A poly(ether ketone) polymer comprising recurring units derived from the reaction of at least one aromatic dihalo-compound comprising at least one —C(O)— group and at least one diol having a general formula HO-D.sub.ol-OH wherein D.sub.ol is an aliphatic group comprising from 4 to 20 carbon atoms which comprises at least one cycloaliphatic moiety.

Aspects of the present disclosure generally describe polyarylether ketones and methods of use. In some aspects, a composition includes one or more polymers of formulae (I), (II), or (III):

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The present disclosure provides a process for producing a polymer, said process comprising polymerising a monomer system comprising a compound of formula: Ar—O—Ar—C(═O)—X—C(═O)—Ar—O—Ar in a reaction medium comprising a Lewis acid where: X is an aliphatic moiety and Ar is an aromatic moiety.

The present invention provides a gel comprising a physical network formed of polymer chain crystallites interconnected by amorphous chain segments. Functionalization of the chain segments between the crystallites forms a blocky distribution of functionality along the chain whereby the functionalities are concentrated in groups consisting of one or more functionalities, separated by non-functionalized runs of crystallizable segments of the polymer. Removal of the solvent from the gels, without reducing the gel volume, forms an aerogel.

There is disclosed a composition, suitable for use in dynamic applications at low temperature, the composition comprising a first polymeric material (A) having a repeat unit of formula

—O-Ph-O-Ph-CO-Ph-  I

wherein Ph represents a phenylene moiety; and
a second polymeric material (B) having a repeat unit of formula

(F2C—CF2)—  II

and further comprising a pigment;
wherein said composition has a melt viscosity of at least 0.50 kNsm-2. There is also disclosed an assembly or apparatus, a use and a polymeric micropellet.

The present disclosure relates to an additive manufacturing (AM) method for making a three-dimensional (3D) object, comprising a) depositing successive layers of a powdered material (M), at least partially recycled, comprising at least one poly(ether ketone ketone) (PEKK), having a phosphorus content of more than 30 ppm, as measured by Inductively Coupled Plasma Optical Emission Spectrometry (ICP-OES), and b) selectively sintering each layer prior to deposition of the subsequent layer.

A thermoplastic composition includes an aromatic poly(ketone), a poly(etherimide), and a reactive additive, wherein each component is present in a particular amount as defined herein. The thermoplastic composition can be useful in an insulating layer disposed over a conductor wire to form an electrical wire. Articles including the thermoplastic composition can be particularly useful in applications including an electrical device component, a railway vehicle component, an auto-mobile component, a marine vehicle component, a construction component, construction component, a building component, or an aircraft component.

An environment control system utilizes oxygen and humidity control devices that are coupled with an enclosure to independently control the oxygen concentration and the humidity level within the enclosure. An oxygen depletion device may be an oxygen depletion electrolyzer cell that reacts with oxygen within the cell and produces water through electrochemical reactions. A desiccating device may be g, a dehumidification electrolyzer cell, a desiccator, a membrane desiccator or a condenser. A controller may control the amount of voltage and/or current provided to the oxygen depletion electrolyzer cell and therefore the rate of oxygen reduction and may control the amount of voltage and/or current provided to the dehumidification electrolyzer cell and therefore the rate of humidity reduction. The oxygen level may be determined by the measurement of voltage and a limiting current of the oxygen depletion electrolyzer cell. The enclosure may be a food or artifact enclosure.

A photoresist underlayer composition comprising a poly(arylene ether); an additive of formula (14):

D-(L.sup.1-Ar—[X].sub.n).sub.m  (14); and

a solvent, wherein, in formula (14), D is a substituted or unsubstituted C.sub.1-60 organic group, optionally wherein D is an organic acid salt of the substituted or unsubstituted C.sub.1-60 organic group; each L.sup.1 is independently a single bond or a divalent linking group, when L.sup.1 is a single bond, D may be a substituted or unsubstituted C.sub.3-30 cycloalkyl or substituted or unsubstituted C.sub.1-20 heterocycloalkyl that is optionally fused with Ar, each Ar is independently a monocyclic or polycyclic C.sub.5-60 aromatic group, each X is independently —OR.sup.30, —SR.sup.31, or —NR.sup.32R.sup.33, m is an integer of 1 to 6, each n is independently an integer of 0 to 5, provided that a sum of all n is 2 or greater, and R.sup.30 to R.sup.33 are as provided herein.

A method of forming a pattern on a substrate, the method including: forming a photoresist underlayer over a surface of the substrate, wherein the photoresist underlayer is formed from a composition comprising a polymer and a solvent, and the photoresist underlayer has a carbon content of greater than 47 at %; subjecting the photoresist underlayer to a a metal precursor, where the metal precursor infiltrates a free volume of the photoresist underlayer; and exposing the metal precursor-treated photoresist underlayer to an oxidizing agent to provide a metallized photoresist underlayer.