A cleaning composition which can remove a layer of interest using a conventional apparatus, such as a coater, a baking furnace and a cleaning chamber, installed in semiconductor manufacturing equipment while preventing the damage or deformation of layers other than the layer of interest, such as a substrate and an interlayer insulation film; a cleaning method using the cleaning composition; and a method for producing a semiconductor employing the cleaning method. A layer of interest formed on a substrate is cleaned with a cleaning composition containing a component capable of decomposing the layer of interest and a film-forming polymer. An example of the layer of interest is a hard mask film. An example of the component is at least one of a basic compound and an acidic compound.

A cleaning agent product form, having, separated from one another in a packaging unit, a) a liquid phosphate-free cleaning agent preparation A, containing a1) builder; and/or b) a liquid phosphate-free cleaning agent preparation B, containing b1) at least 5 wt. % of at least one cleaning-active enzyme preparation, and c) optionally a liquid cleaning agent preparation C, containing c1) an acidifying agent, c2) a glass corrosion inhibitor, wherein a mechanism for storing active ingredient composition is located in and/or on the packaging unit, which storing mechanism includes at least one membrane and an active ingredient composition having at least one fragrance D. The cleaning agent product form being a cleaning agent reservoir for i) a dosing device integrated immovably in the interior of a dishwasher or ii) a movable dosing device positioned in the interior of a dishwasher. Further, a cleaning agent dosing system, including a) the cleaning agent product form, b) a dosing device detachably connected to the cleaning agent product form. The invention finally relates to an automatic dishwashing process using the cleaning agent product form or dosing system, the at least one fragrance D being continuously dosed into the interior of the dishwasher.

The invention provides a removal composition and process for cleaning post-chemical mechanical polishing (CMP) contaminants and ceria particles from a microelectronic device having said particles and contaminants thereon. The composition achieves highly efficacious removal of the ceria particles and CMP by-product contaminant material from the surface of the microelectronic device.

The present invention relates to copolymer formulations of poly(itaconic acid-co-2-acrylamido-2-methylpropane sulfonic acid) for dishwasher detergent compositions with a controlled amount of a second polymeric component.

A detergent composition can include a detersive surfactant and a specific polymer wherein the composition can be a fabric treatment product.

A cleaning agent, preferably a dishwashing detergent, in particular an automatic dishwashing detergent, having at least one low-water, preferably substantially water-free, gel phase, which contains at least one particular non-ionic surfactant, preferably in quantities from 0.1 to 15 wt. %, from 0.5 to 10 wt. %, in particular from 0.8 to 8.5 wt. %, particularly preferably from 1 to 7 wt. %, for example from 1.0 to 4.0 wt. %, based on the total weight of the gel phase.

Disclosed is a detergent composition (F) for domestic or industrial use including, as thickener, a self-invertible inverse latex including an aqueous phase including: a. a crosslinked anionic polyelectrolyte (P) consisting of: —at least one monomer unit derived from 2-methyl-2-[(1-oxo-2-propenyl)amino]-1-propanesulfonic acid in free acid form or partially or totally salified form; —at least one monomer unit derived from at least one monomer chosen from the elements of the group consisting of acrylamide, N,N-dimethylacrylamide, methacrylamide, N-isopropylacrylamide, N-tert-butylacrylamide; and—at least one monomer unit derived from a polyethylenic crosslinking monomer (AR), b. glutamic acid, N,N-diacetic acid, tetrasodium salt.

Detergent composition (F) for domestic or industrial use including, as thickener, a self-invertible inverse latex including an aqueous phase including: a) a crosslinked anionic polyelectrolyte (P) consisting of: —at least one first monomer unit derived from 2-methyl-2-[(1-oxo-2-propenyl)amino]-1-propanesulfonic acid in free acid form or partially or totally salified form; and —at least one second monomer unit derived from at least one monomer chosen from the elements of the group consisting of acrylic acid, methacrylic acid, 2-carboxyethylacrylic acid, itaconic acid, maleic acid, 3-methyl-3-[(1-oxo-2-propenyl)amino]butanoic acid, the carboxylic function of the monomers being in free acid, partially salified or totally salified form; —at least one third monomer unit derived from a polyethylenic crosslinking monomer (AR), b) ethylenediaminedisuccinic acid in trisodium salt form.

Detergent composition (F) for domestic or industrial use including, as thickener, a self-invertible inverse latex including an aqueous phase including: a) a crosslinked anionic polyelectrolyte (P) consisting of: —at least one monomer unit derived from 2-methyl-2-[(1-oxo-2-propenyl)amino]-1-propanesulfonic acid in free acid form or partially or totally salified form; —at least one monomer unit derived from at least one monomer chosen from the elements of the group consisting of acrylamide, N,N-dimethylacrylamide, ethacrylamide, N-isopropylacrylamide, N-tert-butylacrylamide; and —at least one monomer unit derived from a polyethylenic crosslinking monomer (AR), b) ethylenediaminedisuccinic acid in trisodium salt form.

Detergent composition (F) for domestic or industrial use including, as thickener, a self-invertible inverse latex including an aqueous phase including: a) a crosslinked anionic polyelectrolyte (P) consisting of: —at least one first monomer unit derived from 2-methyl-2-[(1-oxo-2-propenyl)amino]-1-propanesulfonic acid in free acid form or partially or totally salified form; —at least one second monomer unit derived from at least one monomer chosen from the elements of the group consisting of 2-hydroxyethyl acrylate, 2,3-dihydroxypropyl acrylate, 2-hydroxyethyl methacrylate, 2,3-dihydroxypropyl methacrylate, or vinylpyrrolidone; and—at least one monomer unit derived from a polyethylenic crosslinking monomer (AR), b) at least one sequestrant compound (SQ) chosen from the elements of the group consisting of ethylenediaminedisuccinic acid in trisodium salt form, the glutamic acid, N,N-diacetic acid, tetrasodium salt, and the sodium salt of iminosuccinic acid.