C07C309/31

Light-emitting electrochemical cell, composition for forming light-emitting layer of light-emitting electrochemical cell, and ionic compound for light-emitting layer of light-emitting electrochemical cell

A light-emitting electrochemical cell has a light-emitting layer and electrodes and disposed on the respective surface thereof. The light-emitting layer includes an organic polymeric light-emitting material and an ionic compound represented by the general formula (1). The ring A.sup.1 denotes an aromatic ring; X is S, C or P; R.sup.1 denotes R or OR, and R denotes an alkyl group; n denotes 0 or 1; B denotes O, OR.sup.2 or A.sup.2, R.sup.2 denotes a saturated hydrocarbon group, and A.sup.2 denotes an aromatic ring; the bond a is a single bond or a double bond; the bond a between B and X is a double bond and B is O; when X is P, the bond a between B and X is a single bond and B is OR.sup.2 or A.sup.2; d is 1 or more; and Y.sup.+ denotes a cation. ##STR00001##

Light-emitting electrochemical cell, composition for forming light-emitting layer of light-emitting electrochemical cell, and ionic compound for light-emitting layer of light-emitting electrochemical cell

A light-emitting electrochemical cell has a light-emitting layer and electrodes and disposed on the respective surface thereof. The light-emitting layer includes an organic polymeric light-emitting material and an ionic compound represented by the general formula (1). The ring A.sup.1 denotes an aromatic ring; X is S, C or P; R.sup.1 denotes R or OR, and R denotes an alkyl group; n denotes 0 or 1; B denotes O, OR.sup.2 or A.sup.2, R.sup.2 denotes a saturated hydrocarbon group, and A.sup.2 denotes an aromatic ring; the bond a is a single bond or a double bond; the bond a between B and X is a double bond and B is O; when X is P, the bond a between B and X is a single bond and B is OR.sup.2 or A.sup.2; d is 1 or more; and Y.sup.+ denotes a cation. ##STR00001##

Amphiphilic Cyclohexylbenzene Compounds Derived from Alpha Olefins or Vinylidene Alpha Olefin Dimers

Compositions comprising a sulfonated reaction product or a salt thereof may be prepared from a cyclohexylbenzene compound that has been alkylated with an olefin of formula R.sup.1R.sup.2CCH.sub.2, wherein R.sup.1 is a C.sub.6-C.sub.24 hydrocarbyl group, and R.sup.2 is H or a C.sub.6-C.sub.24 hydrocarbyl group. Methods for sulfonating an alkylated cyclohexylbenzene compound prepared from a cyclohexylbenzene compound that has been alkylated with an olefin of formula R.sup.1R.sup.2CCH.sub.2, wherein R.sup.1 is a C.sub.6-C.sub.24 hydrocarbyl group, and R.sup.2 is H or a C.sub.6-C.sub.24 hydrocarbyl group may comprise contacting the alkylated cyclohexylbenzene compound with a sulfonating reagent; forming a sulfonated reaction product; and converting the sulfonated reaction product into a sulfonate salt.

EMPLOYING LOW REACTIVITY HYDROCARBON DISPERSING AGENT IN AQUEOUS POLYMERIZATION OF FLUOROPOLYMERS

A process for polymerizing at least one fluoromonomer in an aqueous medium containing initiator and hydrocarbon dispersing agent to form an aqueous dispersion of particles of fluoropolymer. The hydrocarbon dispersing agent comprises a compound of formula I:


R(XZ).sub.nI

wherein R is a hydrophobic hydrocarbon moiety that comprises one or more saturated or unsaturated, non-cyclic or cyclic aliphatic groups, the percentage of total CH.sub.3 groups in relation to the total of CH.sub.3, CH.sub.2 and CH groups in said one or more aliphatic groups being at least about 70%, said hydrophobic moiety being free of siloxane units; wherein each X may be the same or different and represents an ionic hydrophilic moiety; wherein each Z may be a same or different and represents one or more counter ions for said ionic hydrophilic moiety; and wherein n is 1 to 3.

EMPLOYING LOW REACTIVITY HYDROCARBON DISPERSING AGENT IN AQUEOUS POLYMERIZATION OF FLUOROPOLYMERS

A process for polymerizing at least one fluoromonomer in an aqueous medium containing initiator and hydrocarbon dispersing agent to form an aqueous dispersion of particles of fluoropolymer. The hydrocarbon dispersing agent comprises a compound of formula I:


R(XZ).sub.nI

wherein R is a hydrophobic hydrocarbon moiety that comprises one or more saturated or unsaturated, non-cyclic or cyclic aliphatic groups, the percentage of total CH.sub.3 groups in relation to the total of CH.sub.3, CH.sub.2 and CH groups in said one or more aliphatic groups being at least about 70%, said hydrophobic moiety being free of siloxane units; wherein each X may be the same or different and represents an ionic hydrophilic moiety; wherein each Z may be a same or different and represents one or more counter ions for said ionic hydrophilic moiety; and wherein n is 1 to 3.

DIVALENT PHOSPHAZENIUM SALT AND POLYALKYLENE OXIDE COMPOSITION CONTAINING THE SAME, AS WELL AS POLYURETHANE-FORMING COMPOSITION CONTAINING THE POLYALKYLENE OXIDE COMPOSITION

Provided are a divalent phosphazenium salt which is neutral and is excellent in thermal stability and aldehyde scavenging ability, and a method for producing the same. Also provided are a polyalkylene oxide composition having a volatile aldehyde amount reduced, having generation of odor and turbidity suppressed and being excellent in urethanization reactivity, and a method for producing such a polyalkylene oxide composition, as well as a polyurethane-forming composition containing the polyalkylene oxide composition. A divalent phosphazenium salt having a specific structure. Also, a polyalkylene oxide composition comprising a divalent phosphazenium salt having a specific structure and a polyalkylene oxide, a method for producing the same, and a polyurethane-forming composition containing the same.

Resist composition and patterning process

A resist composition comprising a base polymer and a sulfonium or iodonium salt capable of generating fluorobenzenesulfonic acid bonded to iodized benzoic acid offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.

Resist composition and patterning process

A resist composition comprising a base polymer and a sulfonium or iodonium salt capable of generating fluorobenzenesulfonic acid bonded to iodized benzoic acid offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.

Resist composition and patterning process

A resist composition comprising a base polymer and a sulfonium or iodonium salt capable of generating sulfonic acid bonded to iodized benzene ring offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.

Resist composition and patterning process

A resist composition comprising a base polymer and a sulfonium or iodonium salt capable of generating sulfonic acid bonded to iodized benzene ring offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.