Patent classifications
C03C3/115
ENAMEL COMPOSITION AND METHOD OF PREPARING THE SAME
An enamel composition having improved cleaning performance, a method of preparing the enamel composition, and a cooking device having the enamel composition are disclosed. The enamel composition includes glass frit and a metal oxide catalyst, wherein the metal oxide catalyst includes at least one of a unary metal oxide or a binary metal oxide, thereby allowing cleaning at room temperature while exhibiting good fouling resistance to allow easy removal of oil contaminants, such as chicken fat.
GLASS COMPOSITION AND DENTAL COMPOSITION
A glass composition contains cesium (Cs), at least one of potassium (K) or sodium (Na), and silicon (Si), wherein a content of the cesium (Cs) in terms of oxide is 9% by mass or more, wherein when the potassium (K) is contained in the glass composition, a content of the potassium (K) in terms of oxide is 5% by mass or more, wherein when the sodium (Na) is contained in the glass composition, a content of the sodium (Na) in terms of oxide is 1% by mass or more, and wherein the glass composition does not contain barium (Ba) or contains 0.5% by mass or less of barium (Ba) in terms of oxide.
Composition for enamel, method for preparing a composition for enamel, and cooking appliance
A composition for enamel may include 10 to 45 wt % of SiO.sub.2; 1 to 10 wt % of B.sub.2O.sub.3, 10 to 20 wt % of one or more of Na.sub.2O, K.sub.2O, and/or Li.sub.2O, 1 to 5 wt % of NaF, 1 to 10 wt % of ZnO, 5 to 15 wt % of TiO.sub.2, 3 to 7 wt % of MoO.sub.3, 5 to 15 wt % of Bi.sub.2O.sub.3, 1 to 5 wt % of CeO.sub.2, and 0.5 to 10 wt % of one or more of MnO.sub.2, Fe.sub.2O.sub.3, and/or Co.sub.3O.sub.4. The composition may be used to make a coating layer provided on a cooking appliance so that contaminants may be easily cleaned from the cooking appliance at a room temperature.
Composition for enamel, method for preparing a composition for enamel, and cooking appliance
A composition for enamel may include 10 to 45 wt % of SiO.sub.2; 1 to 10 wt % of B.sub.2O.sub.3, 10 to 20 wt % of one or more of Na.sub.2O, K.sub.2O, and/or Li.sub.2O, 1 to 5 wt % of NaF, 1 to 10 wt % of ZnO, 5 to 15 wt % of TiO.sub.2, 3 to 7 wt % of MoO.sub.3, 5 to 15 wt % of Bi.sub.2O.sub.3, 1 to 5 wt % of CeO.sub.2, and 0.5 to 10 wt % of one or more of MnO.sub.2, Fe.sub.2O.sub.3, and/or Co.sub.3O.sub.4. The composition may be used to make a coating layer provided on a cooking appliance so that contaminants may be easily cleaned from the cooking appliance at a room temperature.
GLASS COMPOSITION AND COOKING APPLIANCE
Provided is a glass composition comprising a glass frit containing P.sub.2O.sub.5, BaO, ZnO, group I-based oxide and group II-based oxide, wherein the P.sub.2O.sub.5 is contained in an amount of 20 wt % to 55 wt % based on a total weight of the glass frit, wherein each of the BaO and ZnO is contained in an amount of 2 to 30% by weight based on the total weight of the glass frit, wherein the group I-based oxide is contained in an amount of 5 to 20% by weight based on the total weight of the glass frit, wherein the group II-based oxide is contained in an amount of 1 to 15% by weight based on the total weight of the glass frit.
Enamel composition, method for preparing enamel composition, and cooking appliance
An enamel composition, a method for preparing an enamel composition, and a cooking appliance are provided. The enamel composition may include 15 to 50 wt % of silicon dioxide (SiO.sub.2); 1 to 10 wt % of boron oxide (B.sub.2O.sub.3); 10 to 20 wt % of at least one of lithium oxide (Li.sub.2O), sodium oxide (Na.sub.2O), or potassium oxide (K.sub.2O); 1 to 5 wt % of sodium fluoride (NaF); 1 to 10 wt % of zinc oxide (ZnO); and 20 to 50 wt % of at least one of titanium dioxide (TiO.sub.2), molybdenum oxide (MoO.sub.3), bismuth oxide (Bi.sub.2O.sub.3), cerium dioxide (CeO.sub.2), manganese dioxide (MnO.sub.2), or Iron oxide (Fe.sub.2O.sub.3), which provides an enamel composition with a reduced cleaning time, and facilitates cleaning without soaking in water.
Enamel composition, method for preparing enamel composition, and cooking appliance
An enamel composition, a method for preparing an enamel composition, and a cooking appliance are provided. The enamel composition may include 15 to 50 wt % of silicon dioxide (SiO.sub.2); 1 to 10 wt % of boron oxide (B.sub.2O.sub.3); 10 to 20 wt % of at least one of lithium oxide (Li.sub.2O), sodium oxide (Na.sub.2O), or potassium oxide (K.sub.2O); 1 to 5 wt % of sodium fluoride (NaF); 1 to 10 wt % of zinc oxide (ZnO); and 20 to 50 wt % of at least one of titanium dioxide (TiO.sub.2), molybdenum oxide (MoO.sub.3), bismuth oxide (Bi.sub.2O.sub.3), cerium dioxide (CeO.sub.2), manganese dioxide (MnO.sub.2), or Iron oxide (Fe.sub.2O.sub.3), which provides an enamel composition with a reduced cleaning time, and facilitates cleaning without soaking in water.
ENAMEL COMPOSITION, METHOD FOR PREPARING ENAMEL COMPOSITION, AND COOKING APPLIANCE
An enamel composition, a method for preparing an enamel composition, and a cooking appliance are provided. The enamel composition may include 15 to 50 wt % of silicon dioxide (SiO.sub.2); 1 to 10 wt % of boron oxide (B.sub.2O.sub.3); 10 to 20 wt % of at least one of lithium oxide (Li.sub.2O), sodium oxide (Na.sub.2O), or potassium oxide (K.sub.2O); 1 to 5 wt % of sodium fluoride (NaF); 1 to 10 wt % of zinc oxide (ZnO); and 20 to 50 wt % of at least one of titanium dioxide (TiO.sub.2), molybdenum oxide (MoO.sub.3), bismuth oxide (Bi.sub.2O.sub.3), cerium dioxide (CeO.sub.2), manganese dioxide (MnO.sub.2), or Iron oxide (Fe.sub.2O.sub.3), which provides an enamel composition with a reduced cleaning time, and facilitates cleaning without soaking in water.
ENAMEL COMPOSITION, METHOD FOR PREPARING ENAMEL COMPOSITION, AND COOKING APPLIANCE
An enamel composition, a method for preparing an enamel composition, and a cooking appliance are provided. The enamel composition may include 15 to 50 wt % of silicon dioxide (SiO.sub.2); 1 to 10 wt % of boron oxide (B.sub.2O.sub.3); 10 to 20 wt % of at least one of lithium oxide (Li.sub.2O), sodium oxide (Na.sub.2O), or potassium oxide (K.sub.2O); 1 to 5 wt % of sodium fluoride (NaF); 1 to 10 wt % of zinc oxide (ZnO); and 20 to 50 wt % of at least one of titanium dioxide (TiO.sub.2), molybdenum oxide (MoO.sub.3), bismuth oxide (Bi.sub.2O.sub.3), cerium dioxide (CeO.sub.2), manganese dioxide (MnO.sub.2), or Iron oxide (Fe.sub.2O.sub.3), which provides an enamel composition with a reduced cleaning time, and facilitates cleaning without soaking in water.
Doped silica-titania glass having low expansivity and methods of making the same
A method of forming a doped silica-titania glass is provided. The method includes blending batch materials comprising silica, titania, and at least one dopant. The method also includes heating the batch materials to form a glass melt. The method further includes consolidating the glass melt to form a glass article, and annealing the glass article.