The need for a fast acting and broad spectrum antimicrobial composition which does not reduce surface shine and does not leave visible residues on the surface, while also providing greater residuality of the actives can be met by formulating antimicrobial compositions as described herein.

The present invention relates to treatment compositions containing polymer systems that provide stability and benefit agent deposition as well as methods of making and using same. Such treatment compositions may be used for example as through the wash and/or through the rinse fabric enhancers as well as unit dose treatment compositions.

Provided is a lens solution which has excellent lipid detergency, exhibits high hydrophilization performance, and exhibits an excellent lipid adhesion preventive effect and an excellent lubricity-imparting effect when the solution is used to coat a lens. Disclosed is a lens solution containing a polymer having 2.5% to 95% by mass of the following repeating unit (A) and 2.5% to 95% by mass of the following repeating unit (B): (A) a hydrophilic repeating unit; and (B) a repeating unit having a polyoxyalkylene group in a side chain and having the end of the side chain formed from an alkyl group having 5 to 30 carbon atoms, an alkanoyl group having 5 to 30 carbon atoms, or an aryl group.

The present invention is a contact lens treatment solution containing the following copolymer A and copolymer B in a ratio of A/B=1000/1 to 2/1 (by weight). According to the present invention, there can be provided a contact lens treatment solution capable of removing dirt having adhered to contact lens surfaces and capable of imparting persisting hydrophilicity to contact lens surfaces, by simple immersion treatment. Copolymer A: a copolymer obtained by copolymerization of a monomer (a) represented by formula (1) and a monomer (b) represented by formula (2), in which the copolymerization ratio of the monomer (a) to the monomer (b), a/b=7/3 to 9/1 (by mol), and having a weight-average molecular weight of 400,000 to 700,000. Copolymer B: a copolymer obtained by copolymerization of a monomer (c) represented by formula (3) and a monomer (d) represented by formula (4), in which the copolymerization ratio of the monomer (c) to the monomer (d), c/d=1/4 to 9/1 (by mol), and having a weight-average molecular weight of 20,000 to 90,000.

An ophthalmic composition includes effective amounts of a comfort enhancing agent, a surfactant, and a buffering agent. The comfort enhancing agent includes a first functional monomer that is 2-methacryloyloxyethyl phosphorylcholine (MPC). The comfort enhancing agent has a HLB value between 8 and 40. In addition, the comfort enhancing agent can further include a second functional monomer that is preferably n-butyl methacrylate (BMA).

The invention relates to polyfunctional polymers suitable in particular for the treatment of metal surfaces (metal finishing) and comprising: monomer units u1 bearing phosphonic acid functions; monomer units u2 bearing amine functions; and optionally monomer units u3 bearing alcohol units OH.

The present invention is to provide a means with which foreign matters remaining on a surface of a polished object to be polished can be sufficiently removed. The present invention relates to a composition for surface treatment for a polished object to be polished, including: a (co)polymer containing a structural unit A having a phosphonic acid group and a divalent (poly)oxyhydrocarbon group or a salt thereof; and water, wherein a content of the structural units A exceeds 50% by mole relative to the total structural units forming the (co)polymer.

The invention describes to compositions useful to stabilize peracetic acid, acetic acid and hydrogen peroxide compositions with polymeric phosphonic acid resins or with 1-hydroxyethylidene-1,1,-diphosphonic acid associated with the interior surface of a container to stabilize the peracetic acid, acetic and hydrogen peroxide compositions.

The need for a fast acting and broad spectrum antimicrobial composition which does not reduce surface shine and does not leave visible residues on the surface, while also providing greater residuality of the actives can be met by formulating antimicrobial compositions as described herein.

A post chemical-mechanical-polishing (post-CMP) cleaning composition including: (A) polyethylene glycol (PEG) with a mass average molar mass (Mw) in the range of from 400 to 8,000 g/mol, (B) an anionic polymer selected from poly(acrylic acid) (PAA), acrylic acid-maleic acid copolymers, polyaspartic acid (PASA), polyglutamic acid (PGA), polyvinylphosphonic acid, polyvinylsulfonic acid, poly(styrenesulfonic acid), polycarboxylate ethers (PCE), PEG-phosphorous acids, and copolymers of the polymers thereof, and (C) water, where the pH of the composition is from 7.0 to 10.5.