resin of the obtained precursor to obtain the object.

A process for producing an object from a precursor comprises the steps of: I) depositing a free-radically crosslinked resin atop a carrier to obtain a ply of a construction material joined to the carrier which corresponds to a first selected cross section of the precursor; II) depositing a free-radically crosslinked resin atop a previously applied ply of the construction material to obtain a further ply of the construction material which corresponds to a further selected cross section of the precursor and which is joined to the previously applied ply; III) repeating step II) until the precursor is formed; IV) treating the precursor obtained after step III) under conditions sufficient to at least partially trimerize to isocyanurate groups NCO groups present in the free-radically crosslinked resin of the obtained precursor to obtain the object.

There are provided a carbodiimide compound excellent in storage stability, and performance as a crosslinking agent, and a method for producing the same, and a resin composition excellent in the film forming properties and solvent resistance of a coating made at low temperature. A polycarbodiimide compound derived from an aliphatic diisocyanate compound having at least one primary isocyanate group, the polycarbodiimide compound having a structure in which all ends are capped with an organic compound having a functional group that reacts with an isocyanate group, carbodiimide group concentration A (%) and weight average molecular weight Mw satisfying the following formula (1), and a resin composition comprising the carbodiimide compound and an aqueous resin having a predetermined acid value at a predetermined ratio.
(A/Mw)×1000≥0.55  (1).

There are provided a carbodiimide compound excellent in storage stability, and performance as a crosslinking agent, and a method for producing the same, and a resin composition excellent in the film forming properties and solvent resistance of a coating made at low temperature. A polycarbodiimide compound derived from an aliphatic diisocyanate compound having at least one primary isocyanate group, the polycarbodiimide compound having a structure in which all ends are capped with an organic compound having a functional group that reacts with an isocyanate group, carbodiimide group concentration A (%) and weight average molecular weight Mw satisfying the following formula (1), and a resin composition comprising the carbodiimide compound and an aqueous resin having a predetermined acid value at a predetermined ratio.
(A/Mw)×1000≥0.55  (1).

The invention relates to a crystallization stable polyester prepolymers for producing HDI- and PDI-based, solvent free two component (2K)-polyurethane- and/or polyurea coating agents.

The invention relates to a crystallization stable polyester prepolymers for producing HDI- and PDI-based, solvent free two component (2K)-polyurethane- and/or polyurea coating agents.

An adhesive includes: a urethane prepolymer (A) obtained by reacting a polyol (a) with a polyisocyanate (b) under such conditions that the molar ratio of NCO/OH is 0.5-0.9 and having a molecular-weight dispersion degree [(weight-average molecular weight (Mw))/(number-average molecular weight (Mn)); hereinafter referred to also as Mw/Mn] of 4-12; a polyfunctional polyol (B), and an isocyanate curing agent (C).