An object of the present invention is to provide a resin composition capable of suppressing surface roughness in a thin film portion and maintaining insulation reliability of a thin film portion, a cured relief pattern of the resin composition, and a method for manufacturing a semiconductor electronic component or a semiconductor equipment using the cured relief pattern. The constitution of the present invention for achieving the above-mentioned object is as follows. That is, the present invention provides a resin composition containing: (a) at least one resin selected from an alkali-soluble polyimide, an alkali-soluble polybenzoxazole, an alkali-soluble polyamide-imide, precursors thereof, and copolymers thereof; and (b) an alkali-soluble phenol resin, wherein a ratio (R.sub.b/R.sub.a) between an alkali dissolution rate (R.sub.a) of the resin (a) and an alkali dissolution rate (R.sub.b) of the resin (b) satisfies a relationship of 0.5R.sub.b/R.sub.a2.0. The present invention also provides a cured relief pattern of the resin composition, and a method for manufacturing a semiconductor electronic component or a semiconductor equipment using the cured relief pattern.

Aliphatic polyimides are synthesized by a 2:1 molar ratio reaction of an unsaturated monoanhydride or an unsaturated diacid with a diamine. Bio-derived monomers are particularly useful in the synthesis of the aliphatic polyimides.

A polymer of a polyimide precursor which includes a structural unit represented by the following general formula (7),

##STR00001##

where X.sub.1 represents a tetravalent organic group, X.sub.2 represents a divalent organic group, and R.sub.1 represents a group represented by the following general formula (2),

##STR00002##

where the dotted line represents a bonding, Y.sub.1 represents an organic group with a valency of k+1, Rs represents a group containing at least one silicon atom, k represents 1, 2 or 3, and n represents 0 or 1.

A thermally conductive type polyimide substrate is provided. The substrate comprises at least one insulating layer having a metal layer on a single side or both sides thereof. The material of the insulating layer is a thermally conductive type photosensitive resin having a thermal conductivity of 0.4 to 2, and the thermally conductive type photosensitive resin includes the following components: (a) a photosensitive polyimide, (b) an inorganic filler, and (c) a silica solution. The photosensitive polyimide accounts for 50 to 70% of a total weight of a solid composition of the thermally conductive type photosensitive resin. The inorganic filler accounts for 20-30% of the total weight of the solid composition of the thermally conductive type photosensitive resin, and has a particle size between 40 nm and 5 m. The silica solution comprises silica particles polymerized by a sol-gel process, and the silica particles have a particle size between 10 nm and 15 nm and account for 5 to 30% of the total weight of the solid composition of the thermally conductive type photosensitive resin.

A resin composition for display substrates includes the following: the resin (a): a resin containing, as a main component, a repeating unit represented by the chemical formula (1), wherein the resin contains the total of 95 mass % or more of a tetracarboxylic acid residue A, having 2 or more carbon atoms and an SP value of 15 or more and 17 or less and a diamine residue having an SP value of 11 or more and 13 or less with respect to the total of 100 mass % of A and B contained in the resin; the solvent (b): a solvent having an SP value of 7.5 or more and less than 9.5; and the solvent (c): a solvent having an SP value of 9.5 or more and 14.0 or less; ##STR00001## wherein R.sup.1 and R.sup.2 independently represent a hydrogen atom, hydrocarbon group having 1 to 10 carbon atoms, alkylsilyl group having 1 to 10 carbon atoms, alkali metal ion, ammonium ion, imidazolium ion, or pyridinium ion.

The present disclosure discloses an LED filament, comprising a plurality of LED chips; at least two electrodes, each of the at least two electrodes is connected to at least one of the plurality of LED chips; and a light conversion layer comprising a top layer and a base layer, coated on at least two sides of the at least two electrodes, and a portion of the at least two electrodes is exposed by the light conversion layer, where the top layer and the base layer are located at two sides of the plurality of LED chips, respectively, wherein the base layer comprising an organosilicon-modified polyimide, a thermal curing agent and fluorescent powders. The present disclosure further discloses an LED light bulb. The base layer of the present disclosure has superior transmittance, heat resistance and mechanical strength, and is suitable for producing a flexible LED filament.

The present invention has an object to obtain a polyimide film that has a sufficiently smooth surface without peeling even in a case where the polyimide film is a thick film and that is excellent in adhesion to an inorganic substrate. An alkoxysilane-modified polyamic acid solution of the present invention contains: an alkoxysilane-modified polyamic acid; and a surface control agent, the alkoxysilane-modified polyamic acid solution having a specific viscosity, the alkoxysilane-modified polyamic acid being obtained by reacting a polyamic acid with an alkoxysilane compound containing an amino group, and the polyamic acid being obtained by reacting a diamine with a tetracarboxylic dianhydride.

A photosensitive polyimide resin composition is provided. The resin composition comprises an infrared absorber, an epoxy, a photosensitive polyimide and a photo initiator. The infrared absorber includes pigment and has an amount of weight accounting for 5-40% of total solid weight of the photosensitive polyimide resin composition. The epoxy has an amount of weight accounting for 5-40% of total solid weight of the photosensitive polyimide resin composition. The photosensitive polyimide has the structure of formula (1):

##STR00001## wherein m, n are independently 1 to 600; X is a tetravalent organic group, and the main chain of X includes alicyclic structure; Y is a divalent organic group, and the main chain of Y includes siloxane structure; Z is a divalent organic group, and the side chain of Z includes phenolic hydroxyl group or carboxyl group. The photosensitive polyimide has an amount of weight accounting for 30-90% of total solid weight of the photosensitive polyimide resin composition. The photo initiator has an amount of weight accounting for 0.1-15% of total solid weight of the transparent photosensitive resin.

A polyimide resin containing a repeating structural unit of the following formula (1), a repeating structural unit of the following formula (2), and a repeating structural unit of the following formula (A) or a repeating structural unit of the following formula (B), a content ratio of formula (1) with respect to the total of formula (1) and formula (2) being from 40 to 70 mol %, and a content ratio of formula (A) or formula (B) with respect to the total of formula (1) and formula (2) being more than 0 mol % and 25 mol % or less: ##STR00001##
wherein R.sub.1 represents a divalent group having from 6 to 22 carbon atoms containing at least one alicyclic hydrocarbon structure; R.sub.2 represents a divalent chain aliphatic group having from 5 to 20 carbon atoms; R.sub.a represents a divalent group containing at least one aromatic ring which is bonded to a monovalent or divalent electron-attracting group; R.sub.b represents a divalent group containing SO.sub.2 or Si(R.sub.x)(R.sub.y)O wherein R.sub.x and R.sub.y each independently represent a chain aliphatic group having from 1 to 3 carbon atoms, or a phenyl group; and X.sub.1, X.sub.2, X.sub.a, and X.sub.b each independently represent a tetravalent group having from 6 to 22 carbon atoms containing at least one aromatic ring.

A poly(amide-imide) copolymer that is a reaction product of a diamine represented by Chemical Formula 1, a diamine represented by Chemical Formula 2, a dicarbonyl compound represented by Chemical Formula 3, and a tetracarboxylic acid dianhydride represented by Chemical Formula 4:

##STR00001## wherein, in Chemical Formulae 1 to 4, L.sup.1, L.sup.2, R.sup.a to R.sup.d, R.sup.2, R.sup.3, R.sup.10, R.sup.12, R.sup.13, n7 and n8, and X are the same as defined in the specification.