The present invention is to provide a toner for developing electrostatic images, which has an excellent balance between low-temperature fixability and heat-resistant shelf stability, which has good toner conveyance amount stability and printing durability, and which has less occurrence of fog in a high temperature and high humidity environment. Disclosed is a toner for developing electrostatic images, comprising colored resin particles containing a binder resin and a colorant, and an external additive, wherein the toner comprises, as the external additive, fine silica particles in an amount of 0.5 to 3.0 parts by mass with respect to 100 parts by mass of the colored resin particles, the fine silica particles having a hydrophobicity of 15 to 49% that is determined after a high-temperature and high-humidity incubation.

Cross-linked sol-gel like materials and cross-linked aerogels, as well as methods for making such cross-linked sol-gel like materials and cross-linked aerogels are described.

Cross-linked sol-gel like materials and cross-linked aerogels, as well as methods for making such cross-linked sol-gel like materials and cross-linked aerogels are described.

The disclosure relates to the field of electronic materials, and in particular to a composite film of fluorinated polybenzoxazole (6FPBO) and triple-shelled mesoporous silica hollow spheres, and to its preparation and use. The composite film comprises fluorinated polybenzoxazole as a matrix and amino-functionalized triple-shelled mesoporous silica hollow spheres which are dispersed in the fluorinated polybenzoxazole matrix. A mass ratio of (amino-functionalized triple-shelled mesoporous silica hollow spheres)/(fluorinated polybenzoxazole) is 1/100 to 5/100. The composite film has excellent thermal stability and a lower dielectric constant.

The disclosure relates to the field of electronic materials, and in particular to a composite film of fluorinated polybenzoxazole (6FPBO) and triple-shelled mesoporous silica hollow spheres, and to its preparation and use. The composite film comprises fluorinated polybenzoxazole as a matrix and amino-functionalized triple-shelled mesoporous silica hollow spheres which are dispersed in the fluorinated polybenzoxazole matrix. A mass ratio of (amino-functionalized triple-shelled mesoporous silica hollow spheres)/(fluorinated polybenzoxazole) is 1/100 to 5/100. The composite film has excellent thermal stability and a lower dielectric constant.

To provide modified colloidal silica capable of improving the stability of the polishing speed with time when used as abrasive grains in a polishing composition for polishing a polishing object that contains a material to which charged modified colloidal silica easily adheres, such as a SiN wafer, and to provide a method for producing the modified colloidal silica.

Modified colloidal silica, being obtained by modifying raw colloidal silica, wherein the raw colloidal silica has a number distribution ratio of 10% or less of microparticles having a particle size of 40% or less relative to a volume average particle size based on Heywood diameter (equivalent circle diameter) as determined by image analysis using a scanning electron microscope.

To provide modified colloidal silica capable of improving the stability of the polishing speed with time when used as abrasive grains in a polishing composition for polishing a polishing object that contains a material to which charged modified colloidal silica easily adheres, such as a SiN wafer, and to provide a method for producing the modified colloidal silica.

Modified colloidal silica, being obtained by modifying raw colloidal silica, wherein the raw colloidal silica has a number distribution ratio of 10% or less of microparticles having a particle size of 40% or less relative to a volume average particle size based on Heywood diameter (equivalent circle diameter) as determined by image analysis using a scanning electron microscope.

To provide modified colloidal silica capable of improving the stability of the polishing speed with time when used as abrasive grains in a polishing composition for polishing a polishing object that contains a material to which charged modified colloidal silica easily adheres, such as a SiN wafer, and to provide a method for producing the modified colloidal silica.

Modified colloidal silica, being obtained by modifying raw colloidal silica, wherein

the raw colloidal silica has a number distribution ratio of 10% or less of microparticles having a particle size of 40% or less relative to a volume average particle size based on Heywood diameter (equivalent circle diameter) as determined by image analysis using a scanning electron microscope.

To provide modified colloidal silica capable of improving the stability of the polishing speed with time when used as abrasive grains in a polishing composition for polishing a polishing object that contains a material to which charged modified colloidal silica easily adheres, such as a SiN wafer, and to provide a method for producing the modified colloidal silica.

Modified colloidal silica, being obtained by modifying raw colloidal silica, wherein

the raw colloidal silica has a number distribution ratio of 10% or less of microparticles having a particle size of 40% or less relative to a volume average particle size based on Heywood diameter (equivalent circle diameter) as determined by image analysis using a scanning electron microscope.

A method for producing an active silicic acid solution in which the existing amount of foreign matters as plate-like fine particles is reduced and a method for producing a silica sol in which such foreign matters are reduced. The method fulfills the following condition: the existing amount of plate-like fine particles having a length of one side of 0.2 to 4.0 m and a thickness of 1 to 100 nm is measured to be 0% to 30% in accordance with measuring method A, the method including the steps of: preparing an active silicic acid solution by subjecting an alkali silicate aqueous solution having a silica concentration of 0.5% by mass to 10.0% by mass to cation-exchange to remove alkaline components; and filtering the active silicic acid solution through a filter whose removal rate of particles having a primary particle size of 1.0 m is 50% or more.