An alkylene oxide derivative represented by following formula (I):

RO-(AO).sub.a[(PO).sub.b/(EO).sub.c]H(I)

(R represents a linear or branched alkyl group having from 4 to 36 carbons; AO is an oxyalkylene group having three or four carbons, PO is an oxypropylene group, and EO is an oxyethylene group; a, b, and c are the average addition molar numbers of the oxyalkylene group, the oxypropylene group, and the oxyethylene group per molecule, respectively, and 1a40, 1b40, 1c80, and (a+b+c)20; [(PO).sub.b/(EO).sub.c] represents a polyoxyalkylene group in which b moles of PO and c moles of EO are bonded randomly, and the random rate x is 0.1x1).

Provided is a photosensitive resin composition that is, after being applied to an adherend surface, rapidly cured by photoirradiation to form a cured product having excellent light-shielding ability and adhesiveness (preferably, further having excellent reflow heat resistance). The photosensitive resin composition includes components (A), (C), and (D) and preferably further includes a component (B) as follows: (A) a cationically polymerizable compound at least including a compound containing an alicyclic epoxy group and devoid of ester bonds; (B) a hydroxyl-containing compound having a molecular weight of 500 or more; (C) a photo-cationic polymerization initiator; and (D) a light-shielding material.

An alkyloxirane derivative represented by formula (1), wherein M.sub.H and M.sub.L calculated from a gel permeation chromatogram satisfy formula (2):

Z[O-(AO)n-H]x(1)

where Z represents a residual group of a compound having 1 to 22 carbon atoms and one to six hydroxyl groups and wherein all of the hydroxyl groups are excluded from said compound; x is 1 to 6; and AO represents an oxyalkylene group having 3 carbon atoms; and n is 25 or more;

0.35M.sub.L/M.sub.H0.75(2)

where M.sub.H represents a distance between point O and intersecting point P, and M.sub.L represents a distance between point Q and intersecting point P determined from the chromatogram.

An alkyloxirane derivative represented by formula (1), wherein M.sub.H and M.sub.L calculated from a gel permeation chromatogram satisfy formula (2):

Z[O-(AO)n-H]x(1)

where Z represents a residual group of a compound having 1 to 22 carbon atoms and one to six hydroxyl groups and wherein all of the hydroxyl groups are excluded from said compound; x is 1 to 6; and AO represents an oxyalkylene group having 3 carbon atoms; and n is 25 or more;

0.35M.sub.L/M.sub.H0.75(2)

where M.sub.H represents a distance between point O and intersecting point P, and M.sub.L represents a distance between point Q and intersecting point P determined from the chromatogram.

This invention relates to a semi-batch process for the production of polyoxyalkylene polyether polyols. These polyoxyalkylene polyether polyols have hydroxyl (OH) numbers of from 112 to 400. This process comprises establishing oxyalkylation condition in a reactor in the presence of a DMC catalyst, continuously introducing alkylene oxide and a suitable starter into the reactor, and recovering an oxyalkyated polyether polyol. The oxyalkylation initially occurs at a temperature that is sufficiently high enough to avoid or prevent deactivation of the DMC catalyst, or for from 2% to 50% of the total oxide feed amount, and the oxyalkylation is then continued at a lower temperature.

This invention relates to a semi-batch process for the production of polyoxyalkylene polyether polyols. These polyoxyalkylene polyether polyols have hydroxyl (OH) numbers of from 112 to 400. This process comprises establishing oxyalkylation condition in a reactor in the presence of a DMC catalyst, continuously introducing alkylene oxide and a suitable starter into the reactor, and recovering an oxyalkyated polyether polyol. The oxyalkylation initially occurs at a temperature that is sufficiently high enough to avoid or prevent deactivation of the DMC catalyst, or for from 2% to 50% of the total oxide feed amount, and the oxyalkylation is then continued at a lower temperature.

A silicone-polyether copolymer has the formula X.sub.gY, where each X is an independently selected silicone moiety having a particular structure, Y is a linear or branched polyether moiety, and subscript g is on average more than 1. A method of preparing the silicone-polyether copolymer comprising reacting a polyether compound and an organosilicon compound in the presence of a hydrosilylation-reaction catalyst. A sealant is also disclosed, the sealant comprising the silicone-polyether copolymer and a condensation-reaction catalyst.

The present invention provides a polyrotaxane having high durability and in particular, high hydrolysis resistance, and a method for producing said polyrotaxane. The present invention provides a polyrotaxane obtained by disposing blocking groups on both ends of a pseudopolyrotaxane so that an annular molecule cannot be displaced, said pseudopolyrotaxane being obtained by forming a clathrate by piercing the opening of the cyclic molecule with a linear molecule, said polyrotaxane being characterized in that the cyclic molecule has a substituent represented by formula I (in formula I, R.sub.1 represents a group such as CH.sub.3 and CH.sub.2CH.sub.3, R.sub.2 represents H or a group such as CH.sub.3, and n is the apparent degree of polymerization of a polyalkylene oxide chain or a derivative thereof added to the cyclic molecule, the value of n being 1.1 to 10.0).

Provided herein are long circulating material free (LCMF) poloxamer compositions and uses thereof. In particular, provided are LCMF poloxamer 188 compositions and uses thereof. Also provided are supercritical fluid extraction (SFE) methods and high pressure (subcritical) methods for preparing poloxamer compositions, particularly the LCMF poloxamer compositions.

Provided herein are long circulating material free (LCMF) poloxamer compositions and uses thereof. In particular, provided are LCMF poloxamer 188 compositions and uses thereof. Also provided are supercritical fluid extraction (SFE) methods and high pressure (subcritical) methods for preparing poloxamer compositions, particularly the LCMF poloxamer compositions.