The invention provides a detergent composition for the non-oxidative laundering of fabric stains, the composition comprising: (a) from 0.1 to 10% (by weight based on the total weight of the composition) of N,N′-bis(2-hydroxybenzyl)-ethylenediamine-N,N′-diacetic acid (HBED) and/or salts thereof, and (b) from 3 to 80% (by weight based on the total weight of the composition) of one or more detersive surfactants.

An automatic dishwashing composition is provided including a maleic acid/olefin copolymer; a dispersant polymer, comprising a copolymer of acrylic acid and a sulfonated monomer; a builder; and a surfactant of formula I:

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wherein R.sup.1 is a linear or branched, saturated C.sub.8-24 alkyl group; R.sup.2 is a linear saturated C.sub.2-8 alkyl group; m is 26 to 42; n is 4 to 12; m+n is 30 to 54; wherein the fatty alcohol alkoxylate of formula I has an average ethyleneoxy unit concentration per molecule, X, of >45 wt %; and, wherein the fatty alcohol alkoxylate of formula I has ratio, Z, equal to average ethyleneoxy unit concentration per molecule, X, divided by n; wherein ratio, Z, is <9.5. Also provided is a method of cleaning articles in an automatic dishwashing machine while maintaining cleanliness of the automatic dishwashing machine.

A phosphate-free automatic dishwashing cleaning composition having from about 20% to about 50% by weight of the composition of a complexing agent selected from the group consisting of methyl glycine diacetic acid, its salts and derivatives thereof citric acid, its salts and derivatives thereof, glutamic-N,N-diacetic acid, its salts and derivatives thereof, iminodisuccinic acid, its salts and derivatives thereof, carboxy methyl inulin, its salts and derivatives thereof, aspartic acid-N,N-diacetic acid, its salts and derivatives thereof, and mixtures thereof; and an amphiphilic graft polymer based on water-soluble polyalkylene oxides as a graft base and side chains formed by polymerization of a vinyl ester component, wherein said amphiphilic graft polymer is water-soluble or water-dispersible and has a weight average molar mass (Mw) of from about 3,000 to about 100,000; and optionally a dispersant polymer.

A method for cleaning membrane is provided. The method includes, providing a membrane, introducing a thermo-sensitive ionic liquid to contact the membrane and perform a cleaning procedure to collect a cleaning solution, and layering the cleaning solution to form an aqueous layer and an ionic liquid layer at a specific temperature.

Stable, solid triamine compositions are disclosed. The pressed, cast, extruded or other solid compositions are suitable for antimicrobial, sanitizing and disinfectant applications. Ready-to-use solutions are obtained by dissolving the solid triamine compositions with water and the methods of use thereof are particularly suitable for cleaning, disinfecting, sanitizing, rinsing and/or lubricating. Beneficially, the solid triamine compositions are at least partially neutralized, allowing activity of 90% and greater of the biocidal triamine, and provide at least substantially similar or superior performance and micro efficacy to liquid formulations.

A vehicle hard surface cleaning composition is provided that includes a surfactant present from 0.1 to 8.0 total weight percent, a hydrotrope present from 0.1 to 3.0 total weight percent, a wetting agent present from 0.1 to 5.0 total weight percent, a protectant present from 0.01 to 17 total weight percent, and a diluent making up a remainder of the composition. A method of cleaning a vehicle hard surface include applying the composition thereto and washing the composition therefrom to leave a residue of graphene or graphene oxide.

The present disclosure relates to a semiconductor wafer cleaning composition for used in a semiconductor device manufacturing process and to a method of cleaning a semiconductor wafer using the cleaning composition. The cleaning composition includes surfactants represented by Formula 1 and Formula 2, respectively, an organic or inorganic acid, and water occupying for the remaining proportion. The cleaning method is a method of immersing a semiconductor wafer in the cleaning composition for 100 to 500 seconds. The cleaning composition and the cleaning method according to the present disclosure provide an incredibility improved removal rate and an effective cleaning power for contaminants, especially organic wax, during a process of polishing the surface of a wafer used to manufacture semiconductor devices, thereby providing a super-cleaned wafer surface, resulting in production of reliable semiconductor devices.

An opacified liquid detergent composition includes at least one anionic surfactant, a fatty acid, magnesium cations, calcium cations, and water. The fatty acid, magnesium cations, and calcium cations are present in the opacified liquid detergent composition in a weight ratio of from about 0.95:0.04:0.01 to about 0.88:0.11:0.01 of fatty acid to magnesium cations to calcium cations. The opacified liquid detergent composition is free of a microplastic opacifier and has a turbidity value of greater than 250 NTU measured utilizing a turbidity meter at about 24° C.

The present disclosure relates to cleaning compositions and methods of deep cleaning surfaces and textiles. The cleaning compositions may include an enzyme having hexosaminidase activity and at least one perfume component.

An in-vitro opacified and structured detergent composition includes a surfactant component present in an amount of about 7 to about 50 weight percent actives and including (1) an alcohol ethoxy sulfate having a C.sub.8-C.sub.20 backbone that is ethoxylated with from about 1 to about 10 moles of ethylene oxide, (2) at least one non-ionic surfactant comprising an alkoxylated alcohol, and (3) at least one anionic surfactant comprising a linear alkylbenzene sulfonate. The detergent composition also includes water present in a total amount of from about 30 to about 90 weight percent, free fatty acids in a total amount from about 1 to 15 weight percent, a magnesium cation in a total amount of from 0.05 to 1 weight percent, and colloidal particles such as encapsulated fragrances. The composition has a yield point value of at least 0.075 Pa at 20° C.