A method for manufacturing 1,4-bis(4-phenoxybenzoyl)benzene, including: reacting terephthaloyl chloride with diphenyl ether in a reaction solvent and in the presence of a Lewis acid, so as to obtain a product mixture including a 1,4-bis(4-phenoxybenzoyl)benzene-Lewis acid complex; contacting the product mixture with an aqueous solution, so as to obtain an aqueous phase containing the Lewis acid and an organic phase containing 1,4-bis(4-phenoxybenzoyl)benzene; heating at least the second phase up to a maximum temperature, followed by cooling the second phase down to a separation temperature; subjecting at least the second phase to a solid/liquid separation step at the separation temperature, so as to recover solid 1,4-bis(4-phenoxybenzoyl)benzene.

Disclosed is a polymer-metal junction including a polymer composition in contact with a metal substrate, where the polymer composition comprises a polymer component including a PEEK-PEDEK copolymer having a PEEK/PEDEK mole ratio ranging from about 60/40 to about 30/70 and a melting point (Tm) greater than 320° C., and where the polymer composition includes less than 10 wt. % of a sulfur-or-carbonyl-containing solvent, based on the total weight of the polymer composition. Also disclosed are methods of making the polymer-metal junction and articles including the polymer-metal junction.

The present invention addresses the problem of providing, by a method in which an expensive manufacturing apparatus is not required, an implant material having osteoconductivity superior to that of an implant material containing an aromatic polyether ketone. The present invention pertains to: said method including immersing an aromatic polyether ketone in a strong base solution in the absence of a calcium ion, and immersing an aromatic polyether ketone, which is obtained by the immersing, in a liquid containing a phosphorus-containing compound; and an implant material obtained by said method.

The present invention relates to an amorphous polymer (P) comprising segments (S1) containing a sulfone group, segments (S2) containing a ketone group and segments (S3) containing a polyarylene group. Moreover, the present invention relates to a process for the preparation of said amorphous polymer (P), a composition comprising the amorphous polymer (P) and an article comprising the amorphous polymer (P).

A melt-processable consumable material configured as a feedstock for use in an additive manufacturing system includes a polymeric matrix comprising one or more polyaryletherketones, wherein the polymeric matrix comprises between about 10 wt % and about 50 wt % of the total weight of the feedstock. The material includes radiation shielding particles dispersed within the polymer matrix wherein the radiation shielding particles comprise between about 50 wt % and less than 90 wt % of the total weight of the feedstock.

A method for manufacturing a semiconductor substrate having a patterned group-III nitride compound layer without collapsing a formed mask pattern due to reflow or decomposition even when an etching method at a high temperature of 300° C.-700° C. is used, including the steps: forming a patterned mask layer on the substrate's group-III nitride compound layer, and etching the group-III nitride compound layer by dry etching at 300° C. or higher and 700° C. or lower using the mask pattern, to form patterned group-III nitride compound layer, wherein the patterned mask layer contains a polymer containing a unit structure of the following Formula (1): ##STR00001##
a polymer containing a unit structure of the following Formula (2):
O—Ar.sub.1  Formula (2)
a polymer containing a structural unit of the following Formula (3):
O—Ar.sub.2—O—Ar.sub.3-T-Ar.sub.4  Formula (3)
a polymer containing a combination of unit structure of Formula (2) and unit structure of Formula (3), or a crosslinked structure of the polymers.

Provided is a polyether ether ketone, comprising a repeating unit represented by the following formula (1), the polyether ether ketone having a crystallization temperature Tc of 255° C. or more, and satisfying one or both of the following conditions (A) and (B): (A) a fluorine atom content a is less than 2 mg/kg; and (B) a chlorine atom content b is 2 mg/kg or more.

##STR00001##

Described herein are PEKK polymers having improved processability and improved crystallinity. It was surprisingly found that PEKK polymers formed using a specifically adapted nucleophilic synthesis route, in which different monomers are added in to the polymerization reaction at different points during the synthesis, had lower glass transition temperatures (“Tg”) and increased crystallinities, relative to PEKK polymers formed using traditional nucleophilic synthesis routes (“traditional PEKK polymers”). Furthermore, compared with PEKK polymers synthesized using an electrophilic synthesis routes, the PEKK polymers described herein and significantly lower halogen content. The synthesis routes includes a first heating of a first monomer blend in a reaction mixture, a subsequent first addition of a second monomer blend to the reaction mixture, and a second heating of the reaction mixture subsequent to the first addition.

Disclosed are an anion exchange membrane based on an aromatic polymer functionalized with an imidazolium group, a preparation method thereof, and a vanadium redox flow battery including the membrane. The anion exchange membrane based on an aromatic polymer functionalized with an imidazolium group contains a compound represented by a following Chemical Formula 1: ##STR00001##

Compositions comprising a poly(aryl ether ketone) (PAEK) having a carbon-based nanomaterial dispersed therein, wherein the composition includes at least 1 weight percent carbon-based nanomaterial based on the total weight of the composition, products that include the compositions, and methods for making the compositions and products.