C23C18/1233

Process for producing resin substrate having hard coating layer, and resin substrate having hard coating layer

A process for producing a resin substrate having a hard coating layer on at least one side of a resin substrate, comprising, in the following order, a step of applying a hard coating composition containing an organopolysiloxane to at least one side of the resin substrate to form a coating film of the composition, and then applying a first heat treatment to the coating film to form a cured film; an irradiation step of applying a Xe.sub.2 excimer light irradiation treatment to the cured film in an atmosphere having an oxygen concentration of at most 5 vol %; and a step of applying an oxidation treatment to the cured film obtained by the irradiation step and then further applying a second heat treatment to form the hard coating layer.

NET-SHAPE STRUCTURE WITH MICRO-TRUSS CORE

A curved, three-dimensional, ordered micro-truss structure including a series of first struts extending along a first direction, a series of second struts extending along a second direction, and a series of third struts extending along a third direction. The first, second, and third struts interpenetrate one another at a series of nodes. The series of first struts, second struts, third struts, and nodes form a series of ordered unit cells within the micro-truss structure. The series of ordered unit cells define a curved surface.

Assemblies of functionalized textile materials and methods of use thereof

Assemblies of stacked layers of materials are described. The assemblies include functional and structural layers. Functional layers include binderless ceramic materials on woven or non-woven substrates of natural, synthetic, or metallic materials. The layers of functional and structural materials may be configured to transport moisture or heat from an inner surface to an outer surface that is exposed to an ambient environment.

Method for producing hexagonal boron nitride film using borazine oligomer as a precursor

Provided is a method for producing a high-quality boron nitride film grown by using a borazine oligomer as a precursor through a metal catalyst effect. The method solves the problems, such as control of a gaseous precursor and vapor pressure control, occurring in CVD (Chemical vapor deposition) according to the related art, and a high-quality hexagonal boron nitride film is obtained through a simple process at low cost. In addition, the hexagonal boron nitride film may be coated onto various structures and materials. Further, selective coating is allowed so as to carry out coating in a predetermined area and scale-up is also allowed. Therefore, the method may be useful for coating applications of composite materials and various materials.

Graphene coated substrates and resulting composites

The deposition of graphene is accomplished by various techniques that result in a change of the graphene's solubility in the liquid medium. The solubility change enables the deposition of the graphene onto the substrate. Once the graphene is deposited onto the substrate, the at least partially coated substrate may be separated from the liquid medium. The substrates may then serve as a carrier to deliver the graphene to a desired application.

ANTIFOGGING AGENT COMPOSITION, ANTIFOGGING ARTICLE, AND MANUFACTURING METHOD THEREOF

There are provided an antifogging agent composition enabling formation of an antifogging layer excellent in yellowing resistance and bleed resistance and an antifogging article made using the same. The antifogging agent composition contains: a water-soluble epoxy resin; an aluminum compound; and an alkoxysilane compound and/or a partially hydrolyzed condensate of an alkoxysilane compound, wherein the water-soluble epoxy resin is a polyfunctional aliphatic epoxy resin. Further, the antifogging article includes: a substrate; and a resin layer disposed on at least a part of a region on the substrate, having a saturated water absorption amount of 50 mg/cm.sup.3 or more, and having a Martens hardness of 2 N/mm.sup.2 or more.

Net-shape structure with micro-truss core

A curved, three-dimensional, ordered micro-truss structure comprising: a plurality of first struts extending along a first direction; a plurality of second struts extending along a second direction; and a plurality of third struts extending along a third direction, wherein the first, second, and third struts interpenetrate one another at a plurality of nodes, wherein the pluralities of first struts, second struts, third struts, and nodes form a plurality of ordered unit cells within the micro-truss structure, and wherein the plurality of ordered unit cells define a curved surface.

Method for forming dense silicic film
09534145 · 2017-01-03 ·

The present invention provides a dense silicic film and a producing method thereof. This method comprises coating a composition for coating film, which comprises a polymer having a silazane bond on a substrate, on a substrate, irradiating with light having a maximal peak in the range of 160-179 nm wavelength, and then irradiating with light having 10-70 nm wavelength longer maximal peak wavelength than the light used in the previous irradiation.

METHOD FOR CRYSTALLIZATION OF METAL OXIDE THIN FILM BY USING THERMAL DISSIPATION ANNEALING

The present invention relates to a method for crystallization of a metal oxide thin film by using thermal dissipation annealing (TDA) and exhibits an effect enabling high-temperature thermal annealing, which is essential for the performance improvement of a semiconductor material, a sensor material, and the like deposited on a thin-plate substrate, even without degrading the performance of the thin-plate substrate. In addition, a metal oxide thin film prepared by the method of the present invention is in the form of a two-dimensional nanosheet, and thus may have a low defect density (high crystallinity) and a wide surface area. Accordingly, based on the improved photosensitivity and photoreactivity, the metal oxide thin film may be utilized in a high-performance photoelectric device.

ANTIMICROBIAL FILM-COATED SUBSTRATE AND MANUFACTURING METHOD THEREFOR
20250353983 · 2025-11-20 · ·

The present invention relates to an antimicrobial film coating. More specifically, the present invention relates to an antimicrobial film-coated substrate and a manufacturing method therefor. The method of the present invention for manufacturing an antimicrobial film-coated substrate, in which antimicrobial particles are directly formed, comprises the steps of: preparing a coating solution by mixing a metal salt with a hydrophobic solvent; coating the surface of a plastic or polymer substrate with the coating solution; and heat-treating the coated plastic or polymer substrate to form an antimicrobial particle layer on the surface of the plastic or polymer substrate.