C11D3/378

Method of Enhancing Performance of a Porous Evaporative Media

The method of improving an evaporative performance of a porous evaporative media in a cooling system that utilizes water evaporation for heat transfer, the method comprising contacting the porous evaporative media with a nonionic surfactant, optionally in combination with an antiscalant.

Alkaline warewash detergent composition comprising a terpolymer and methods to prevent foaming, filming and/or redeposition

Detergent compositions designed to prevent or inhibit build up of calcium carbonate while providing high cleaning performance on soils including inhibition of protein foaming, filming and redeposition on hard surfaces are disclosed. Methods of using the detergent compositions are also disclosed.

Detergent composition comprising an inverse latex combining glutamic acid, N,N-diacetic acid, tetrasodium salt as sequestrant and a polyelectrolyte comprising amps and acrylamide

Disclosed is a detergent composition (F) for domestic or industrial use including, as thickener, a self-invertible inverse latex including an aqueous phase including: a. a crosslinked anionic polyelectrolyte (P) consisting of: —at least one monomer unit derived from 2-methyl-2-[(1-oxo-2-propenyl)amino]-1-propanesulfonic acid in free acid form or partially or totally salified form; —at least one monomer unit derived from at least one monomer chosen from the elements of the group consisting of acrylamide, N,N-dimethylacrylamide, methacrylamide, N-isopropylacrylamide, N-tert-butylacrylamide; and —at least one monomer unit derived from a polyethylenic crosslinking monomer (AR), b. glutamic acid, N,N-diacetic acid, tetrasodium salt.

Disinfectant composition

A disinfectant cleaning composition, substantially free of quaternary ammonium antimicrobial actives, the composition comprising: a bispyridinium alkane antimicrobial active and a specific polymer.

COPOLYMER COMPRISING UNITS OF TYPE A DERIVING FROM CARBOXYLIC ACID MONOMERS AND UNITS OF TYPE B DERIVING FROM SULFONIC ACID MONOMERS

The present invention relates to a copolymer comprising units of type A deriving from carboxylic acid monomers and units of type B deriving from sulfonic acid monomers, said units of type A and B representing more than 80 mol % of the total moles of units in the copolymer,

characterized in that it comprises at least:

one first block formed of at least 95 mol % of units of type A and having a degree of polymerization DP.sub.1 comprised between 5 and 150; and

one second block formed of at least 95 mol % of units of type A and B with a molar ratio of units of type A to units of type B greater or equal to 1, wherein said units of type A and units of type B are statistically distributed, said second block having a degree of polymerization DP.sub.2 such that DP.sub.2/DP.sub.1≥1.

It also relates to new detergent compositions comprising such a copolymer, and to the use of this copolymer in a detergent composition, especially an ADW composition, to prevent, limit or eliminate the filming phenomena.

WATER-SOLUBLE UNIT DOSE ARTICLE INCLUDING WATER-SOLUBLE CORE CONSTRUCTION

A single unit dose article includes a water-soluble core substrate comprising a water-soluble resin. The water-soluble core substrate contains a carrier solvent with an active cleaning formulation, wherein upon contact of the carrier solvent with the water-soluble core substrate, the water-soluble core substrate exhibits shrinkage or swelling. Also disclosed are methods of making the single unit dose article.

Cleaning composition, cleaning method, and method for manufacturing semiconductor

A cleaning composition which can remove a layer of interest using a conventional apparatus, such as a coater, a baking furnace and a cleaning chamber, installed in semiconductor manufacturing equipment while preventing the damage or deformation of layers other than the layer of interest, such as a substrate and an interlayer insulation film; a cleaning method using the cleaning composition; and a method for producing a semiconductor employing the cleaning method. A layer of interest formed on a substrate is cleaned with a cleaning composition containing a component capable of decomposing the layer of interest and a film-forming polymer. An example of the layer of interest is a hard mask film. An example of the component is at least one of a basic compound and an acidic compound.

Automatic dishwashing detergent composition

An automatic dishwashing cleaning composition comprising: a) a mixed builder system comprising soluble builder and crystalline silicate wherein the soluble builder comprises a complexing agent, a phosphonate and a dispersant polymer and wherein the level of each soluble builder in the composition is: a1) from 15% to 40% by weight of the composition of the complexing agent; a2) from 2% to 7% by weight of the composition of the phosphonate; and a3) from 1% to 7% by weight of the composition of the dispersant polymer wherein the soluble builder and the crystalline silicate are in a weight ratio of from 8:1 to 15:1 b) a bleaching system comprising bleach, a bleach catalyst and a bleach activator; and c) from 0% to 20% by weight of the composition of carbonate.

AQUEOUS LIQUID HAND DISHWASHING DETERGENT FORMULATION
20220275308 · 2022-09-01 ·

Aqueous liquid hand dishwashing detergent formulation, is provided including water; an anionic surfactant; and a suds enhancing additive, wherein the suds enhancing additive is a polyacrylic acid homopolymer having a molecular weight of 1,000 to 7,500 Daltons.

Copolymer comprising units of type a deriving from carboxylic acid monomers and units of type b deriving from sulfonic acid monomers

The present invention relates to a copolymer comprising units of type A deriving from carboxylic acid monomers and units of type B deriving from sulfonic acid monomers, said units of type A and B representing more than 80 mol % of the total moles of units in the copolymer, characterized in that it comprises at least: —one first block formed of at least 95 mol % of units of type A and having a degree of polymerization DP.sub.1 comprised between 5 and 150; and —one second block formed of at least 95 mol % of units of type A and B with a molar ratio of units of type A to units of type B greater or equal to 1, wherein said units of type A and units of type B are statistically distributed, said second block having a degree of polymerization DP.sub.2 such that DP.sub.2/DP.sub.1≥1. It also relates to new detergent compositions comprising such a copolymer, and to the use of this copolymer in a detergent composition, especially an ADW composition, to prevent, limit or eliminate the filming phenomena.