A multi-unit abutment aligning a dental implant and a screw-attached prosthesis with copings is disclosed. The multi-unit abutment has a threaded base post for attachment to the implant and a ball portion. A swivel post into the implant with the multi-unit assembly in a linear configuration. The swivel shell is then positioned and fixed at a desired tilt and azimuthal angle. The swivel shell has a mating surface for a coping. The lock screw remains accessible through an aperture in the coping when the prosthesis is positioned on the implant abutments. Different embodiments are disclosed for capturing the swivel shell on the ball. Methods for improving passive alignment of the prosthesis to the implants are described.

According to an exemplary embodiment of the present disclosure, an apparatus for plasma surface treatment is disclosed. The apparatus may include: a placement unit on which an object to be treated, a storage container for storing the object to be treated, or a gripping device for gripping the object to be treated is placed; an isolation unit that forms, by combining with the placement unit, an isolation space in which at least a part of an inside thereof is isolated from an external environment during an operation period of the apparatus, the isolation unit having at least one surface including a light-transmissive member; and a treatment unit that allows plasma surface treatment to be performed for the object to be treated by forming an electric field in the isolation space during the operation period of the apparatus.

According to an exemplary embodiment of the present disclosure, an apparatus for plasma surface treatment is disclosed. The apparatus may include: a placement unit on which an object to be treated, a storage container for storing the object to be treated, or a gripping device for gripping the object to be treated is placed; an isolation unit that forms, by combining with the placement unit, an isolation space in which at least a part of an inside thereof is isolated from an external environment during an operation period of the apparatus, the isolation unit having at least one surface including a light-transmissive member; and a treatment unit that allows plasma surface treatment to be performed for the object to be treated by forming an electric field in the isolation space during the operation period of the apparatus.

Disclosed is a surface processing method for a dental implant, the surface processing method including: (a) laser-processing a surface of an implant; (b) etching the laser-processed surface of the implant; and (c) washing the etched implant, wherein a macro surface including one or more first grooves is formed at the surface of the implant by step (a), a micro surface including one or more second grooves is formed at the surface of the implant by step (b), an outer circumferential surface of the implant includes a top portion and a bottom portion, and at least one of an average width and an average depth of the first grooves is formed to be greater at the top portion of the outer circumferential surface of the implant than at the bottom portion of the outer circumferential surface of the implant.

Disclosed is a surface processing method for a dental implant, the surface processing method including: (a) laser-processing a surface of an implant; (b) etching the laser-processed surface of the implant; and (c) washing the etched implant, wherein a macro surface including one or more first grooves is formed at the surface of the implant by step (a), a micro surface including one or more second grooves is formed at the surface of the implant by step (b), an outer circumferential surface of the implant includes a top portion and a bottom portion, and at least one of an average width and an average depth of the first grooves is formed to be greater at the top portion of the outer circumferential surface of the implant than at the bottom portion of the outer circumferential surface of the implant.

The present invention relates to oral care and dental implants. In particular, the present invention is a dental implant with a removable protective film that is used to prevent implant loss and remove unwanted residual cement.

A multi-unit abutment aligning a dental implant and a screw-attached prosthesis with copings is disclosed. The multi-unit abutment has a threaded base post for attachment to the implant and a ball portion. A swivel shell surrounds the ball and may be fixed in position with a lock screw. A drive feature on the ball allows a tool passing through the lock screw to drive the base post into the implant with the multi-unit assembly in a linear configuration. The swivel shell is then positioned and fixed at a desired tilt and azimuthal angle. The swivel shell has a mating surface for a coping. The lock screw remains accessible through an aperture in the coping when the prosthesis is positioned on the implant abutments. Different embodiments are disclosed for capturing the swivel shell on the ball. Methods for improving passive alignment of the prosthesis to the implants are described.

A multi-unit abutment aligning a dental implant and a screw-attached prosthesis with copings is disclosed. The multi-unit abutment has a threaded base post for attachment to the implant and a ball portion. A swivel shell surrounds the ball and may be fixed in position with a lock screw. A drive feature on the ball allows a tool passing through the lock screw to drive the base post into the implant with the multi-unit assembly in a linear configuration. The swivel shell is then positioned and fixed at a desired tilt and azimuthal angle. The swivel shell has a mating surface for a coping. The lock screw remains accessible through an aperture in the coping when the prosthesis is positioned on the implant abutments. Different embodiments are disclosed for capturing the swivel shell on the ball. Methods for improving passive alignment of the prosthesis to the implants are described.

The present invention relates to a dental zirconia material of which the surface is modified by plasma treatment, an implant, and a method for preparing same. The zirconia material and the implant prepared according to the present invention have improved cell adhesion and anti-bacterial effect, and thus can exhibit improved biocompatibility and minimize an inflammatory response of a user and the like.

An embodiment of the present disclosure provides a packaging container, a plasma treatment apparatus including the same, and a plasma treatment method, wherein the packaging container includes a housing portion capable of accommodating a treatment target, wherein the housing portion includes a permeable portion which is permeable to gas, and an electrical connection member electrically connectable to an electrode portion disposed externally, and dielectric-barrier discharge is generated inside the housing portion through the permeable portion so that the treatment target accommodated inside the housing portion is plasma-treated.