Improved hydrochlorination reactors, which have a larger internal volume and hence functional capacity than presently available hydrochlorination reactors, may be prepared with reactor walls having inner and outer layers where each layer provides a unique benefit, the inner layer having hydrogen chloride resistance and the outer layer having high strength at elevated temperature and pressure. Alternatively, or additionally, hoops may be disposed along the outside of the reactor wall to provide additional strength to the reactor during operation. Specified materials may be used to form the reactor wall in order to provide both acid resistance and high strength at elevated operating temperatures.

A method and an apparatus for manufacturing trichlorosilane are disclosed. A polymer containing high boiling chlorosilane compounds that are generated in a polycrystalline silicon manufacturing process are mixed with hydrogen chloride and introduced into a decomposition furnace. The polymer and the hydrogen chloride are reacted at a temperature of 450 C., and preferably of 450 C. or more and 700 C. or less. Preferably a mixture containing the polymer and hydrogen chloride of 10 to 30 mass % with respect to the weight of the polymer is introduced into the decomposition furnace.

The invention relates to a process for the production of monosilanes of formula H4-nSiCln with n being 2, 3 or 4 comprising the step of subjecting a starting material composition comprising one or more disilanes with formula HxSi2Cl6-x containing at least one SiH bond and optionally further silanes, in particular the side-product mixture of the Siemens Process or fractions thereof, to a reaction with a reaction-promoting agent chosen fromether/HCI solutionsamines, phosphines, or mixtures thereofammonium halides, phosphonium halides, or mixtures thereof at temperatures below 200 C.