The present invention provides a cation exchange resin, and a cation exchange membrane and an electrolyte membrane for a fuel cell using the same. The cation exchange resin comprises a divalent hydrophobic unit; and a divalent hydrophilic unit having divalent hydrophilic groups which are repeated via carbon-carbon bond. The divalent hydrophilic groups being composed of one aromatic ring, or being composed of a plurality of aromatic rings which are bonded to each other via a divalent hydrocarbon group, a divalent silicon-containing group, a divalent nitrogen-containing group, a divalent phosphorus-containing group, a divalent oxygen-containing group, a divalent sulfur-containing group, or carbon-carbon bond, and at least one of the aromatic rings having a cation exchange group; wherein the hydrophobic unit and the hydrophilic unit are bonded to each other via carbon-carbon bond.

Provided is a heat-curable resin composition having an excellent workability, and capable of yielding a cured product having both a heat resistance and a low water-absorption property. The heat-curable resin composition contains: (A) a cyanate ester compound having in one molecule at least two cyanato groups, and having a cyanate ester group equivalent of 50 to 140; (B) a cyanate ester compound having in one molecule at least two cyanato groups, and having a cyanate ester group equivalent of 150 to 500; and (C) a curing accelerator,
in which the cyanate ester compound (A) is in an amount of 20 to 85% by mass per a total of 100% by mass of the components (A) and (B), and the cyanate ester compound (B) is in an amount of 15 to 80% by mass per the total of 100% by mass of the components (A) and (B).

A molded nanoparticle phosphor for light emitting applications is fabricated by converting a suspension of nanoparticles in a matrix material precursor into a molded nanoparticle phosphor. The matrix material can be any material in which the nanoparticles are dispersible and which is moldable. The molded nanoparticle phosphor can be formed from the matrix material precursor/nanoparticle suspension using any molding technique, such as polymerization molding, contact molding, extrusion molding, injection molding, for example. Once molded, the molded nanoparticle phosphor can be coated with a gas barrier material, for example, a polymer, metal oxide, metal nitride or a glass. The barrier-coated molded nanoparticle phosphor can be utilized in a light-emitting device, such as an LED. For example, the phosphor can be incorporated into the packaging of a standard solid state LED and used to down-convert a portion of the emission of the solid state LED emitter.

The present application relates to a polymer containing at least one structural unit of a formula (I) and at least one further structural unit selected from structural units A, B and C. The present application further relates to the use of the polymer in an electronic device and to a process for preparing the polymer. The present application further relates to an electronic device comprising the polymer.

A resist underlayer film-forming composition for lithography process having characteristics of enabling wafer surface planarization after film formation, excellent planarization performance on substrate with level difference, and good embeddability in fine hole pattern. The resist underlayer film-forming composition including polymer having unit structure of Formula (1) and solvent, ##STR00001##
wherein each of R.sup.1 to R.sup.4 is independently hydrogen atom or methyl group, and X.sup.1 is divalent organic group having at least one arylene group optionally substituted by alkyl group, amino group, or hydroxyl group, and wherein X.sup.1 in Formula (1) is organic group of Formula (2), ##STR00002##
wherein A.sup.1 is phenylene group or naphthylene group, A.sup.2 is phenylene group, naphthylene group, or organic group of Formula (3), and dotted line is bond, and ##STR00003##
wherein each of A.sup.3 and A.sup.4 is independently phenylene group or naphthylene group, and dotted line is bond.

Provided is a hard mask composition having high etching resistance suitable for use in a semiconductor lithography process, and particularly to a spin-on hard mask composition including a dibenzo carbazole polymer and to a patterning method of forming a hard mask layer by applying the composition on an etching layer through spin coating and performing a baking process. The hard mask according to the present invention has effects of exhibiting high solubility and superior mechanical properties, as well as high etching resistance to withstand multiple etching processes.

Polymeric reaction products of certain aromatic alcohols with certain diaryl-substituted aliphatic alcohols are useful as underlayers in semiconductor manufacturing processes.

A surface protective film comprising a base film and a resin film thereon can be bonded to a substrate having a circuit-forming surface and separated therefrom after processing. The resin film is formed of a resin composition comprising (A) a silphenylene-siloxane skeleton-containing resin, (B) a compound capable of reacting with an epoxy group in the resin to form a crosslinked structure, (C) a curing catalyst, and (D) a parting agent.

A composition for resist underlayer film formation contains a compound having a group represented by formula (1), and a solvent. R.sup.1 represents an organic group having 2 to 10 carbon atoms and having a valency of (m+n), wherein the carbon atoms include two carbon atoms that are adjacent to each other, with a hydroxy group or an alkoxy group bonding to one of the two carbon atoms, and with a hydrogen atom bonding to another of the two carbon atoms; L.sup.1 represents an ethynediyl group or a substituted or unsubstituted ethenediyl group; R.sup.2 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; n is an integer of 1 to 3; * denotes a bonding site to a moiety other than the group represented by the formula (1) in the compound; and m is an integer of 1 to 3.

##STR00001##

A method is directed to synthesis of poly(triphenylacrylonitrite)s (PTPANs) comprising polycoupling dibromoarenes, internal diynes, and potassium ferrocyanide, resulting in polycoupled dibromoarenes, internal diynes, and potassium ferrocyanide; and producing poly(triphenylacrylonitrite)s (PTPANs) by catalysis of the polycoupled dibromoarenes, internal diynes, and potassium ferrocyanide with palladium acetate and sodium bicarbonate, wherein the catalysis is allowed to proceed in dimethylacetamide under nitrogen at a prescribed temperature for a prescribed time. Further, poly(triphenylacrylonitrite)s (PTPANs) is a polymer and comprises a backbone structure of

##STR00001##

wherein x and y are integers;
wherein each R is independently selected from the group consisting of

##STR00002##

and
wherein each R is independently selected from the group consisting of

##STR00003##