C23C18/1208

Antimicrobial coatings comprising organosilane homopolymers

Aqueous antimicrobial coating compositions are disclosed comprising at least one organosilane homopolymer, present as a distribution of polymer chain lengths, and optionally at least one amine. A method of preparing an antimicrobial coating comprises coating a surface with the aqueous antimicrobial coating composition and allowing the composition to dry into a film that exhibits residual antimicrobial efficacy against microorganisms even after mechanical abrasion of the coating. The organosilane homopolymer may comprise only 3-aminopropylsilanetriol homopolymer, mixtures of 3-aminopropylsilanetriol homopolymer, 3-chloropropylsilanetriol homopolymer and 3-(trihydroxysilyl)propyl dimethyloctadecyl ammonium chloride homopolymer, or any one of various unique organosilane homopolymers having multiple amine functionality.

Method of forming corrosion resistant coating and related apparatus

A method of forming a corrosion-resistant ceramic coating on a metallic substrate, the method comprising providing a passivation layer on a surface of the metallic substrate by electrochemical passivation of the metallic substrate under a first electrical current and using a first electrically conducting solution; and providing the corrosion-resistant ceramic coating on an outermost surface of the metallic substrate, the outermost surface in use adapted to be exposed to a corrosive environment, by plasma electrolytic oxidation of the metallic substrate with the passivation layer, in a second electrically conducting solution and under a second electrical current having a discharge voltage. The first and the second electrically conducting solutions comprise a tetrafluoroborate compound.

OPTICAL DIFFUSER AND ITS METHOD OF MANUFACTURE

Methods of manufacture of an optical diffuser. In one embodiment, an optical diffuser is formed by providing a wafer including a silicon slice of which an upper face is covered with a first layer made of a first material itself covered with a second layer made of a second selectively etchable material with respect to the first material. The method further includes forming openings in the second layer extending up to the first layer and filling the openings in the second layer with a third material. The method yet further includes bonding a glass substrate to the wafer on the side of its upper face and removing the silicon slice.

PERHYDROPOLYSILAZANE COMPOSITIONS AND METHODS FOR FORMING OXIDE FILMS USING SAME

A Si-containing film forming composition comprising a catalyst and/or a polysilane and a NH free, C-free, and Si-rich perhydropolysilazane having a molecular weight ranging from approximately 332 dalton to approximately 100,000 dalton and comprising NH free repeating units having the formula [N(SiH3)x(SiH2-)y], wherein x=0, 1, or 2 and y=0, 1, or 2 with x+y=2; and x=0, 1 or 2 and y=1, 2, or 3 with x+y=3. Also disclosed are synthesis methods and applications for using the same.

AMORPHOUS THIN FILMS AND METHOD OF MAKING

Aqueous solutions of halogenides (oxyhalides) of zirconium and hafnium (M) with values of =X/M near one, for X=Cl, Br and I form amorphous solids or glasses, designated as M,X, in contrast to important crystalline oxyhalide end members with =2 (designated as MOX). The present disclosure describes methods for producing amorphous thin films comprising halogenides upon evaporation, and provides some measured physical properties, with attention to compositions for <2. The value of a below which only glasses are formed is about one for oxychlorides and oxybromides of both Zr and Hf. The chemical formulas for all the halogenide thin films prepared as noted above can be written as a function of the single parameter , according to M(OH).sub.4-X.sub..(4-1)H.sub.2O. This is valid for e.g., crystalline zirconium oxychloride octahydrate, and for the glassy solids found for <2 and down to the onset of hydrolysis, 0.5. Thin films made by the disclosed methods are highly dense (90% of theoretical crystal density), extremely smooth (rms <0.4 nm), and highly transparent in the visible spectrum, >90%. Such thin films are useful as alkali diffusion barriers.

METHODS FOR DEPOSITING ANTI-COKING PROTECTIVE COATINGS ON AEROSPACE COMPONENTS
20200361124 · 2020-11-19 ·

Embodiments of the present disclosure generally relate to protective coatings on an aerospace component and methods for depositing the protective coatings. The protective coating can be anti-coking coatings to reduce or suppress coke formation when the aerospace component is heated in the presence of a fuel. In one or more embodiments, a method for depositing the protective coating on an aerospace component includes exposing the aerospace component to a cleaning process to produce a cleaned surface on the aerospace component and sequentially exposing the aerospace component to a precursor and a reactant to form a protective coating on the cleaned surface of the aerospace component by an atomic layer deposition (ALD) process. The aerospace component can be one or more of a fuel nozzle, a combustor liner, a combustor shield, a heat exchanger, a fuel line, a fuel valve, or any combination thereof.

Method for manufacturing a light extraction structure for a UV lamp
10838112 · 2020-11-17 · ·

A method for forming a light extraction layer including nanostructures, the method including: providing a substrate, the substrate being at least partially transparent to UV light; forming a non-aqueous precursor solution comprising fluorine and an alkaline earth metal to form alkaline earth metal difluoride particles; applying the precursor solution on at least a first side of the substrate; drying the substrate at a first temperature for a first period of time; and baking the substrate at a second temperature, higher than the first temperature, for a second period of time, thereby forming a light extraction nanostructure layer comprising alkaline earth metal difluoride nanostructures on the substrate. Also, a light extraction structure and to a UV lamp including such an extraction structure.

Ferroelectric element and method of manufacturing ferroelectric element

A method of manufacturing a ferroelectric element includes forming an insulating film on one side of a metal substrate by an electron beam (EB) vapor deposition method or a sputtering method; forming a metal film on the insulating film by the sputtering method; and forming a ferroelectric film on the metal film by a sol-gel method. The metal substrate includes iron (Fe) and nickel (Ni), and a content of the nickel (Ni) is greater than or equal to 30% and less than or equal to 40%.

Corrosion inhibitor-incorporated layered double hydroxide and sol-gel coating compositions and related processes

A corrosion-resistant coating on an aluminum-containing substrate such as an aluminum substrate, an aluminum alloy substrate (e.g., AA 2024, AA 6061, or AA7075), or other aluminum-containing substrate includes a corrosion inhibitor-incorporated ZnAl layered double hydroxide (LDH) layer and a sol-gel layer. A zinc salt and a corrosion inhibitor (e.g., a salt of an oxyanion of a transition metal such as a vanadate) is dissolved to form a zinc-corrosion inhibitor solution, and the substrate is immersed in or otherwise contacted with the solution to form the corrosion inhibitor-incorporated ZnAl LDH layer on the substrate. A sol-gel composition is applied on the corrosion inhibitor-incorporated ZnAl LDH layer of the substrate to form a sol-gel layer, and the sol-gel layer is cured.

SOL GEL COATED SUPPORT RING
20200251375 · 2020-08-06 ·

A support member for a thermal processing chamber is described. The support member has a sol coating on at least one surface. The sol coating contains a material that blocks a desired wavelength or spectrum of radiation from being transmitted by the material of the support member. The sol coating may be a multi-layer structure that may include adhesion layers, transition layers, and cap layers, in addition to radiation-blocking layers.