Patent classifications
C04B41/5012
DENTAL ZIRCONIA TREATMENT TECHNOLOGY
The present disclosure relates to the field of dental material treatment, and particularly to a dental zirconia treatment technology. The specific technical solution is as follows: a zirconia treatment method, mainly involving color masking the zirconia, surface roughening the zirconia, coloring the zirconia, surface protection treatment and additional protective film treatment. Based on this treatment method, a brand-new color masking liquid, coloring liquid and adhesive solution are proposed. The present zirconia treatment technology not only meets the individualized requirements of patients for teeth, but also meets the requirements of dentists for convenient operation, so that it is of great value in application and popularization on the market.
DENTAL ZIRCONIA TREATMENT TECHNOLOGY
The present disclosure relates to the field of dental material treatment, and particularly to a dental zirconia treatment technology. The specific technical solution is as follows: a zirconia treatment method, mainly involving color masking the zirconia, surface roughening the zirconia, coloring the zirconia, surface protection treatment and additional protective film treatment. Based on this treatment method, a brand-new color masking liquid, coloring liquid and adhesive solution are proposed. The present zirconia treatment technology not only meets the individualized requirements of patients for teeth, but also meets the requirements of dentists for convenient operation, so that it is of great value in application and popularization on the market.
METHODS IN FORMING TEMPERATURE RESISTANT INORGANIC NANO-SCALE MEMBRANE LAYER FOR IMPROVED HIGH TEMPERATURE FILTRATION
Aspects of the disclosure provide methods of making a coated filtration material. Various methods include providing a base filter material and applying a first coating to the base filter material, the first coating being in nanoparticle form. A second coating is applied on top of the first coating, the second coating being a nanoscale inorganic material. The method further includes removing the first coating in such a way that the second coating remains on the base filter material. Methods of the disclosure can be used to manufacture coated filtration materials having a coating with a porosity of 90% or greater and a pore size in the range of 0.1-0.5 μm.
METHODS IN FORMING TEMPERATURE RESISTANT INORGANIC NANO-SCALE MEMBRANE LAYER FOR IMPROVED HIGH TEMPERATURE FILTRATION
Aspects of the disclosure provide methods of making a coated filtration material. Various methods include providing a base filter material and applying a first coating to the base filter material, the first coating being in nanoparticle form. A second coating is applied on top of the first coating, the second coating being a nanoscale inorganic material. The method further includes removing the first coating in such a way that the second coating remains on the base filter material. Methods of the disclosure can be used to manufacture coated filtration materials having a coating with a porosity of 90% or greater and a pore size in the range of 0.1-0.5 μm.
Nanoscale etching of light absorbing materials using light and an electron donor solvent
A method for etching a light absorbing material permits directly writing a pattern of etching of silicon nitride and other light absorbing materials, without the need of a lithographic mask, and allows the creation of etched features of less than one micron in size. The method can be used for etching deposited silicon nitride films, freestanding silicon nitride membranes, and other light absorbing materials, with control over the thickness achieved by optical feedback. The etching is promoted by solvents including electron donor species, such as chloride ions. The method provides the ability to etch silicon nitride and other light absorbing materials, with fine spatial and etch rate control, in mild conditions, including in a biocompatible environment. The method can be used to create nanopores and nanopore arrays.
Nanoscale etching of light absorbing materials using light and an electron donor solvent
A method for etching a light absorbing material permits directly writing a pattern of etching of silicon nitride and other light absorbing materials, without the need of a lithographic mask, and allows the creation of etched features of less than one micron in size. The method can be used for etching deposited silicon nitride films, freestanding silicon nitride membranes, and other light absorbing materials, with control over the thickness achieved by optical feedback. The etching is promoted by solvents including electron donor species, such as chloride ions. The method provides the ability to etch silicon nitride and other light absorbing materials, with fine spatial and etch rate control, in mild conditions, including in a biocompatible environment. The method can be used to create nanopores and nanopore arrays.
Method of Masking a Dental Support Structure of a Dental Prosthesis Made of Highly Translucent Ceramic Material
A method for masking the appearance of a support structure underlying a highly translucent ceramic dental restoration s provided. The porous form of a zirconia ceramic dental restoration is treated with a liquid masking composition comprising 0.4 wt % to 50 wt % of one or more masking agents. The masking composition is applied to the internal surface of a restoration and a region of the facial surface of the restoration that is opposite the internal surface. After application of the masking compositions, treated zirconia restoration is sintered to greater than 98% theoretical density.
Method of Masking a Dental Support Structure of a Dental Prosthesis Made of Highly Translucent Ceramic Material
A method for masking the appearance of a support structure underlying a highly translucent ceramic dental restoration s provided. The porous form of a zirconia ceramic dental restoration is treated with a liquid masking composition comprising 0.4 wt % to 50 wt % of one or more masking agents. The masking composition is applied to the internal surface of a restoration and a region of the facial surface of the restoration that is opposite the internal surface. After application of the masking compositions, treated zirconia restoration is sintered to greater than 98% theoretical density.
Composite brake disks with an integrated heat sink, methods for manufacturing the same, and methods for producing encapsulated heat sink material
Brake disks with integrated heat sink are provided. Brake disk includes a fiber-reinforced composite material and an encapsulated heat sink material impregnated into the fiber-reinforced composite material. The encapsulated heat sink material comprises a heat sink material encapsulated within a silicon-containing encapsulation layer. Methods for manufacturing the brake disk with integrated heat sink and methods for producing the encapsulated heat sink material are also provided.
Composite brake disks with an integrated heat sink, methods for manufacturing the same, and methods for producing encapsulated heat sink material
Brake disks with integrated heat sink are provided. Brake disk includes a fiber-reinforced composite material and an encapsulated heat sink material impregnated into the fiber-reinforced composite material. The encapsulated heat sink material comprises a heat sink material encapsulated within a silicon-containing encapsulation layer. Methods for manufacturing the brake disk with integrated heat sink and methods for producing the encapsulated heat sink material are also provided.