A polypentenamer-silica composite can include a surface-modified silica compound and a polypentenamer chain grafted onto the surface-modified silica compound. The polypentenamer has physical properties similar to natural rubber. The polypentenamer-silica composite is recyclable. As such, the polypentenamer-silica composite can be used for manufacturing recyclable tires.

The present invention relates to a polymer having a novel structure used in a process for manufacturing a semiconductor and a display; an underlayer film composition for a process for manufacturing a semiconductor and a display, including the same; and a method for manufacturing a semiconductor element by using the same. The novel polymer of the present invention has both optimized etch selection ratio and planarization properties and excellent heat resistance, and thus the underlayer film composition including the same can be used as a hard mask in a semiconductor multilayer lithography process.

A method of producing a structure containing a phase-separated structure, the method including: applying a brush composition to a substrate to form a brush layer; forming a layer containing a block copolymer on the brush layer; and phase-separating the layer containing the block copolymer, the brush composition including a resin component (A), the resin component (A) containing a polymeric compound (A1) in which a first polymer block and a second polymer block are bonded to each other through a linking group containing a substrate adhering group.

A resist composition including a compound (D0) represented by general formula (d0) and a resin component (A1) has a structural unit (a0) in which a compound represented by general formula (a0-1) has a polymerizable group within the W.sup.1 portion converted into a main chain (in formula (d0), Rd.sup.01 represents a fluorine atom or a fluorinated alkyl group; In formula (a0-1), W.sup.1 represents a polymerizable group-containing group; C.sup.t represents a tertiary carbon atom, and the -position of C.sup.t is a carbon atom which constitutes a carbon-carbon unsaturated bond; R.sup.11 represents an aromatic hydrocarbon group; or a chain hydrocarbon group; R.sup.12 and R.sup.13 each independently represents a chain hydrocarbon group, or R.sup.12 and R.sup.13 are mutually bonded to form a cyclic group).

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The present invention relates to a novel compound having an alkoxysilyl group and an active ester group, a method for preparing the same, a composition comprising the same, and a use, wherein the novel compound exhibits improved low moisture absorption and/or low dielectric properties when cured as an epoxy composition, but is not accompanied by loss of thermal expansion characteristics. Disclosed are a novel compound of formulae AF to LF having an alkoxysilyl group and an active ester group, and a method for preparing the same, a composition comprising the same, and a use of same.

A low molar mass polymeric hydrocarbon tackifier having a number average molar mass Mn of from 200 to 1,500 g/mol provides increased green tack stability over an extended period of time in rubber compounds.

A surface modified abrasive particle may include a core abrasive particle and a coating functionally connected to a surface of the core abrasive particle. The core abrasive particle may have a median particle size of at least about 0.06 microns. The coating may include a compound selected from the group consisting of dopamine, tyrosine, dihydroxyphenylalanine, norepinephrine, epinephrine, normetanephrine, 3,4-dihydroxyphenylacetic acid, tannic acid, pyrogallic acid or combinations thereof.

Provided are new bottlebrush polymers and diblock bottlebrush copolymers, which can self-assemble into structures of desired morphology (e.g., hexagonal cylindrical, gyroid). The self-assembled structures of the bottlebrush polymers and copolymers provide useful materials such as photonics (e.g., photonic crystals), functional materials, chromatography media, stimuli-responsive materials, lubricants, nanolithography, films, and coatings. In certain embodiments, the backbone repeating units of the bottlebrush polymers and copolymers have two different polymeric sidechains covalently attached to the backbone repeating unit through a branched linker, wherein one of the polymeric sidechain is a polysiloxane. Also provided are methods of preparing the bottlebrush polymers and copolymers described herein.

This invention relates to methods and compositions for preparing linear and cyclic polyolefins. More particularly, the invention relates to methods and compositions for preparing functionalized linear and cyclic polyolefins via olefin metathesis reactions. Polymer products produced via the olefin metathesis reactions of the invention may be utilized for a wide range of materials applications. The invention has utility in the fields of polymer and materials chemistry and manufacture.

A composition that enables a resist underlayer film to be formed, contains: a compound having at least one partial structure represented by formula (1); and a solvent. In the formula (1), for example, Ar.sup.1 represents a group obtained by removing (p+1) hydrogen atoms on an aromatic carbon ring from a substituted or unsubstituted arene having 6 to 30 ring atoms, or a group obtained by removing (p+1) hydrogen atoms on an aromatic heteroring from a substituted or unsubstituted heteroarene having 5 to 30 ring atoms; Ar.sup.2 represents a substituted or unsubstituted aryl group having 6 to 30 ring atoms, or a substituted or unsubstituted heteroaryl group having 5 to 30 ring atoms, and R.sup.2 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms, and R.sup.3 represents an ethynediyl group or a substituted or unsubstituted ethenediyl group. ##STR00001##