Patent classifications
C
CHEMISTRY; METALLURGY
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C07
ORGANIC CHEMISTRY
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C07C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
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309/00
Sulfonic acids; Halides, esters, or anhydrides thereof
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C07C309/02
having sulfo groups bound to acyclic carbon atoms
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C07C309/03
of an acyclic saturated carbon skeleton
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C07C309/07
containing oxygen atoms bound to the carbon skeleton
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C07C309/09
containing etherified hydroxy groups bound to the carbon skeleton
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C07C309/09

Resist composition and patterning process
10101654 · 2018-10-16 · ·

A resist composition comprising a 2,5,8,9-teraaza-1-phosphabicyclo[3.3.3]undocane, biguanide or phosphazene salt of an iodinated aromatic group-containing carboxylic acid exhibits a sensitizing effect and an acid diffusion suppressing effect and forms a pattern having improved resolution, LWR and CDU.

RESIST COMPOSITION AND PATTERNING PROCESS
20180081267 · 2018-03-22 · ·

A resist composition comprising a 2,5,8,9-teraaza-1-phosphabicyclo[3.3.3]undocane, biguanide or phosphazene salt of an iodinated aromatic group-containing carboxylic acid exhibits a sensitizing effect and an acid diffusion suppressing effect and forms a pattern having improved resolution, LWR and CDU.

Sulfonate-based compound and method for preparing same
09776958 · 2017-10-03 · ·

The present application relates to a sulfonate-based compound and a method for preparing the same.

SULFONATE-BASED COMPOUND AND METHOD FOR PREPARING SAME
20170210707 · 2017-07-27 · ·

The present application relates to a sulfonate-based compound and a method for preparing the same.