C11D7/12

STEAM CLEAN BOOSTER POWDER
20170313961 · 2017-11-02 ·

In accordance with one aspect of the present invention, a method for cleaning a cooking chamber is provided. The method comprises applying a cleanser composition and water to the cooking chamber followed by incubating the cooking chamber. The cleanser composition comprises components that aid in loosening soil and debris during the steam cleaning and also provides a pleasant aroma. The cleanser composition aids in loosening soil and debris by effervescence.

Moderately alkaline cleaning compositions for proteinaceous and fatty soil removal at low temperatures

The present invention comprises chlorinated and non-chlorinated alkaline cleaning compositions for removal of proteinaceous and fatty soils at low temperature, i.e. less than 120° F., with little or no deleterious affect on cleaning performance. According to the invention, applicants have found that adding additional alkalinity makes protein removal more difficult and reducing the amount of alkalinity actually improves performance. According to the invention optimized combinations of chlorine and alkalinity components for low temperature cleaning as well as a surfactant system optimized for low temperature fatty soil removal are disclosed.

Moderately alkaline cleaning compositions for proteinaceous and fatty soil removal at low temperatures

The present invention comprises chlorinated and non-chlorinated alkaline cleaning compositions for removal of proteinaceous and fatty soils at low temperature, i.e. less than 120° F., with little or no deleterious affect on cleaning performance. According to the invention, applicants have found that adding additional alkalinity makes protein removal more difficult and reducing the amount of alkalinity actually improves performance. According to the invention optimized combinations of chlorine and alkalinity components for low temperature cleaning as well as a surfactant system optimized for low temperature fatty soil removal are disclosed.

HIGH ALKALINE CLEANERS, CLEANING SYSTEMS AND METHODS OF USE FOR CLEANING ZERO TRANS FAT SOILS
20170306266 · 2017-10-26 ·

The present disclosure relates to high alkaline cleaners, cleaning systems and methods for removing polymerized zero trans fat soils. The high alkaline cleaner of the present invention generally includes one or more alkaline wetting and saponifying agent(s), a chelating/sequestering system and a surface modifying-threshold agent system. In various embodiments, the cleaners may include, at least one cleaning agent comprising a surfactant or surfactant system and/or a solvent or solvent system and/or a cleaning booster such as a peroxide or sulfite type additive. The cleaners may also include one or more components to modify the composition form and/or the application method in some embodiments. All components described above may also be optimized optionally, to provide emulsification of a composition (both as a usable product or a concentrate that can be diluted to form a usable product). The use of the high alkaline cleaner of the present invention has demonstrated enhanced cleaning characteristics especially at higher temperatures (100° F. to about 300° F.) but also shows enhanced cleaning at ambient temperatures.

REMOVING PETS URIN, ODOR AND MILDEW OUT OF HAND MADE RUGS
20170306271 · 2017-10-26 ·

This invention relates to isolating and removing mildew, harmful bacterial and pets urine out of handmade wool and silk rugs.

The invention consist of three procedures that describes each step of work, chemicals mixture and timing used to achieve the this process.

It saves handmade rugs from being discarded, it describes a new safe and healthy approach in cleaning handmade rugs.

REMOVING PETS URIN, ODOR AND MILDEW OUT OF HAND MADE RUGS
20170306271 · 2017-10-26 ·

This invention relates to isolating and removing mildew, harmful bacterial and pets urine out of handmade wool and silk rugs.

The invention consist of three procedures that describes each step of work, chemicals mixture and timing used to achieve the this process.

It saves handmade rugs from being discarded, it describes a new safe and healthy approach in cleaning handmade rugs.

Enhanced peroxygen stability using anionic surfactant in TAED-containing peroxygen solid

Stabilized compositions employing a binding system for improving shelf stability of an activated bleach composition containing a peroxygen source and a catalyst activator are disclosed. Stabilized compositions employ a binding system comprising an anionic surfactant for a solid formulation of a catalyst activator and peroxygen source to provide shelf stability for an activated bleach composition. Methods of formulating and use are further disclosed.

SOLID COMPOSITION FOR TEXTILE TREATMENT

Solid compositions for use in textile treatment, each comprising, based on the total weight of the solid composition, a total amount of each of —30% to 70% by weight of at least one peroxide compound, —10% to 20% by weight of at least one organic bleach activator, —5% to 50% by weight of hydrogencarbonate, calculated as sodium hydrogencarbonate, —0% to 5% by weight of surfactant, where the total amount of organic compound in the solid composition is 10% to 50% by weight, preferably 20% to 35% by weight, are thermally stable and can be stored reliably. They are suitable as an additive to conventional textile treatment compositions, especially to liquid washing compositions, and can be provided as a portion encased with a water-soluble material.

SEMICONDUCTOR ELEMENT CLEANING SOLUTION THAT SUPPRESSES DAMAGE TO TUNGSTEN-CONTAINING MATERIALS, AND METHOD FOR CLEANING SEMICONDUCTOR ELEMENT USING SAME

According to the present invention, it is possible to provide a cleaning solution which removes a photoresist on a surface of a semiconductor element having a low dielectric constant film (a low-k film) and a material that contains 10 atom % or more of tungsten, wherein the cleaning solution contains 0.001-5 mass % of an alkaline earth metal compound, 0.1-30 mass % of an inorganic alkali and/or an organic alkali, and water.

SEMICONDUCTOR ELEMENT CLEANING SOLUTION THAT SUPPRESSES DAMAGE TO COBALT, AND METHOD FOR CLEANING SEMICONDUCTOR ELEMENT USING SAME

According to the present invention, it is possible to provide a cleaning solution which removes a dry etching residue on a surface of a semiconductor element that includes: (1) a material containing cobalt or a cobalt alloy or (2) a material containing cobalt or a cobalt alloy and tungsten; and a low-dielectric constant interlayer dielectric film. The cleaning solution contains 0.001-7 mass % of an alkali metal compound, 0.005-35 mass % of a peroxide, 0.005-10 mass % of an anti-corrosion agent, 0.000001-1 mass % of an alkaline earth metal compound, and water.