Cathode composition including a core cathode body composed of nickel oxide crystallite particles and a surface cathode coating layer contacting and at least partially surrounding an outer surface of the core cathode body. The surface cathode coating layer includes one or more of a transition metal or post-transition metal oxide or fluoride and one or more of lanthanide row atoms having a concentration in a range from about 0.1 to 10 mol %, has a thickness in a range from about 0.5 to 30 nm, and has an amorphous, polycrystalline or composite amorphous/polycrystalline atomic structure. Method of manufacture including preparing a cathode composition includes forming a core cathode body composed of nickel oxide crystallite particles, and, forming by atomic layer deposition, a surface cathode coating layer contacting and at least partially surrounding an outer surface of the core cathode body.

A deposition method demonstrating a slower growth rate is disclosed. Some embodiments of the disclosure provide CVD methods which utilize a halide-containing growth inhibitor as a co-reactant with a metal halide precursor and a reactant. Some embodiments of the disclosure relate to CVD and ALD methods comprising exposure of the substrate surface to a pretreatment comprising a halide-containing growth inhibitor.

A wire grid polarizer (WGP) can have a conformal-coating to protect the WGP from at least one of the following: corrosion, dust, and damage due to tensile forces in a liquid on the WGP. The conformal-coating can include a silane conformal-coating with chemical formula (1), chemical formula (2), or combinations thereof: ##STR00001##
A method of applying a conformal-coating over a WGP can include exposing the WGP to Si(R.sup.1).sub.d(R.sup.2).sub.e(R.sup.3).sub.g. In the above WGP and method, X can be a bond to the ribs; each R.sup.1 can be a hydrophobic group; each R.sup.3, if any, can be any chemical element or group; d can be 1, 2, or 3, e can be 1, 2, or 3, g can be 0, 1, or 2, and d+e+g=4; R.sup.2 can be a silane-reactive-group; and each R.sup.6 can be an alkyl group, an aryl group, or combinations thereof.

The invention concerns a method of manufacturing a modulated optically diffractive grating and a corresponding grating. The method comprises providing a substrate and manufacturing a plurality of temporary elements onto the substrate, the temporary elements being arranged in a periodic pattern comprising at least two periods having different element characteristics. Next, a first deposition layer is deposited so as to at least partially cover the temporary elements with the first deposition layer and the temporary elements are removed from the substrate in order to form onto the substrate a modulated diffractive grating of first grating elements made of the first deposition layer, the pattern comprising within each period a plurality of first grating elements and one more gaps between the first grating elements. The invention allows for producing high-quality gratings with locally varying diffraction efficiency.

A semiconductor manufacturing apparatus includes: a stage installed inside a processing chamber and holding a semiconductor substrate having a high-k insulating film including silicate; and a gas supply line including a first system supplying reactive gas to the processing chamber and a second system supplying catalytic gas to the processing chamber, wherein mixed gas which includes complex forming gas reacting with a metal element included in the high-k insulating film to form a first volatile organometallic complex and complex stabilizing material gas increasing stability of the first organometallic complex is supplied as the reactive gas, and catalytic gas using a second organometallic complex, which modifies the high-k insulating film and promotes a formation reaction of the first organometallic complex, as a raw material is supplied.

A method for fabricating a capacitor includes forming a first electrode, forming a dielectric layer stack on the first electrode, the dielectric layer stack including an initial hafnium oxide layer and a seed layer having a doping layer embedded therein, forming a thermal source layer on the dielectric layer stack to crystallize the initial hafnium oxide into tetragonal hafnium oxide, and forming a second electrode on the thermal source layer.

Methods for manufacturing a multilayer composite display cover include stacking a plurality of composite layers, each comprising an ultra-thin glass sheet covered in a polymer layer. After a cover glass sheet is placed on an exposed polymer layer, the composite layers may be bonded together. A ceramic coating may be applied to the external surfaces to increase hardness.

Atomic layer deposition is utilized to deposit a coating on a membrane. The coated membrane exhibits a tightly bound hydration layer upon exposure to water. The resultant coated membrane is oleophobic.

Disclosed is a method of forming a thin film using a surface protection material, the method comprising supplying the surface protection material to the inside of a chamber on which a substrate is placed so that the surface protection material is adsorbed to the substrate, discharging the unadsorbed surface protection material from the inside of the chamber by purging the interior of the chamber, supplying a metal precursor to the inside of the chamber so that the metal precursor is adsorbed to the substrate, discharging the unadsorbed metal precursor from the inside of the chamber by purging the interior of the chamber, and supplying a reaction material to the inside of the chamber so that the reaction material reacts with the adsorbed metal precursor to form the thin film.

A thin film laminate comprises a metal layer consisting of a metal, and a thin film laminated on the surface of the metal layer, wherein a first direction is defined as one direction parallel to the surface of the metal layer, and a second direction is defined as one direction parallel to the surface of the metal layer and crossing the first direction; and the metal layer contains a plurality of first metal grains consisting of the metal and extending in the first direction on the surface of the metal layer, and a plurality of second metal grains consisting of the metal and extending in the second direction on the surface of the metal layer.