C23C16/406

CATALYST, ELECTRODE AND MANUFACTURING METHODS THEREOF

The invention relates to the use of a ternary alloy having the formula Si.sub.xTi.sub.yNi.sub.z, wherein x, y and z are natural numbers, for use in electrolysis and photoelectrolysis, in particular photo-oxidation of water. One aspect of the invention relates to a method for the manufacture of an electrode, the method comprising a step of heating a carrier comprising a surface having a layer of silicon on which a layer of TiO.sub.2 is disposed, the layer of TiO.sub.2 being covered with a layer of NiO; the heating step being carried out at a temperature above 1,000 C., and preferably between 1,150 C. and 1,250 C. The invention also relates to an electrode comprising a carrier, said electrode having either: an outer surface on which particles of a ternary alloy having the formula Si.sub.xTi.sub.yNi.sub.z are positioned, wherein x, y and z are natural numbers, and wherein the particles form protrusions; or an outer surface consisting of a layer of said alloy, the layer comprising protrusions.

METHODS OF FORMING NICKEL-CONTAINING FILMS

Exemplary methods of forming a nickel-containing film may include simultaneously flowing a nickel-containing precursor and an oxygen-containing precursor into a semiconductor processing chamber. The methods may include forming a first layer of a nickel-and-oxygen-containing film overlying a substrate housed within the semiconductor processing chamber. The methods may include halting the simultaneous flow. The methods may include flowing a first precursor selected from the nickel-containing precursor and the oxygen-containing precursor into the semiconductor processing chamber. The methods may include flowing a second precursor selected from the nickel-containing precursor and the oxygen-containing precursor into the semiconductor processing chamber. The second precursor may be different from the first precursor. The methods may also include forming a second layer of the nickel-and-oxygen-containing film overlying the first layer of the nickel-and-oxygen-containing film.

PATTERNING METAL REGIONS ON METAL OXIDE FILMS/METAL FILMS BY SELECTIVE REDUCTION/OXIDATION USING LOCALIZED THERMAL HEATING

A method for creating metal patterns. A metal oxide film/metal film is deposited on a substrate in a reactor. After the metal oxide film/metal film has been deposited, the desired metal regions/metal oxide regions are formed on the metal oxide film/metal film using a reduction/oxidation reaction. A reducing/oxidizing gas is fed into the reactor. Furthermore, a heat source, such as a thermal probe or a high intensity laser beam, is pulsed to heat and form metal regions/metal oxide regions on the metal oxide film/metal film within the metal's reduction/oxidation window. In this manner, benefits over prior patterning techniques are achieved, including greater control and uniformity, reduced cost, less waste and potential for sub-5 nm features.

Fabrication of correlated electron material devices method to control carbon
10580982 · 2020-03-03 · ·

Subject matter disclosed herein may relate to fabrication of correlated electron materials used, for example, to perform a switching function. In embodiments, precursors, in a gaseous form, may be utilized in a chamber to build a film of correlated electron materials comprising various impedance characteristics.

ELECTROCHEMICAL DOPING OF THIN METAL LAYERS EMPLOYING UNDERPOTENTIAL DEPOSITION AND THERMAL TREATMENT
20200063256 · 2020-02-27 ·

A method is provided, including the following operations: depositing a liner in a feature of a substrate; depositing a monolayer of zinc over the liner; after depositing the monolayer of zinc, performing a thermal treatment on the substrate, wherein the thermal treatment is configured to cause migration of the zinc to an interface of the liner and an oxide layer of the substrate, the migration of the zinc producing an adhesive barrier at the interface that improves adhesion between the liner and the oxide layer of the substrate; repeating the operations of depositing the monolayer of zinc and performing the thermal treatment until a predefined number of cycles is reached.

Method for preparing chlorine adsorption material for use in waste incineration and application of chlorine adsorption material

The invention discloses a method for preparing a chlorine adsorption material for use in waste incineration and application of the chlorine adsorption material. The chlorine adsorption material adsorptive for chlorine-based substances during the waste incineration is prepared by mixing raw materials which include natural iron ores and quartz stones, and modifying the iron ores and the quartz stones with CaO through an ultrasonic impregnation method. The prepared chlorine adsorption material has a large pore size, a high porosity and a stable structure, and shows higher adsorption efficiency and adsorption capacity for the chlorine-based substances during the waste incineration. The use of the low-cost natural iron ores and quartz stones can reduce the cost in processing the chlorine-based substances, make great use of resources and facilitate environment protection.

ELECTROCATALYST STRUCTURES FOR AN ELECTRODE
20190379057 · 2019-12-12 ·

In one aspect, the disclosure relates to method of forming an electrocatalyst structure on an electrode, comprising depositing a first layer on the electrode using atomic layer deposition (ALD), wherein the first layer comprises a plurality of discrete nanoparticles of a first electrocatalyst, and depositing one or more of a second layer on the first layer and the electrode using ALD, wherein the one or more second layer comprises a second electrocatalyst, wherein the first layer and the one or more second layers, collectively, form a multi-layer electrocatalyst structure on the electrode. Also disclosed are electrodes having a multi-layer electrocatalyst structure. This abstract is intended as a scanning tool for purposes of searching in the particular art and is not intended to be limiting of the present disclosure.

Electrochemical doping of thin metal layers employing underpotential deposition and thermal treatment

A method is provided, including the following operations: depositing a ruthenium liner in a feature of a substrate; depositing a monolayer of zinc over the ruthenium liner; after depositing the monolayer of zinc, performing a thermal treatment on the substrate, wherein the thermal treatment is configured to cause migration of the zinc to an interface of the ruthenium liner and an oxide layer of the substrate, the migration of the zinc producing an adhesive barrier at the interface that improves adhesion between the ruthenium liner and the oxide layer of the substrate; repeating the operations of depositing the monolayer of zinc and performing the thermal treatment until a predefined number of cycles is reached.

Metal Complexes Containing Allyl Ligands

Metal complexes containing substituted allyl ligands and methods of using such metal complexes to prepare metal-containing films are provided.

ELECTROCATALYST WITH A NiMoO4 LAYER WITH NANOFLOWER MORPHOLOGY

A rapid method of synthesizing nanoflowers made of nanoflakes of nickel molybdate (NiMoO.sub.4) directly on nickel foam (NF) through an aerosol-assisted chemical vapor deposition (AACVD) process is disclosed. The nickel molybdate nanoflowers were grown on NF by varying the deposition time for 60 and 120 min at a fixed temperature of 480? C. and their efficiency was investigated as oxygen evolution reaction (OER) catalysts in 1 M KOH electrolyte. The NiMoO.sub.4 nanoflowers of NF obtained after 60 minutes of AACVD process showed OER performance with lowest overpotential of 320 mV to reach standard current density of 10 mA cm.sup.?2. The catalyst continuously performed the OER for 15 h, signifying its prominent stability under electrochemical conditions.