Provided are compositions useful for the cleaning of microelectronic device structures. The residues may include post-CMP, post-etch, post-ash residues, pad and brush debris, metal and metal oxide particles and precipitated metal organic complexes such as copper-benzotriazole complexes. Advantageously, the compositions as described herein show improved aluminum, cobalt, and copper compatibility.

Cleaning and degreasing compositions containing a diutan gum thickener are provided for removing burnt on, polymerized, carbonized food soils with minimum manual effort. The compositions are ready to use compositions and beneficially remain on a treated surface for sufficient time to permit soil penetration without drying out. The compositions can be easily removed with minimal manual effort, such as use of low pressure water applied to the treated surface, and beneficially do not leave residues. Methods for cleaning and degreasing a surface with the compositions are also provided. Thickening systems employing the diutan gum and laponite clays are also provided.

Described herein is an automatic dishwashing (ADW) composition including as component (A) at least one imidazole-based compound selected from the group consisting of unsubstituted or at least monosubstituted imidazole and benzimidazole. The automatic dishwashing composition may include further components, such as polyakylene imines (component (B)), at least one silicate (component (C)) and/or at least one chelating agent (component (D)). Also described herein is a process for cleaning dishware using said ADW composition as well as a method of using said ADW composition, for example, to reduce any corrosion on the items to be dishwashed (dishware). Also described herein is a method of using at least one imidazole-based compound according to component (A) as a corrosion inhibitor in automatic dishwashing processes.

A method of making a liquid laundry detergent formulation is provided, comprising: providing a liquid carrier; providing a cleaning surfactant; and selecting a cleaning booster of Formula (I)

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wherein x is 3 to 10; wherein y is 5 to 20; wherein z is 5 to 30; wherein x + y + z ≥ 18; wherein x ≠ z; wherein each R is a C.sub.7-9 alkyl group, wherein ≥ 75 wt% of the R groups are branched; wherein the selected cleaning booster of Formula (I) is selected based its cleaning boosting properties; providing the selected cleaning booster of Formula (I); and combining the liquid carrier, the cleaning surfactant and the selected cleaning booster of Formula (I) to provide the liquid laundry detergent formulation.

A single-step absorbent wipe for cleaning and disinfecting medical instruments includes various active ingredients as well as compounds that increase the efficacy profile of the product against various organisms, improve the buffering capacity of the formulation, enhance the antimicrobial efficacy against mycobacteria, increases the wetting and cleaning profile of the formulation, as well as adjusts the pH thereof. The disinfectant wipe provides a procedure to suitably clean and intermediate level disinfect medical instruments that are heat liable as well as non-submersible.

A process for making a particulate laundry detergent composition, the process includes the steps: (a) contacting water, starch, acid and perfume to form a concentrated aqueous acidic mixture, the concentrated acidic mixture includes: (i) from about 20 wt % to about 60 wt % starch; (ii) from about 10 wt % to about 50 wt % acid; (ii) from about 2 wt % to about 20 wt % perfume; (iv) from 10 wt % to less than about 45 wt % water; the concentrated acidic mixture has a pH of less than about 4.5; (b) subjecting the concentrated acidic mixture to a perfume emulsification step to emulsify the perfume to form an emulsified perfume mixture in fluid form; and (c) spraying the emulsified perfume mixture in fluid form onto base detergent particles so that the emulsified perfume mixture at least partially coats the base detergent particles to form the particulate laundry detergent composition, the base detergent particles includes from about 4 wt % to about 60 wt % detersive surfactant.

Acidic liquid fabric care compositions that include citric acid and/or a salt thereof, fragrance material that includes certain aldehydic perfume raw materials, and water. Related methods of using and making such compositions.

An object of the present invention is to provide a method for producing a treatment liquid, having excellent filterability.

The method for producing a treatment liquid of an embodiment of the present invention is a method for producing a treatment liquid, the method including filtering an object to be purified including a surfactant, using a first filter having a first filter medium, to produce a treatment liquid for a semiconductor substrate, in which the first filter medium includes at least one selected from the group consisting of a nylon, a polyallyl sulfonic acid, a perfluoroalkoxy alkane which has been subjected to a hydrophilization treatment, a polytetrafluoroethylene which has been subjected to a hydrophilization treatment, a polyolefin which has been subjected to a hydrophilization treatment, and a polyvinylidene fluoride which has been subjected to a hydrophilization treatment, and the surfactant includes at least one selected from the group consisting of a nonionic surfactant including a group represented by Formula (1) and an anionic surfactant including a group represented by Formula (1).

Formula (1) (LO).sub.n

L represents an alkylene group, and n represents 3 to 55.

There is provided a cleaning liquid for a semiconductor substrate, which has excellent cleaning performance with respect to a semiconductor substrate including a metal film after CMP and has a small surface roughness of a metal film after cleaning. The cleaning liquid for a semiconductor substrate according to the present invention is a cleaning liquid for a semiconductor substrate, which is used for cleaning a semiconductor substrate, including a compound represented by Formula (1), a compound represented by Formula (2), a primary amino alcohol having a primary amino group or a secondary amino group, a tertiary amine; and a solvent.

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A method of making a detergent composition including the following steps in the recited order: providing an aqueous composition comprising a citrate salt; lowering the pH by adding a first, un-neutralized or partially neutralized, polyacrylic acid having a weight average molecular weight in the range of 1000 to 6000 to form a second mixture; increasing the pH by adding alkali metal carbonate and/or alkali metal bicarbonate to form a third mixture; and adding a second polyacrylic acid having a weight average molecular weight in the range of 1000 to 6000 to form a fourth mixture; wherein the detergent composition is preferably an automatic dishwashing detergent composition or a laundry detergent composition.