Patent classifications
C09D133/064
EMULSION POLYMER AND PROCESS FOR PREPARING THE SAME
An emulsion polymer comprising: (a) structural units of a specific polymerizable surfactant, (b) structural units of an ethylenically unsaturated anionic monomer, and (c) structural units of an ethylenically unsaturated nonionic monomer; wherein polymer segments of the emulsion polymer that comprise structural units of the ethylenically unsaturated anionic monomer and structural units of the ethylenically unsaturated nonionic monomer together have specific Hansen solubility parameters. An aqueous coating composition comprising such emulsion polymer provides good early water blister resistance.
Aqueous dispersion of multistage polymer particles
The present invention relates to a composition comprising an aqueous dispersion of multistage polymer particles comprising a first and a second phase, wherein the first phase comprises structural units of a carboxylic acid monomer or a salt thereof, and a nonionic ethylenically unsaturated monomer; and wherein the second phase comprises a first and second polymer, wherein the first phase or the second phase first polymer or both comprise structural units of a high T.sub.g hydrophobic monomer; and wherein the second phase second polymer comprises at least 80 percent structural units of styrene. The high T.sub.g hydrophobic monomer is defined as being one or more of the following monomers: cyclohexyl methacrylate, isobornyl methacrylate, 4-t-butyl methacrylate, t-butylstyrene, or n-butyl methacrylate. The multistage polymer particles are useful as opaque polymers, which are used in pigmented coating formulations to reduce the load of TiO.sub.2. The particles exhibit excellent collapse resistance and unusually low dry bulk density, and do not require acrylonitrile to achieve this desired combination of properties.
LATEX COMPOSITION CONTAINING AN AMINOSILANE AND AN ANION EXCHANGE RESIN
The present invention relates to a composition comprising an aqueous dispersion of polymer particles; b) anion exchange resin particles; and c) an aminosilane. The composition achieves a more desirable balance of stain blocking and stain removal properties in pigmented coating formulations over compositions that contain the latex and the aminosilane but no anion exchange resin, or the latex and the ion exchange resin but no aminosilane.
SEMICARBAZIDE COMPOSITION, WATER-BASED COATING COMPOSITION, COATING FILM, ARTICLE, AND METHOD FOR PRODUCING SEMICARBAZIDE COMPOSITION
A semicarbazide composition contains a semicarbazide compound (A1) derived from a hydrazine and an isocyanate compound (a1) having an isocyanate group, and a semicarbazide compound (B1) derived from a hydrazine and an isocyanate compound (b1) having an isocyanate group and having a different structure from the isocyanate compound (a1), wherein the absolute value of the difference in the solubility parameters of the isocyanate compound (a1) and the isocyanate compound (b1) is at least 0.15 but not more than 2.10. A method for producing a semicarbazide composition includes, in sequence, a step 2-1 of reacting a hydrazine and an isocyanate compound (a2) having at least one cyclic structure within the molecule to obtain a semicarbazide compound (A2), and a step 2-2 of reacting a hydrazine and an isocyanate compound (b2) not having a cyclic structure within the molecule to obtain a semicarbazide compound (B2).
Resist composition and patterning process
A resist composition comprising a quencher containing a nitroxyl radical having an iodized aliphatic hydrocarbyl group is provided. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.
METHOD FOR RECYCLING BATTERY ELECTRODES
Provided is a method for recycling a battery electrode by immersing the electrode into a delamination solution and subsequently precipitating a polymeric binder with the addition of a precipitation agent; wherein the electrode comprises a current collector and an electrode layer material coated on one side or both sides of the current collector; wherein the electrode layer material comprises a polymeric binder; and wherein the polymeric binder comprises a copolymer comprising a structural unit derived from an acid group-containing monomer and a structural unit derived from a hydrogen bond-forming group-containing monomer (ii). The method disclosed herein circumvents complex separation process, corrosion of current collector and contamination of polymeric binder, enables excellent materials recovery and allows the recycling of battery electrode to be achieved in a highly efficient manner.
PROCESS OF COATING WOOD
The present invention relates to a process of coating wood with at least two waterbased coating compositions the process comprising: a) applying a coating composition A comprising at least one anionic polymer A with a Hansch parameter ≤1.6, and drying or allowing to dry said aqueous coating composition A, b) applying a coating composition B comprising at least one anionic polymer B with a Hansch parameter ≥1.7 and pigment, and drying or allowing to dry said aqueous coating composition B, with the proviso that the difference of the Hansch Parameters of anionic polymer B and anionic polymer A is at least 0.5. The invention also relates to wood coated accordingly, and the use of a coating composition A, comprising an aqueous anionic polymer A with a Hansch parameter ≤1.6, as an undercoat for coating wood.
Aqueous water barrier coatings
Described herein is a multi-phase polymer binder including an aqueous polymer dispersion, an optional hydrophobic emulsion, and an optional surfactant. The polymer binder, when dried, provides a water uptake of less than about 5 g/m.sup.2/20 min, a seal strength of at least about 200 Newton/meter (N/m) as measured at 25° C. or at 90° C., and sufficient block resistance to impart no substrate damage.
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMER, AND COMPOUND
A radiation-sensitive resin composition includes: a first polymer including a structural unit including an acid-labile group; a second polymer including a structural unit represented by formula (1); and a radiation-sensitive acid generator. In the formula (1), A represents an oxygen atom or a sulfur atom; a sum of m and n is 2 or 3, wherein m is 1 or 2, and n is 1 or 2; X represents a single bond or a divalent organic group having 1 to 20 carbon atoms; and R.sup.1 represents a monovalent organic group including a fluorine atom.
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RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMER, AND COMPOUND
A radiation-sensitive resin composition includes: a first polymer including a structural unit including an acid-labile group; a second polymer including a structural unit represented by formula (1); and a radiation-sensitive acid generator. In the formula (1), A represents an oxygen atom or a sulfur atom; a sum of m and n is 2 or 3, wherein m is 1 or 2, and n is 1 or 2; X represents a single bond or a divalent organic group having 1 to 20 carbon atoms; and R.sup.1 represents a monovalent organic group including a fluorine atom.
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