Patent classifications
C08G2261/1422
METATHESIS POLYMERIZATION METHODS
The present disclosure is directed to methods of making a polymer, including exposing a reaction mixture including a strained cyclic unsaturated monomer and an organic initiator to a stimulus to provide an activated organic initiator, whereby the activated organic initiator is effective to polymerize the strained cyclic unsaturated monomer via a 4-membered carbocyclic intermediate to provide a polymer having constitutional units derived from the strained cyclic unsaturated monomer.
MODIFIED COATING SUBSTANCES BASED ON RMA BINDERS WITH IMPROVED ADHESION ON METAL SUBSTRATES
A coating material composition includes at least one CH acidic compound A, at least one vinylogous carbonyl compound B, at least one latent base catalyst C, and at least one adhesive agent D. The at least one adhesive agent D includes at least one substituent X and at least one substituent Y. The at least one substituent X is selected to react with the at least one CH acidic compound A or with the at least one vinylogous carbonyl compound B. The at least one substituent Y is selected to physically or chemically bind to a substrate.
Tackifier for rubber compositions
A tackifier comprising a resin with repeating units of formula (I) wherein R.sup.1 is a linear or branched alkylen group with 1 to 10 carbon atoms and R.sup.2 is a linear or branched, saturated or unsaturated aliphatic hydrocarbon group with up to 20 carbon atoms and a non-aromatic compound which consists to at least 50% by weight of one or more linear or branched, saturated or unsaturated aliphatic hydrocarbon groups with at least 4 carbon atoms. ##STR00001##
Hard-mask forming composition and method for manufacturing electronic component
A hard-mask forming composition, which is used for forming a hard mask used in lithography, including a first resin and a second resin, in which an amount of carbon contained in the first resin is 85% by mass or more with respect to the total mass of all elements constituting the first resin, and the amount of carbon contained in the second resin is 70% by mass or more with respect to the total mass of all elements constituting the second resin and less than the amount of carbon contained in the first resin.
Polymer, organic layer composition, and method of forming patterns
Disclosed are a polymer including a structural unit represented by Chemical Formula 1 and a structural unit represented by Chemical Formula 2, an organic layer composition including the polymer, and a method of forming patterns using the organic layer composition. ##STR00001## The Chemical Formulae 1 and 2 are the same as defined in the specification.
RESIN COMPOSITION FOR GENERATING ALLYLPHENOL-MALEIMIDE COPOLYMER FOR ELECTRONIC COMPONENT PROTECTIVE FILM, AND ELECTRONIC COMPONENT PROTECTIVE FILM COMPRISING THIS COPOLYMER
This invention provides a resin composition for preparing an allylphenol-maleimide copolymer used for a protective film for an electronic component including: (A) an allyl group-containing phenol compound having a rigid structure; (B) an N-aromatic maleimide group-containing compound having a rigid structure; and (C) an N-aliphatic maleimide group-containing compound having a flexible structure.
Resin composition and article made therefrom
A resin composition comprises a prepolymer of crosslinking agent and benzoxazine resin and a maleimide resin. The resin composition may be used to make various articles, such as a prepreg, a resin film, a resin-coated copper, a laminate or a printed circuit board, and achieves improvements in at least one, more or all of the properties including laminate reflow shrinkage, T288 thermal resistance, ten-layer board T300 thermal resistance, dissipation factor, copper foil peeling strength, and resin filling property in open area.
Polyfluorene-based polymer-polyvinylidene fluoride graft copolymer and element including the same
Disclosed is a graft copolymer containing a polyfluorene-based polymer as a main chain and a polyvinylidene fluoride (PVDF) as a side chain, and an element including the same. The graft copolymer contains both the polyfluorene-based polymer and the PVDF, so that the graft copolymer may increase miscibility between polymers to prepare a composite having excellent performance, prepare an uniform thin film through a solution process, and be used as a single material that exhibits both piezoelectric properties and luminescence properties.
Oligomeric Materials for UV Blocking Applications and Methods Thereof
The present invention describes an oligomer for use as a UV stabiliser. In particular, the oligomer is suitable for use as a UV stabiliser in a polymer matrix. The present invention also describes a method of forming said oligomer. The method of forming said oligomer comprises a polymerising step, wherein the polymerising step comprises forming a C—C bond on the hydroxyphenyl ring of a monomer. In preferred embodiments, the oligomer is formed from polymerizing bio-derived monomer such as curcumin, its hydrogenated analogue, and an aldol condensation product of cyclic ketone and vanillin.
Alkylphenol copolymer
An alkylphenol copolymer, such as for use in a petroleum composition, is provided. The alkylphenol copolymer has at least the following repeating unit (I): ##STR00001## wherein: A is a direct bond or an alkylene; X is —C(O)O—, —OC(O)—, —C(O)N(R.sub.6)—, —N(R.sub.6)C(O)—, —C(O)—, —N(R.sub.6)—, —O—, or —S—; R.sub.6 is H or an alkyl; R.sub.1 includes a C.sub.1-C.sub.80 alkyl, a C.sub.2-C.sub.20 alkenyl, a C.sub.2-C.sub.20 alkynyl, a C.sub.3-C.sub.12 aryl, or a polyether; and n is an integer from 1 to 200. The present invention also provides a method for forming the alkylphenol copolymer containing the aforementioned repeating unit (I) as well as a method for forming a monomer for forming repeating unit (I).