Patent classifications
C23C18/1291
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
A substrate processing method includes: preparing a substrate in which patterns of a conductor and an insulator are formed in a substrate surface of the substrate; coating the substrate surface of the substrate with an ionic liquid including a metal salt; and applying energy to the substrate coated with the ionic liquid. The applying the energy to the substrate includes forming a metal layer on a surface of the conductor by precipitating a metal of the metal salt on the surface of the conductor by a reduction reaction of the metal salt.
Composition, method of producing substrate, and polymer
A composition includes a polymer and a solvent. The polymer includes a group (X) which is at least one selected from the group consisting of: a group including at least two cyano groups; a group including B(OR).sub.2; a group including PO(OR).sub.2; and a group including P(OR).sub.2. Each R independently represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms. The polymer preferably includes the group (X) at an end of a main chain thereof or at an end of a side chain thereof.
METHOD FOR DEPOSITING AN ALUMINUM OXIDE COATING
A method for depositing on a metal substrate a continuous coating of aluminum oxide by induction heating-assisted pressurized, temperature-controlled chemical deposition, the method including a solvothermal synthesis procedure based on an aluminum oxide precursor dissolved in a water-co-solvent mixture heated by induction to a temperature of between 400 C. and 700 C. and a pressure of between 1 MPa and 25 MPa.