The present invention provides a resist composition, including: (A) a sulfonium salt containing an anion and a cation, the cation including a partial structure shown by the following general formula (A1); and (B) a polymer compound containing a repeating unit shown by the following general formula (B1). The present invention provides a resist composition that causes few defects and is excellent in lithography performance, having regulated acid diffusion, in photolithography using a high energy beam as a light source, and a resist patterning process using this resist composition.

##STR00001##

The present invention provides a resist composition, including: (A) a sulfonium salt containing an anion and a cation, the cation including a partial structure shown by the following general formula (A1); and (B) a polymer compound containing a repeating unit shown by the following general formula (B1). The present invention provides a resist composition that causes few defects and is excellent in lithography performance, having regulated acid diffusion, in photolithography using a high energy beam as a light source, and a resist patterning process using this resist composition.

##STR00001##

Disclosed are compounds of general formula (I): ##STR00001##
and pharmaceutically acceptable salts thereof, formulations, methods and uses in, for example, the treatment of disease.

A negative resist composition comprising (A) a sulfonium compound of betaine type and (B) a polymer is provided. The resist composition is effective for controlling acid diffusion during the exposure step, exhibits a very high resolution during pattern formation, and forms a pattern with minimal LER.

A negative resist composition comprising (A) a sulfonium compound of betaine type and (B) a polymer is provided. The resist composition is effective for controlling acid diffusion during the exposure step, exhibits a very high resolution during pattern formation, and forms a pattern with minimal LER.

The invention relates to a stabilizer for L-012 or a salt thereof, a stabilization method for L-012 or a salt thereof, coexisting with the stabilizer and L-012 or a salt thereof, and the like. The stabilizer is represented by Formula [1]:

##STR00001##

wherein p pieces of M1 each independently represent a hydrogen atom or an alkali metal atom, q pieces of R1 each independently represent a hydroxy group or a sulfonic acid group, m represents 0 or 1, p represents an integer of 1 to 3, q represents an integer of 0 to 4, Y represents a nitrogen atom or a CH group (a methine group), and Z represents an aryl group having a specific structure or a pyrazolyl group having a specific structure.

The present invention provides compounds and compositions thereof which are useful as inhibitors of Bruton's tyrosine kinase and which exhibit desirable characteristics for the same.

The present invention provides compounds and compositions thereof which are useful as inhibitors of Bruton's tyrosine kinase and which exhibit desirable characteristics for the same.

The present invention relates to novel salts of a heterocyclic compound as a protein kinase inhibitor and uses thereof. The novel salts are superb in terms of water solubility and physical and chemical stability and thus can be usefully employed in formulating medicinal products. In addition, the heterocyclic compound or the salts thereof can effectively treat and prevent atopic dermatitis and inflammatory bowel disease.

The present invention relates to novel salts of a heterocyclic compound as a protein kinase inhibitor and uses thereof. The novel salts are superb in terms of water solubility and physical and chemical stability and thus can be usefully employed in formulating medicinal products. In addition, the heterocyclic compound or the salts thereof can effectively treat and prevent atopic dermatitis and inflammatory bowel disease.