A method of making a thin film can include bombarding a substrate with first ions supplied from a first ion beam; and sputtering from a metal sputtering target substantially simultaneously with the bombardment to deposit a metal-ion film onto the substrate, wherein the method is performed without applied heat, and the metal sputtering target comprises one or more of a metal, a transition metal, a semi-metal, alloys thereof and combinations thereof.

Techniques for generating a multi-layered thin film coating for dental applications are disclosed. An example of a dental substrate with an aesthetic coating includes a barrier layer deposited on the dental substrate, a textured layer deposited over the barrier layer, the textured layer comprising a first material with features of a size sufficient to scatter light, and at least one protective layer deposited over the textured layer.

Provided herein are methods for the controlled, independent modification of the surface of magnesium-based materials and compositions generated thereby. The methods allow for the alteration of multiple surface characteristics including generation of precise nanostructures, morphology, crystallography, chemical hybridizations and chemical composition for controlled bioresorption and/or increased biocompatibility, for example, osseointegration, hydroxyapatite formation, osseoconduction, cell adhesion, cell proliferation, enhanced local mechanical properties (elasticity, modulus, surface texture, porosity), hydrophobicity, hydrophilicity, steric hindrance, modulating-immuno response, anti-inflammatory properties and/or anti-bacterial properties.

Provided herein are systems and methods for the controlled surface modification of a material substrate, including, for example, generation of nanostructures, crystallographic or morphologic alterations and the removal of defects, changes in chemical composition and bond structure and the creation of thermodynamic metastable states. The provided systems and methods utilize one or more directed energetic particle beams with independently controlled parameters (e.g. incident angle, fluence, flux, energy, species, etc.) to precisely and efficiently generate enhanced surface properties beyond those of conventional plasma kinetic roughening.

Certain example embodiments relate to sputtering apparatuses that include a plurality of targets such that a first one or ones of target(s) may be used for sputtering in a first mode, while a second one or ones of target(s) may be used for sputtering in a second mode. Modes may be switched in certain example embodiments by rotating the position of the targets, e.g., such that one or more target(s) to be used protrude into the main chamber of the apparatus, while one or more target(s) to be unused are recessed into a body portion of a cathode of (e.g., integrally formed with) the sputtering apparatus. The targets may be cylindrical magnetic targets or planar targets. At least one target location also may be made to accommodate an ion beam source.

A substrate including plasmonic continuous film with curved surface and a method for manufacturing the same. More particularly, a substrate for an ultrasensitive spectroscopic sensor includes bowl-shaped plasmonic curved nanodimples and spiked plasmonic nanotips formed at contact points between the nanodimples at the same time, thereby greatly increasing the total volume of hotspots and being capable of concentrating and analyzing an extremely small amount of a sample.

Provided herein are methods for the controlled, independent modification of the surface of titanium-based materials and compositions generated thereby. The methods allow for the alteration of multiple surface characteristics including generation of precise nanostructures, morphology, crystallography and chemical composition for increased biocompatibility, for example, osseointegration, osseoconduction, cell adhesion, cell proliferation, mechanical properties (e.g. elasticity, modulus, surface texture, porosity), hydrophobicity, hydrophilicity, steric hindrance, anti-inflammatory properties and/or anti-bacterial properties.

A PVD method includes tilting a first magnetic element over a back side of a target. The first magnetic element is moved about an axis that extends through the target. Then, charged ions are attracted to bombard the target, such that particles are ejected from the target and are deposited over a surface of a wafer. By tilting the magnetic element relative to the target, the distribution of the magnetic fields can be more random and uniform.

Disclosed is a method of producing a multicomponent nanopattern having a regular array and allowing a variety of combinations of compositions by depositing a film including a multicomponent material on a substrate having a prepattern formed thereon and then conducting ion-etching thereon twice. The method can be utilized in a variety of applications requiring considerably regularly arranged multicomponent nanostructures such as transistors, organic optoelectronic devices, catalysts and gas sensors.

Certain example embodiments relate to sputtering apparatuses that include a plurality of targets such that a first one or ones of target(s) may be used for sputtering in a first mode, while a second one or ones of target(s) may be used for sputtering in a second mode. Modes may be switched in certain example embodiments by rotating the position of the targets, e.g., such that one or more target(s) to be used protrude into the main chamber of the apparatus, while one or more target(s) to be unused are recessed into a body portion of a cathode of (e.g., integrally formed with) the sputtering apparatus. The targets may be cylindrical magnetic targets or planar targets. At least one target location also may be made to accommodate an ion beam source.