Patent classifications
C23C14/165
Methods and apparatus for depositing aluminum by physical vapor deposition (PVD) with controlled cooling
Methods and apparatus for performing physical vapor deposition in a reactor chamber to form aluminum material on a substrate including: depositing a first aluminum layer atop a substrate to form a first aluminum region having a first grain size and a first temperature; and cooling the first aluminum region atop a substrate to a second temperature at a rate sufficient to increase the first grain size to a second grain size.
METHOD OF PRODUCING BLADES OR BLADE ARRANGEMENTS OF A TURBOMACHINE WITH EROSION PROTECTION LAYERS AND CORRESPONDINGLY PRODUCED COMPONENT
The present invention relates to a method for producing a blade or blade arrangement of a turbomachine, which features the following steps: producing a blade (4) from at least one blade material, machining the blade in at least one region of the blade by a surface machining process, cleaning the surface of the blade depositing an erosion protection coating (10) of at least two layers of different hardness by physical vapor deposition in the at least one region, machining the erosion protection coating (10) by a coating smoothing process in order to establish a defined surface roughness.
Furthermore, the invention relates to correspondingly produced blades or blade arrangements.
Methods and apparatus for depositing aluminum by physical vapor deposition (PVD)
Methods and apparatus for performing physical vapor deposition in a reactor chamber to form aluminum material on a substrate including: depositing a first aluminum layer atop a substrate to form a first aluminum region having a first grain size and a second aluminum layer atop the first aluminum layer, wherein the second aluminum layer has a second grain size larger than the first grain size; and depositing aluminum atop the second aluminum layer under conditions sufficient to increase the second grain size.
Extreme ultraviolet mask blank defect reduction methods
Methods for the manufacture of extreme ultraviolet (EUV) mask blanks and production systems therefor are disclosed. A method for forming an EUV mask blank comprises forming a bilayer on a portion of a multi-cathode PVD chamber interior and then forming a multilayer stack of Si/Mo on a substrate in the multi-cathode PVD chamber.
Metal powder for metal additive manufacturing and molded object produced using said metal powder
A metal powder in which a coating made of one or more types of elements selected from Gd, Ho, Lu, Mo, Nb, Os, Re, Ru, Tb, Tc, Th, Tm, U, V, W, Y, Zr, Cr, Rh, Hf, La, Ce, Pr, Nd, Pm, Sm and Ti is formed on a surface of a copper or copper alloy powder, wherein a thickness of the coating is 5 nm or more and 500 nm or less. A metal powder for metal additive manufacturing based on the laser method which can be efficiently melted with a laser while maintaining the high conductivity of copper or copper alloy, and a molded object produced by using such metal powder are provided.
COATING LIQUID FOR FORMING PLANARIZATION FILM AND METAL FOIL COIL WITH PLANARIZATION FILM
Problems to be Solved: To provide a metal foil coil with a planarization film, with which an electronic device can be formed by a roll to roll process. Solution: A quick curable coating liquid for a planarization film prepared by adding into an organic solvent, with respect to 1 mol of a phenyltrialkoxysilane, 0.1 mol to 1 mol of acetic acid and 0.005 mol to 0.05 mol of organic tin as a catalyst, hydrolyzing the silane with 2 mol to 4 mol of water, then distilling away the organic solvent at a temperature of 160° C. to 210° C. under reduced pressure to yield a resin, and dissolving the resin in an aromatic hydrocarbon solvent, is coated on a metal foil coil to a film thickness of 2.0 μm to 5.0 μm. When an insulation coating is provided on a metal foil coil before a planarization film is formed, high reliability for insulation can be obtained. When a stainless steel foil provided with a reflection film is used, a highly efficient light emitting device can be obtained.
Method for Forming Perpendicular Magnetization Type Magnetic Tunnel Junction Element and Apparatus for Producing Perpendicular Magnetization Type Magnetic Tunnel Junction Element
A method for forming a perpendicular magnetization type magnetic tunnel junction element includes forming a tunnel barrier layer on a first magnetic layer of a workpiece, cooling the workpiece on which the tunnel barrier layer is formed, and forming a second magnetic layer on the tunnel barrier layer after the cooling.
Method for manufacturing graphene composite electrode material
The present invention provides a method for manufacturing a graphene composite electrode material, including the following steps: (1) providing a glass substrate, the glass substrate having a melting point greater than 1100° C.; (2) washing the glass substrate and then forming a metal film on the glass substrate; (3) patterning the metal film to form a circuit pattern; and (4) forming a graphene film on the circuit pattern so as to form a graphene composite electrode material. The method for manufacturing a graphene composite electrode material according to the present invention uses a temperature resistant glass substrate and a metal catalyst to directly grow a graphene film on a circuit pattern thereby requiring no transfer, not affected by solvent applied in transfer, having relatively high quality of film formation, requiring no etching, allowing for direct formation of a graphene composite electrode material, having a simple process, providing an effect of protection of the metal circuit pattern due to stable chemical property of graphene, and thus effectively extending the service life of the graphene composite electrode material.
ELECTROMECHANICAL TRANSDUCER, SENSOR, ACTUATOR, METHODS OF PRODUCING ELECTROMECHANICAL TRANSDUCER, SENSOR, AND ACTUATOR, LIQUID DISCHARGE HEAD, LIQUID DISCHARGE DEVICE, AND LIQUID DISCHARGE APPARATUS
There is provided a method of producing an electromechanical transducer that includes a plurality of electromechanical transducer elements on a substrate. The method includes forming a plurality of individual electrodes corresponding to the plurality of electromechanical transducer elements on the substrate, forming an insulation film to cover the plurality of individual electrodes on the substrate, forming a conductive film on the insulation film, forming a plurality of openings to expose the plurality of individual electrodes in each of the insulation film and the conductive film, and forming a plurality of electromechanical transducer films on the plurality of individual electrodes exposed in the plurality of openings.
Manufacturing method of thin film and metal line for display using the same, thin film transistor array panel, and method for manufacturing the same
A method for forming a thin film according to an exemplary embodiment of the present invention includes forming the thin film at a power density in the range of approximately 1.5 to approximately 3 W/cm.sup.2 and at a pressure of an inert gas that is in the range of approximately 0.2 to approximately 0.3 Pa. This process results in an amorphous metal thin film barrier layer that prevents undesired diffusion from adjacent layers, even when this barrier layer is thinner than many conventional barrier layers.