C11D7/509

AZEOTROPE OR AZEOTROPE-LIKE COMPOSITIONS OF (Z)-1-CHLORO-2,3,3-TRIFLUOROPROP-1-ENE WITH ETHANOL OR METHANOL AND SOLVENT APPLICATIONS THEREOF

Azeotrope or azeotrope-like compositions and, in particular, azeotrope or azeotrope-like compositions consisting essentially of, or consisting of, (Z)-1-chloro-2,3,3-trifluoroprop-1-ene (HCFO-1233yd(Z)) with each of ethanol and methanol, as well as azeotrope or azeotrope-like compositions consisting essentially of, or consisting of, (Z)-1-chloro-2,3,3-trifluoroprop-1-ene (HCFO-1233yd(Z)), ethanol and trans-dichloroethylene (trans-DCE), and azeotrope or azeotrope-like compositions consisting essentially of, or consisting of, (Z)-1-chloro-2,3,3-trifluoroprop-1-ene (HCFO-1233yd(Z)), methanol and trans-dichloroethylene (trans-DCE), and solvent applications of the foregoing compositions.

CLEANING COMPOSITION

Provided herein is a cleaning composition including: from 20 to 90% by weight of dimethyl sulfoxide, from 5 to 30% by weight of at least one mineral oil (M), and from 5 to 50% by weight of at least one bipolar organic solvent (L). The ranges of proportions indicated are in each case based on the total weight of the cleaning composition. Also provided herein is a method of cleaning components by employing the cleaning composition, and also the cleaned components themselves.

AZEOTROPIC AND AZEOTROPE-LIKE COMPOSITIONS OF Z-1233zd
20190070447 · 2019-03-07 ·

This application provides azeotropic and near-azeotropic compositions of Z-1233zd and a second component selected from the group consisting of methyl formate, dimethoxymethane, HFC-43-10-mee and HFC-245fa. The inventive compositions are useful as aerosol propellants, refrigerants, cleaning agents, expansion agents for thermoplastic and thermoset foams, solvents, heat transfer media, gaseous dielectrics, fire extinguishing and suppression agents, power cycle working fluids, polymerization media, particulate removal fluids, carrier fluids, buffing abrasive agents, and displacement drying agents. The compositions were modeled based on Vapor-Liquid Equilibria data such as those illustrated in the figures.

AZEOTROPE-LIKE COMPOSITION COMPRISING Z-1,1,1,4,4,4-HEXAFLUORO-2-BUTENE

The present invention aims to solve the above mentioned problems by providing a new azeotrope-like composition that can be used for a wide range of industrial purposes. The provision of an azeotrope-like composition including 93.0-99.0 weight percent Z-1,1,1,4,4,4-hexafluoro-2-buteine and 0.1-7 weight percent isopropanol.

Azeotrope-like compositions comprising 1-chloro-3,3,3-trifluoropropene

The present invention relates, in part, to ternary azeotropic compositions and mixtures including chlorotrifluoropropene, methanol, and a third component selected from isohexane, trans-1,2-dichloroethylene, and petroleum ether. The present invention further relates to ternary azeotropic compositions and mixtures including chlorotrifluoropropene, cyclopentane, and a alcohol selected from methanol, ethanol, and isopropanol.

2,3,3,3-TETRAFLUOROPROPENE COMPOSITIONS HAVING IMPROVED MISCIBILITY
20180282603 · 2018-10-04 · ·

The use of an alcoholic compound to improve the miscibility of ammonia with 2,3,3,3-tetrafluoropropene, as well as to compositions of ammonia, 2,3,3,3-tetrafluoropropene and an alcoholic compound, and the use thereof, in particular in heat-transfer applications. A composition including 2,3,3,3-tetrafluoropropene, ammonia and an alcoholic compound having a melting point less than or equal to 0 C.

2,3,3,3-tetrafluoropropene compositions having improved miscibility
10023780 · 2018-07-17 · ·

The use of an alcoholic compound to improve the miscibility of ammonia with 2,3,3,3-tetrafluoropropene, as well as to compositions of ammonia, 2,3,3,3-tetrafluoropropene and an alcoholic compound, and the use thereof, in particular in heat-transfer applications. A composition including 2,3,3,3-tetrafluoropropene, ammonia and an alcoholic compound having a melting point less than or equal to 0 C.

METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURING PROCESSED SEMICONDUCTOR SUBSTRATE, AND RELEASING AND DISSOLVING COMPOSITION

A method for cleaning a semiconductor substrate includes releasing and dissolving an adhesive layer formed on a semiconductor substrate using a releasing and dissolving composition, in which the releasing and dissolving composition contains: a component [I]: a quaternary ammonium salt; a component [II]: an amide-based solvent; and a component [III]: a solvent represented by the following Formula (L), where L represents a substituent substituted on a benzene ring and each independently represents an alkyl group having 1 to 4 carbon atoms, and k represents the number of L and is an integer of 0 to 5.

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ENERGY-EFFICIENT PROCESS FOR PURIFYING VOLATILE COMPOUNDS AND DEGREASING

Disclosed is an energy-efficient method for degreasing or defluxing comprising a) providing a heated distillation vessel capable of being operated under positive pressure; b) charging with a solvent comprising HCFO 1233zd; c) heating to provide positive pressure so that solvent boils at about 30-100 C.; d) distilling using an air-cooled heat exchanger; e) releasing the pressure; f) cooling by channeling through an immersion tank subfloor and/or side; g) collecting the solvent; h) performing degreasing operations; and i) pumping soiled solvent back to the heated distillation vessel. Also disclosed are an energy-efficient method for purifying volatile compounds, and pressurized solvent degreasing system capable of use with HCFO 1233zd.

Refrigerant compositions and uses thereof
12503632 · 2025-12-23 · ·

A composition comprising: (i) 1,1-difluoroethene (vinylidene fluoride, R-1132a); (ii) carbon dioxide (CO.sub.2, R-744); (iii) pentafluoroethane (R-125); and (iv) one or more of trifluoromethane (R-23) and hexafluoroethane (R-116).