C11D3/2079

CLEANING COMPOSITIONS INCLUDING NUCLEASE ENZYME AND TANNINS

Cleaning compositions that include a nuclease enzyme and tannins. Methods of making and using such cleaning compositions. Use of tannins.

CLEANING COMPOSITIONS HAVING AN ENZYME SYSTEM

Cleaning compositions having an enzyme system, where the enzyme system includes a nuclease enzyme, an extracellular-polymer-degrading enzyme, and a cleaning adjunct. Methods of making and using such cleaning compositions. Use of an extracellular-polymer-degrading enzyme.

Aqueous Rinse Aid Composition Free of Poloxamer Type Surfactants
20170355928 · 2017-12-14 ·

An aqueous rinse aid solution for use in a dishwashing machine wherein the solution is substantially free of poloxamer type surfactants and wherein the solution produces water sheeting and spot-free dishware drying, the solution consists of food additives permitted for direct addition to food for human consumption and water.

Method for producing a washing agent with improved optical and rheological properties

A method for producing a liquid, surfactant-containing washing agent containing: i) 20 to 80 wt. % surfactant; ii) 2 to 15 wt. % fatty acid; iii) 0.3 to 8 wt. % of salt of a divalent cation; iv) 8 to 35 wt. % solvent; the method including the steps of: a) providing a first flowable washing agent preparation containing a surfactant, fatty acid and solvent; b) introducing the salt of a divalent cation into the liquid composition so as to form a salt-containing composition; c) mixing the salt-containing composition.

Post Chemical Mechanical Planarization (CMP) Cleaning
20230183611 · 2023-06-15 ·

Provided are formulations that offer a high cleaning effect on inorganic particles, organic residues, chemical residues, reaction products on the surface due to interaction of the wafer surface with the Chemical Mechanical Planarization (CMP) slurry and elevated levels of undesirable metals on the surface left on the semiconductor devices after the CMP. The post-CMP cleaning formulations comprise one or more organic acid, one or more polymer and a fluoride compound with pH<7 and optionally a surfactant with two sulfonic acid groups.

Liquid detergent composition

A detergent composition having a) from about 1% to about 60%, by weight of the composition, of a surfactant system wherein said surfactant system comprises: i) at least 35%, by weight of the surfactant system, of nonionic surfactant and ii) from 5% to about 20%, by weight of the surfactant system, of amine oxide. The detergent composition having greater than 3% of fatty acid.

METHODS AND COMPOSITIONS FOR PURIFYING ADENO ASSOCIATED VIRUS PARTICLES OR ADENOVIRUSES

The present invention relates to compositions and methods for lysing cells and isolating and/or purifying adeno-associated virus particles or adenovirus particles using a detergent selected from the group of alkyldimethylamine oxides.

Organic Acid Cleaning, Disinfecting and Sanitizing Wet Wipe Composition
20230183615 · 2023-06-15 ·

A disinfecting, sanitizing and cleaning composition is a formulation that is safe for use on food contact surfaces without the need for any post-application water rinse. In one exemplary embodiment, the cleaning and disinfecting composition eliminates the need for the post-application water rinse by using only components that are considered Food Safe by the EPA. In another exemplary embodiment, the cleaning and disinfecting composition the includes citric acid, but without any anionic surfactants in the cleaning and disinfecting composition. In still another exemplary embodiment of the disclosure, the cleaning and disinfecting composition includes a second organic acid and one or more nonionic surfactants as components along with citric acid to provide unexpected and beneficial antimicrobial properties to the cleaning and disinfecting composition.

Cleaning formulations for removing residues on surfaces

This disclosure relates to a cleaning composition that contains 1) at least one chelating agent, the chelating agent being a polyaminopolycarboxylic acid; 2) at least one organic solvent selected from the group consisting of water soluble alcohols, water soluble ketones, water soluble esters, and water soluble ethers; 3) at least one monocarboxylic acid containing a primary or secondary amino group and at least one additional basic group containing nitrogen; 4) at least one metal corrosion inhibitor, the metal corrosion inhibitor being a substituted or unsubstituted benzotriazole; and 5) water. This disclosure also relates to a method of using the above composition for cleaning a semiconductor substrate.

PRODUCTS FOR THE PREVENTIVE TREATMENT OF STAINLESS STEEL AND RELATED METHODS
20170342570 · 2017-11-30 · ·

Provided herein is a reductive solution for preventing rouge formation on stainless steel, said solution comprising complexing anions, Fe.sup.2+, and, optionally, one or more pH modifiers. Further provided are methods for manufacturing said solution, methods for prevention of rouge formation on stainless steel surfaces, and related uses of the aforementioned reductive solution.