C11D3/3707

SOLID COMPOSITION

The present invention relates to a solid composition comprising a matrix and one or more actives, said matrix comprising steramide or poly(vinyl alcohol) having a melting point higher than 150° C. It also relates to a cage and to a product comprising said solid composition and said cage, wherein said solid composition is contained in said cage. It further relates to a product comprising said solid composition and a porous solid support, wherein said solid composition is attached to said porous solid support. It further relates to a method for the controlled release of one or more actives in an automatic washing operation by providing said solid composition or any of the products to the machine in which said automatic washing operation is performed.

LAUNDRY DETERGENT COMPOSITION CONTAINING DYE FIXATIVE AND LINEAR ALKYLBENZENE SULFONATE
20230193158 · 2023-06-22 ·

A laundry detergent composition including a dye fixative, a nonionic surfactant system, and an anionic surfactant system including a C.sub.6-C.sub.20 linear alkylbenzene sulfonate (LAS), wherein the weight ratio of the nonionic surfactant system to the anionic surfactant system is at least 1.5. The laundry detergent composition characterized by the weight ratio of the nonionic surfactant system to the anionic surfactant system being at least 1.5 enables an effective color protection for colored fabrics.

AUTOMATIC DISHWASHING CLEANING COMPOSITION

An automatic dishwashing cleaning composition including a dispersant polymer and a surface-modification surface-substantive polymer wherein the composition leaves glass after being washed with the composition in an automatic dishwasher with a contact angle with deionised water of less than about 50° and wherein the surface-modification surface-substantive polymer has a rivulet forming effect on water drainage from glass.

CLEANING COMPOSITIONS INCLUDING NUCLEASE ENZYME AND AMINES
20170355930 · 2017-12-14 ·

Cleaning compositions that include a nuclease enzyme and an amine. Methods of making and using such cleaning compositions. Use of an amine. Use of a nuclease enzyme.

Aqueous Rinse Aid Composition Free of Poloxamer Type Surfactants
20170355928 · 2017-12-14 ·

An aqueous rinse aid solution for use in a dishwashing machine wherein the solution is substantially free of poloxamer type surfactants and wherein the solution produces water sheeting and spot-free dishware drying, the solution consists of food additives permitted for direct addition to food for human consumption and water.

Pyrithione preservative system and C1-C12 ethoxylated alcohol in solid rinse aid compositions

Solid rinse aid compositions and methods of making and using the same are disclosed. Solid rinse aid compositions include in a single concentrate composition a pyrithione preservative system to replace conventional preservatives in the isothiazolinone family, such as chloromethylisothiazolinone. Beneficially, the pyrithione preservative systems eliminate the need for any personal protective equipment to handle the solid rinse aid compositions. Methods of making and use using the rinse aids are also disclosed.

Alkaline detergent composition containing a carboxylic acid/polyalkylene oxide copolymer for hard water scale control

An alkaline detergent is described which includes the use of a copolymer in combination with an alkali metal hydroxide. The detergent maintains cleaning functions and also prevents hard water scaling, for example at application temperatures of between 145-180 degrees Fahrenheit and with a pH of 9.5 to about 13.

Laundry detergent sheet with microcapsules

A method of making a non-fibrous laundry detergent sheet can include dispensing a microcapsule onto a precursor non-fibrous laundry detergent sheet, wherein the precursor non-fibrous laundry detergent sheet can include: (a) at least one surfactant; (b) at least one film former; and (c) a thickness ranging from 0.1 mm to 10 mm.

Post Chemical Mechanical Planarization (CMP) Cleaning
20230183611 · 2023-06-15 ·

Provided are formulations that offer a high cleaning effect on inorganic particles, organic residues, chemical residues, reaction products on the surface due to interaction of the wafer surface with the Chemical Mechanical Planarization (CMP) slurry and elevated levels of undesirable metals on the surface left on the semiconductor devices after the CMP. The post-CMP cleaning formulations comprise one or more organic acid, one or more polymer and a fluoride compound with pH<7 and optionally a surfactant with two sulfonic acid groups.

Use of an oxidising alkaline gel to remove a biofilm on a surface of a solid substrate

The use of a gel consisting of a colloidal solution comprising, preferably consisting of: 5% to 30% by weight, preferably 5% to 25% by weight, more preferably 8% to 20% by weight relative to the weight of the gel, of at least one inorganic viscosifying agent; a mineral base selected from among hydroxides of alkaline metals, hydroxides of alkaline-earth metals and the mixtures thereof, said mineral base being present in a proportion of 0.05 to 10 mol/L of gel, preferably in a proportion of 0.1 to 5 mol/L of gel; an oxidizing agent stable in a basic medium selected from among permanganates, persulfates, ozone, hypochlorites and the mixtures thereof, said oxidizing agent stable in a basic medium being present in a proportion of 0.05 to 5 mol/L of gel, preferably 0.1 to 2 mol/L of gel; 0.1% to 2% by weight relative to the weight of the gel, of at least one surfactant; and a solvent; the gel not containing any super-absorbent polymer, to remove a biofilm present on a surface of a solid substrate.