A disinfecting, sanitizing and cleaning composition is a formulation that is safe for use on food contact surfaces without the need for any post-application water rinse. In one exemplary embodiment, the cleaning and disinfecting composition eliminates the need for the post-application water rinse by using only components that are considered Food Safe by the EPA. In another exemplary embodiment, the cleaning and disinfecting composition the includes citric acid, but without any anionic surfactants in the cleaning and disinfecting composition. In still another exemplary embodiment of the disclosure, the cleaning and disinfecting composition includes a second organic acid and one or more nonionic surfactants as components along with citric acid to provide unexpected and beneficial antimicrobial properties to the cleaning and disinfecting composition.

This disclosure relates to a cleaning composition that contains 1) at least one chelating agent, the chelating agent being a polyaminopolycarboxylic acid; 2) at least one organic solvent selected from the group consisting of water soluble alcohols, water soluble ketones, water soluble esters, and water soluble ethers; 3) at least one monocarboxylic acid containing a primary or secondary amino group and at least one additional basic group containing nitrogen; 4) at least one metal corrosion inhibitor, the metal corrosion inhibitor being a substituted or unsubstituted benzotriazole; and 5) water. This disclosure also relates to a method of using the above composition for cleaning a semiconductor substrate.

A shaped detergent product comprising 10 to 100 wt. % of a first solid phase and 0 to 90 wt. % of one or more other phases, wherein the first solid phase comprises: a) non-crystalline chiral aminopolycarboxylate; b) non-crystalline organic acid other than component a); c) at most 30 wt. % water; d) at most 50 wt. % of non-crystalline water-soluble component other than component a) or component b); e) at most 20 wt. % of homogeneously dispersed crystalline material; wherein the combination of the components a), b) and c) is present in the first solid phase in a concentration of at least 35 wt. % of the total weight of the solid phase; and wherein components a), b) and c) are present in the solid phase in a ratio of from 25 to 88 parts by weight of free acid equivalent of component a): from 10 to 60 parts by weight of free acid equivalent of component b): from 2 to 30 parts by weight of component c); and wherein the shaped detergent product comprises at least 0.5 wt. % surfactant.

Solid rinsing, cleaning and/or sanitizing compositions for various applications are provided. In particular, solid compositions include a complex of urea and an acid having desirable storage stability previously unavailable in solid urea/acid compositions. Stable solid compositions are disclosed and methods of making the same to overcome conventional limitations associated with with forming kinetically and thermodynamically stable solids that utilize urea/acid compositions.

This disclosure relates to compositions containing 1) at least one water soluble polar aprotic organic solvent; 2) at least one quaternary ammonium hydroxide; 3) at least one compound comprising at least three hydroxyl groups; 4) at least one carboxylic acid; 5) at least one Group II metal cation; 6) at least one copper corrosion inhibitor selected from the group consisting of 6-substituted-2,4-diamino-1,3,5-triazines; and 7) water. The compositions can effectively strip positive or negative-tone resists or resist residues, and be non-corrosive to bumps and underlying metallization materials (such as SnAg, CuNiSn, CuCoCu, CoSn, Ni, Cu, Al, W, Sn, Co, and the like) on a semiconductor substrate.

The invention is related to a contact lens care solution comprising a buffer solution, a chelating agent, a surfactant and a wetting agent, wherein the wetting agent comprises 100 parts by weight of glycerol, 0.5 to 40 parts by weight of vinylacetamide-containing polymer and 5 to 40 parts by weight of alginic acid.

Aqueous hard surface cleaners and concentrates are disclosed. In one aspect, the cleaners comprise water, a monounsaturated C.sub.8-C.sub.14 fatty N,N-dialkylamide, and at least one anionic, cationic, nonionic, or amphoteric surfactant. The cleaners have a pH within the range of 6.0 to 9.0. Dilutable hard surface cleaner concentrates comprising the monounsaturated N,N-dialkylamide and a surfactant are also disclosed. Also included are aqueous hard surface cleaners which comprise a monounsaturated N,N-dialkylamide, and which by measure of ASTM D4488-95 A5 soil, provide superior percent cleaning at a pH less than 10 than they do at pH 10 and higher. Surprisingly, when a monounsaturated C.sub.8-C.sub.14 fatty N,N-dialkylamide is included in the aqueous hard surface cleaner or concentrate, rapid and thorough cleaning performance can be achieved even at relatively neutral pH. Consequently, the hard surface cleaners are effective on greasy soils, including baked-on soils, despite their low alkalinity.

Aqueous solution containing in the range of from 60.5 to 75% by weight of a mixture of trialkalimetal salts of the L- and D-enantiomers of methyl glycine diacetic acid (MGDA), said mixture containing predominantly the respective L-isomer with an enantiomeric excess (ee) in the range of from 3 to 97%, wherein said trialkali metal salts have the general formula (I) [CH.sub.3—CH(COO)—N(CH.sub.2—COO).sub.2]K.sub.3-xNa.sub.x (I) wherein x is in the range of from zero to 2.9.

A fabric conditioner composition comprising: a. fabric softening active; b. a short chain (C1 to C6), unsaturated, organic acid or salt thereof having at least two carboxyl groups; and c. perfume composition.

The invention relates to compositions and methods that are useful in etching a metal surface. In particular, the invention relates to novel acid compositions and methods of using such compositions in etching a metal surface, preferably an aluminum surface prior to anodizing to dissolve impurities, imperfections, scale, and oxide. The compositions are effective in maintaining their etching capacity and in removing smut produced by the etching of a surface as well as in general cleaning.