A system comprising (i) thin film optical element comprising substrate and thin film stack (≥2 film layers; uniform thickness—variation of less than ±5% in any 10 mm.sup.2 stack) deposited on substrate's first side; (ii) holder comprising at least one opening; wherein holder has inner side and outer side having beveled edge extending into lip having flat side and beveled edge side; wherein beveled edge/beveled edge side of lip form angle <45° with flat side of lip/first side; wherein flat side of lip and holder inner side define socket receiving substrate; wherein opening exposes first side to deposition plume; wherein first side contacts flat side of lip, thereby allowing film stack deposition on first side; wherein beveled edge side/beveled edge provide film uniformity, and (iii) deposition source providing plume traveling towards first side perpendicular to flat side of lip/first deposition side; and wherein beveled edge side faces plume.

A system comprising (i) thin film optical element comprising substrate and thin film stack (≥2 film layers; uniform thickness—variation of less than ±5% in any 10 mm.sup.2 stack) deposited on substrate's first side; (ii) holder comprising at least one opening; wherein holder has inner side and outer side having beveled edge extending into lip having flat side and beveled edge side; wherein beveled edge/beveled edge side of lip form angle <45° with flat side of lip/first side; wherein flat side of lip and holder inner side define socket receiving substrate; wherein opening exposes first side to deposition plume; wherein first side contacts flat side of lip, thereby allowing film stack deposition on first side; wherein beveled edge side/beveled edge provide film uniformity, and (iii) deposition source providing plume traveling towards first side perpendicular to flat side of lip/first deposition side; and wherein beveled edge side faces plume.

Various implementations include a device for deposition of conformal coatings. The device includes a powder container, a connecting rod, and a crankshaft. The powder container has a first side configured to contain a powder and a second side. The connecting rod has a first end directly hingedly coupled to the second side of the powder container and a second end. The crankshaft has a longitudinal axis, a main shaft portion extending along the longitudinal axis, and a cam portion radially offset from and rotatable about the longitudinal axis. The second end of the connecting rod is directly rotatably coupled to the cam portion. Rotation of the crankshaft about the longitudinal axis causes the second end of the connecting rod to rotate about the longitudinal axis, causing the powder container to linearly oscillate between a first position and a second position.

The present invention relates to a method of forming a coating layer of which a composition can be controlled, the method comprising steps of: preparing a substrate inside a chamber; evaporating a deposition material to generate YF.sub.3 or YOF particles in a gas phase by irradiating an electron beam on a YF.sub.3 deposition material provided in a solid form in an electron beam source; generating radical particles having activation energy by injecting a process gas containing oxygen into a RF energy beam source; irradiating an RF energy beam including oxygen radical particles toward the substrate; controlling a composition of a thin film by generating YOF deposition particles having a modified atomic ratio by adjusting an amount of fluorine substitution by oxygen as the YF.sub.3 or YOF particles and the oxygen radical particles react, and depositing the YOF deposition particles on the substrate with the RF energy beam.

The invention relates to a process for preparation of an unpassivated cantilever comprising the steps of: 1) providing a silicon cantilever sensor having two sides; 2) coating one side of the cantilever with at least a gold layer; and 3) functionalizing both sides of the cantilever with a self-assembled monolayer (SAM) of a probe molecule by incubating the cantilever in a solution having a concentration of the probe molecule of between 1 to 1000 μM.

The invention also relates to an unpassivated cantilever sensor comprising a silicon layer coated on one side with a coating comprising Au and being uncoated or unpassivated on the opposite side, wherein the Au coated surface comprises a self-assembled monolayer of a probe molecule and wherein the surface area occupied per probe molecule is in the range 0.4-1.5 nm.sup.2.

The invention relates to a process for preparation of an unpassivated cantilever comprising the steps of: 1) providing a silicon cantilever sensor having two sides; 2) coating one side of the cantilever with at least a gold layer; and 3) functionalizing both sides of the cantilever with a self-assembled monolayer (SAM) of a probe molecule by incubating the cantilever in a solution having a concentration of the probe molecule of between 1 to 1000 μM.

The invention also relates to an unpassivated cantilever sensor comprising a silicon layer coated on one side with a coating comprising Au and being uncoated or unpassivated on the opposite side, wherein the Au coated surface comprises a self-assembled monolayer of a probe molecule and wherein the surface area occupied per probe molecule is in the range 0.4-1.5 nm.sup.2.

A method for 3D printing includes printing a first metallic material on a substrate as a support structure (48). A second metallic material, which is less anodic than the first metallic material, is printed on the substrate as a target structure (46), in contact with the support structure. The support structure is chemically removed from the target structure by applying a galvanic effect to selectively corrode the first metallic material.

A method for 3D printing includes printing a first metallic material on a substrate as a support structure (48). A second metallic material, which is less anodic than the first metallic material, is printed on the substrate as a target structure (46), in contact with the support structure. The support structure is chemically removed from the target structure by applying a galvanic effect to selectively corrode the first metallic material.

High temperature stable thermal barrier coatings useful for substrates that form component parts of engines such as a component from a gas turbine engine exposed to high temperatures are provided. The thermal barrier coatings include a multiphase composite and/or a multilayer coating comprised of two or more phases with at least one phase providing a low thermal conductivity and at least one phase providing mechanical and erosion durability. Such low thermal conductivity phase can include a rare earth zirconate and such mechanical durability phase can include a rare earth a rare earth aluminate. The different phases are thermochemically compatible even at high temperatures above about 1200° C.

High temperature stable thermal barrier coatings useful for substrates that form component parts of engines such as a component from a gas turbine engine exposed to high temperatures are provided. The thermal barrier coatings include a multiphase composite and/or a multilayer coating comprised of two or more phases with at least one phase providing a low thermal conductivity and at least one phase providing mechanical and erosion durability. Such low thermal conductivity phase can include a rare earth zirconate and such mechanical durability phase can include a rare earth a rare earth aluminate. The different phases are thermochemically compatible even at high temperatures above about 1200° C.