A composition for forming an organic film contains a polymer having a partial structure shown by the following general formula (1A) or (1B), and an organic solvent, where Ar.sub.1 and Ar2 represent a benzene ring or naphthalene ring which optionally have a substituent; X represents a single bond or methylene group; a broken line represents a bonding arm; R represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; and W.sub.1 represents a hydroxyl group, an alkyloxy group having 1 to 10 carbon atoms, or an organic group having at least one aromatic ring optionally having a substituent. A composition for forming an organic film, the composition containing a polymer with high carbon content and thermosetting property as to enable high etching resistance and excellent twisting resistance; a patterning process using the composition; and a polymer suitable for the composition for forming an organic film.

##STR00001##

A composition for forming an organic film contains a polymer having a partial structure shown by the following general formula (1A), and an organic solvent. The polymer is crosslinked by dehydrogenative coupling reaction involving hydrogen atoms located at the trityl position on the fluorene ring in each partial structure. Thus, the present invention provides: a composition for forming an organic film the composition containing such a thermosetting polymer with high carbon content as to enable high etching resistance and excellent twisting resistance; a patterning process using the composition; and a polymer suitable for the composition for forming an organic film

##STR00001##

Disclosed herein are embodiments of aryl compounds and polymers thereof that are made using methods that do not require harsh conditions or expensive reagents. The methods disclosed herein utilize precursor compounds that can be polymerized to form polycyclic aromatic hydrocarbons and polymers, such as carbon-based polymers like nanostructures (e.g., graphene or graphene-like nanoribbons).

Elastic Parylene films produced via chemical vapor deposition polymerization (CVDP) on a substrate are disclosed.

The present invention relates to polymers comprising a repeating unit of the formula[Ar.sup.3].sub.c[Ar.sup.2].sub.b[Ar.sup.1].sub.aY(R.sup.1).sub.n1 (R.sup.2).sub.n2[Ar.sup.1].sub.a[Ar.sup.2].sub.b[Ar.sup.3].sub.c (I), wherein is a bivalent heterocyclic group, or ring system, which may optionally be substituted, Ar.sup.1, Ar.sup.1Ar.sup.2, Ar.sup.2, Ar.sup.3 and Ar.sup.3 are independently of each other a C.sub.6-C.sub.24 arylen group, which can optionally be substituted, or a C.sub.2-C.sub.30 heteroarylen group, which can optionally be, Formula (1), substituted; at least one of R1 and R2 is a group of formula (II); and their use as organic semiconductor in organic devices, especially in organic photovoltaics and photodiodes, or in a device containing a diode and/or an organic field effect transistor. The polymers according to the invention can have excellent solubility in organic solvents and excellent film-forming properties. In addition, high efficiency of energy conversion, excellent field-effect mobility, good on/off current ratios and/or excellent stability can be observed, when the polymers according to the invention are used in organic field effect transistors, organic photovoltaics and photodiodes.

##STR00001##

A method of forming a void, channel and/or vascular network in a polymeric matrix comprises providing a pre-vascularized structure that includes a matrix material and a sacrificial material embedded in the matrix material in a predetermined pattern, where the matrix material comprises a monomer and the sacrificial material comprises a polymer. A region of the matrix material is activated to initiate an exothermic polymerization reaction and generate a self-propagating polymerization front. As the polymerization front propagates through the matrix material and polymerizes the monomer, heat from the exothermic reaction simultaneously degrades the sacrificial material into a gas-phase and/or liquid-phase byproduct. Thus, one or more voids or channels having the predetermined pattern are rapidly formed in the matrix material.

A light-emitting device having a high current efficiency is provided. The light-emitting device includes, in sequence, a cathode, an electron transport layer, a light-emitting layer, and an anode. The light-emitting device further optionally includes an electron injection layer between the cathode and the electron transport layer. The electron transport layer contains particles and a non-particle electron transport material. A refractive index of light n1 at a wavelength of 550 nm of a material that constitutes the particles and a refractive index of light n2 at a wavelength of 550 nm of the non-particle electron transport material satisfies the following relation: n1n20.15. The particles have a Z-average size of 110 to 300 nm as determined by dynamic light scattering.

1) Hydrocarbon-based copolymer comprising two end groups preceded by an ester function and chosen from a 2-oxo-1,3-dioxolan-4-yl (or cyclocarbonate), a dithiocyclocarbonate, an exo-vinylene cyclocarbonate and a 2-oxo-1,3-dioxolen-4-yl, the main chain of which comprises units (I) and (II)

##STR00001##

in which R.sup.0 is notably a methyl radical;

and the number-average molecular mass Mn of which is between 400 and 100 000 g/mol.

2) Process for preparing said copolymer, comprising:

(i) a step of heating a statistical bipolymer A chosen from a poly(butadiene-isoprene), a poly(butadiene-myrcene) and a poly(butadiene-farnesene); and then

(ii) a step of heating the product formed, in the presence of a chain-transfer agent.

3) Use as adhesive, as a mixture with an amine compound comprising at least two amine groups.

1) Hydrocarbon-based copolymer comprising two end groups preceded by an ether function and chosen from a 2-oxo-1,3-dioxolan-4-yl (or cyclocarbonate), a dithiocyclocarbonate, and a 2-oxo-1,3-dioxolen-4-yl, the main chain of which comprises units (I) and (II)

##STR00001##

in which R.sup.0 is notably a methyl radical;

and the number-average molecular mass Mn of which is between 400 and 100 000 g/mol.

2) Process for preparing said copolymer, comprising: (i) a step of heating a statistical bipolymer A chosen from a poly(butadiene-isoprene), a poly(butadiene-myrcene) and a poly(butadiene-farnesene); and then (ii) a step of heating the product formed, in the presence of a chain-transfer agent.

3) Use as adhesive, as a mixture with an amine compound comprising at least two amine groups.

Provided is a resin material for forming an underlayer film which is used to form a resist underlayer film used in a multi-layer resist process, the resin material including a cyclic olefin polymer (I), in which a temperature at an intersection between a storage modulus (G) curve and a loss modulus (G) curve in a solid viscoelasticity of the resin material for forming an underlayer film which is as measured under conditions of a measurement temperature range of 30 C. to 300 C., a heating rate of 3 C./min, and a frequency of 1 Hz in a nitrogen atmosphere in a shear mode using a rheometer is higher than or equal to 40 C. and lower than or equal to 200.