A furniture lubricant for coating a linear lacquered furniture slide bar to provide a slide layer with lowered friction. The furniture lubricant comprises a C10 to C28 alkane and a tri-glyceride. The viscosity, according to ISO 3104:1994/COR 1:1997, of the furniture lubricant at 40 C. is 20 to 80 mm.sup.2/s.

A furniture rotary system (100, 200, 300, 400, 500) for a piece of furniture (10, 20, 30, 40, 50) is provided. The furniture rotary system is forming a sliding rotary connection between a rotational member (120, 210, 320, 410, 520) and a stationary member (110, 220, 310, 420, 510), wherein said furniture rotary system (100, 200, 300, 400, 500) comprises at least one sliding surface (114, 214, 314, 414, 514) being coated with a lacquer comprising a resin, wherein said lacquer in turn is at least partly coated with a lipophilic composition coating to provide a slide layer with a lowered friction.

In example implementations, a method for producing a thin film coating is provided. The method includes pre-treating a substrate, placing the substrate in a bath comprising at least phosphoric acid and sulphuric acid to produce a thin anodized layer, rinsing the thin anodized layer in a solution, plating a surface of the thin anodized layer in an electro deposition bath following a plating current profile for a predetermined period, and increasing the plating current to the recommended bath plating current to produce the thin film coating having a desired initial coating thickness.

In example implementations, a method for producing a thin film coating is provided. The method includes pre-treating a substrate, placing the substrate in a bath comprising at least phosphoric acid and sulphuric acid to produce a thin anodized layer, rinsing the thin anodized layer in a solution, plating a surface of the thin anodized layer in an electro deposition bath following a plating current profile for a predetermined period, and increasing the plating current to the recommended bath plating current to produce the thin film coating having a desired initial coating thickness.

A furniture rotary system (100, 200, 300, 400, 500) for a piece of furniture (10, 20, 30, 40, 50) is provided. The furniture rotary system is forming a sliding rotary connection between a rotational member (120, 210, 320, 410, 520) and a stationary member (110, 220, 310, 420, 510), wherein said furniture rotary system (100, 200, 300, 400, 500) comprises at least one sliding surface (114, 214, 314, 414, 514) being coated with a lacquer comprising a resin, wherein said lacquer in turn is at least partly coated with a lipophilic composition coating to provide a slide layer with a lowered friction.

An enhanced anodization method includes forming a porous anodization layer comprising columns of anodization layer material with pores between adjacent columns. The method further includes sealing the porous layer by forming a sealing layer at a top of the porous layer. The sealing layer may be formed by using a hybrid sealing process that combines, in any order, two or more of de-ionized (DI) water seal, Ni sealing, and, PTFE sealing. Alternatively, the sealing layer is formed by conformally coating the columns in the porous layer with one or more layers of a coating material. Further, the coating material may be surface-fluorinated to improve plasma resistance.

An enhanced anodization method includes forming a porous anodization layer comprising columns of anodization layer material with pores between adjacent columns. The method further includes sealing the porous layer by forming a sealing layer at a top of the porous layer. The sealing layer may be formed by using a hybrid sealing process that combines, in any order, two or more of de-ionized (DI) water seal, Ni sealing, and, PTFE sealing. Alternatively, the sealing layer is formed by conformally coating the columns in the porous layer with one or more layers of a coating material. Further, the coating material may be surface-fluorinated to improve plasma resistance.

The present disclosure describes a matrix-free nanostructured substrate for use in mass spectrometry. The substrate may preferably include one or more localized analyte spots for placement of an analyte, where each analyte spot may comprise a nanostructured metal oxide or semiconductor containing nanotubes or nanopores. The substrate may further include unstructured metal, metal oxide, or semiconductor that is not nanotubular or nanoporous in the part of the substrate that surrounds each of the analyte spots. In some embodiments, the nanostructured metal oxide or semiconductor may be chemically or structurally modified, and the analyte spots may additionally or alternatively include secondary nanostructures such as nanorods, nanoparticles, nanocoatings, or nanotubes. This may facilitate energy transfer to the analyte for matrix-free laser desorption/ionization. The analyte spots may preferably be more hydrophilic than the surrounding part of the substrate to ensure concentration of the analyte at the analyte spots.

To provide a surface structure of an aluminum-based member which can further improve heat insulating properties and heat shielding properties of the aluminum-based member. In an aluminum-based member 1 containing at least a silicon composition, a porous oxide film 2 is provided on a surface of the aluminum-based member 1, and the oxide film 2 is constituted to have at least a pore 2a extending from the surface toward an inside in a thickness direction of the oxide film 2 and a void 3a present inside the silicon composition 3 extending in a direction substantially orthogonal to the thickness direction of the oxide film 2.

To provide a surface structure of an aluminum-based member which can further improve heat insulating properties and heat shielding properties of the aluminum-based member. In an aluminum-based member 1 containing at least a silicon composition, a porous oxide film 2 is provided on a surface of the aluminum-based member 1, and the oxide film 2 is constituted to have at least a pore 2a extending from the surface toward an inside in a thickness direction of the oxide film 2 and a void 3a present inside the silicon composition 3 extending in a direction substantially orthogonal to the thickness direction of the oxide film 2.