Patent classifications
C23C18/1275
Coating methods
A coating method is disclosed including disposing a coating composition into a fluidly communicating space defined by an internal surface of an article. The fluidly communicating space includes at least one aperture, which is sealed, forming an enclosed space. The internal surface and the coating composition are heated under autogenous pressure, coating the internal surface with the coating composition. The at least one aperture is unsealed, re-forming the fluidly communicating space. Another coating method is disclosed in which the coating composition is disposed into a reservoir which is connected in fluid communication with the enclosed space prior to heating under autogenous pressure, coating the internal surface with the coating composition. Yet another coating method is disclosed in which the coating composition and the article are disposed in a vessel, which is sealed, forming the enclosed space prior to heating under autogenous pressure, coating the internal surface with the coating composition.
Method of manufacturing transparent conductive film, the transparent conductive film, element and transparent conductive substrate using the film, as well as device using the substrate
By using a coating method, which is a simple method of manufacturing a transparent conductive film at low cost, a transparent conductive film formed with heating at a low temperature, in particular, lower than 300 C. with both of excellent transparency and conductivity and also with excellent film strength and a method of manufacturing this transparent conductive film are provided.
COATING METHODS
A coating method is disclosed including disposing a coating composition into a fluidly communicating space defined by an internal surface of an article. The fluidly communicating space includes at least one aperture, which is sealed, forming an enclosed space. The internal surface and the coating composition are heated under autogenous pressure, coating the internal surface with the coating composition. The at least one aperture is unsealed, re-forming the fluidly communicating space. Another coating method is disclosed in which the coating composition is disposed into a reservoir which is connected in fluid communication with the enclosed space prior to heating under autogenous pressure, coating the internal surface with the coating composition. Yet another coating method is disclosed in which the coating composition and the article are disposed in a vessel, which is sealed, forming the enclosed space prior to heating under autogenous pressure, coating the internal surface with the coating composition.
Toughened and corrosion- and wear-resistant composite structures and fabrication methods thereof
Composite structures having a reinforced material interjoined with a substrate, wherein the reinforced material comprises a compound selected from the group consisting of titanium monoboride, titanium diboride, and combinations thereof.
Molecular precursor compounds for zinc-group 13 mixed oxide materials
Molecular precursor compounds, processes and compositions for making Zn-Group 13 mixed oxide materials including IZO, GZO, AZO and BZO, by providing inks comprising a molecular precursor compound having the formula M.sup.A.sub.aZn(OROR).sub.3a+2, and printing or depositing the inks on a substrate. The printed or deposited ink films can be treated to convert the molecular precursor compounds to a material.
Silicon-carbon composite anode material for lithium ion batteries and a preparation method thereof
Disclosed in the invention are a silicon-carbon composite anode material for lithium ion batteries and a preparation method thereof The material consists of a porous silicon substrate and a carbon coating layer. The preparation method of the material comprises preparing a porous silicon substrate and a carbon coating layer. The silicon-carbon composite anode material for lithium ion batteries has the advantages of high reversible capacity, good cycle performance and good rate performance. The material respectively shows reversible capacities of 1,556 mAh, 1,290 mAh, 877 mAh and 474 mAh/g at 0.2 C, 1 C, 4 C and 15 C rates; the specific capacity remains above 1,500 mAh after 40 cycles at the rate of 0.2 C and the reversible capacity retention rate is up to 90 percent.
Silicon-nitride-containing separating layer having high hardness
The invention relates to a shaped body comprising a substrate with a firmly adhering separating layer, wherein the separating layer comprises 92-98 wt. % silicon nitride (Si.sub.3N.sub.4) and 2-8 wt. % silicon dioxide (SiO.sub.2) and wherein the separating layer has a total oxygen content of 8 wt. % and a hardness of at least 10 HB 2.5/3 according to DIN EN ISO 6506-1.
Surface treatment method and coating agent
A surface treatment method on a base material coated a surface with a carbon film includes: supplying at least any one of titanium, zirconium, niobium, vanadium, hafnium, tantalum, and tungsten to the carbon film; and heating the carbon film to 400 C. or more under an inert atmosphere, thereby forming a coating film on the base material.
Composition for forming silica layer and silica layer
Provided are a composition for forming a silica layer including a silicon-containing polymer and a solvent, wherein when adding 70 g of the composition for forming the silica layer to a 100 ml container, leaving it at 40 C. for 28 days, and taking 1 ml of gas generated from the composition, 1 ml of the gas includes hydrogen gas (H.sub.2), silane gas (SiH.sub.4), and ammonia gas (NH.sub.3), and the hydrogen gas, silane gas, and ammonia gas satisfy Equation 1: [(hydrogen gas amount (ppm))/(silane gas amount (ppm)+ammonia gas amount (ppm))1.5], a silica layer manufactured therefrom, and an electronic device including the silica layer.
Method for producing hexagonal boron nitride film using borazine oligomer as a precursor
Provided is a method for producing a high-quality boron nitride film grown by using a borazine oligomer as a precursor through a metal catalyst effect. The method solves the problems, such as control of a gaseous precursor and vapor pressure control, occurring in CVD (Chemical vapor deposition) according to the related art, and a high-quality hexagonal boron nitride film is obtained through a simple process at low cost. In addition, the hexagonal boron nitride film may be coated onto various structures and materials. Further, selective coating is allowed so as to carry out coating in a predetermined area and scale-up is also allowed. Therefore, the method may be useful for coating applications of composite materials and various materials.