The present invention provides a chemical liquid that has an excellent ruthenium dissolving ability and leaves small amounts of residual ruthenium and sodium, a chemical liquid container, and a method for treating a substrate. The chemical liquid according to an embodiment of the present invention is a chemical liquid used for removing a ruthenium-containing substance on a substrate. The chemical liquid contains hypochlorous acid or a salt thereof and bromic acid or a salt thereof, in which a content of the hypochlorous acid or a salt thereof is 0.1% to 9.0% by mass with respect to a total mass of the chemical liquid, and a content of the bromic acid or a salt thereof is 0.001 to 15.0 ppm by mass with respect to the total mass of the chemical liquid.

The present invention provides a chemical liquid that has an excellent ruthenium dissolving ability and leaves small amounts of residual ruthenium and sodium, a chemical liquid container, and a method for treating a substrate. The chemical liquid according to an embodiment of the present invention is a chemical liquid used for removing a ruthenium-containing substance on a substrate. The chemical liquid contains hypochlorous acid or a salt thereof and bromic acid or a salt thereof, in which a content of the hypochlorous acid or a salt thereof is 0.1% to 9.0% by mass with respect to a total mass of the chemical liquid, and a content of the bromic acid or a salt thereof is 0.001 to 15.0 ppm by mass with respect to the total mass of the chemical liquid.

An etching composition for a silver-containing thin film, the etching composition comprising an inorganic acid compound, a sulfonic acid compound, an organic acid compound, a nitrate, a metal oxidizing agent, an amino acid compound, and water.

A combination mirror and media display device assembly includes a mirror platform. The mirror platform has a media display device viewing area and a reflective area. A reflectivity of the media display device viewing area is less than a reflectivity of the reflective area. The assembly includes a mounting bracket. The mounting bracket is coupled to the mirror platform. The mounting bracket is open on one side and the opening in the mounting bracket is configured to accept a media display device. A method to place a media display device within a mirror platform assembly includes inserting a media display device through an opening in a mounting bracket, wherein a mirror platform is attached to the mounting bracket and the mirror platform has a media display device viewing area. The method includes aligning the media display device with the media display device viewing area during the inserting and coupling the media display device to the mounting bracket, wherein the media display device is removably coupled to the mounting bracket.

A combination mirror and media display device assembly includes a mirror platform. The mirror platform has a media display device viewing area and a reflective area. A reflectivity of the media display device viewing area is less than a reflectivity of the reflective area. The assembly includes a mounting bracket. The mounting bracket is coupled to the mirror platform. The mounting bracket is open on one side and the opening in the mounting bracket is configured to accept a media display device. A method to place a media display device within a mirror platform assembly includes inserting a media display device through an opening in a mounting bracket, wherein a mirror platform is attached to the mounting bracket and the mirror platform has a media display device viewing area. The method includes aligning the media display device with the media display device viewing area during the inserting and coupling the media display device to the mounting bracket, wherein the media display device is removably coupled to the mounting bracket.

An etchant composition includes an inorganic acid compound of about 8 wt % to about 15 wt %, a sulfonic acid compound of about 2.5 wt % to about 8 wt %, a sulfate compound of about 6 wt % to about 14 wt %, an organic acid compound of about 40 wt % to about 55 wt %, a metal or metal salt of about 0.01 wt % to about 0.06 wt %, and water.

A method of forming a surface texture includes arranging a flexible mask (610, 920) with a pattern over a surface (621) of a component (620); and performing electrochemical etching on the surface (621) of the component (620) to form a surface texture on the surface (621) according to the pattern of the flexible mask.

A method of selectively removing NiPt material from a microelectronic substrate, the method comprising contacting the NiPt material with an aqueous etching composition comprising: an oxidising agent; a strong acid; and a source of chloride.

A method of selectively removing NiPt material from a microelectronic substrate, the method comprising contacting the NiPt material with an aqueous etching composition comprising: an oxidising agent; a strong acid; and a source of chloride.

There is provided a method for producing a metal-plated stainless material, the method including performing an acid treatment of treating a stainless steel material with an acidic solution; performing an etching of treating the stainless steel material after the acid treatment with an etching treatment agent; and a modifying the surface of the stainless steel material after the etching into a state suitable for a metal plating process.