C07D251/32

MULTI-AZIRIDINE COMPOUND

The present invention relates to a multi-aziridine compound having: ⋅a) from 2 to 6 of the following structural units (A): whereby R.sub.1 is H, R.sub.2 and R.sub.4 are independently chosen from H or an aliphatic hydrocarbon group containing from 1-4 carbon atoms, R.sub.3 is an aliphatic hydrocarbon group containing from 1-4 carbon atoms, R′═H or an aliphatic hydrocarbon group containing from 1 to 4 carbon atoms; R″ and R′″ are independently chosen from an aliphatic hydrocarbon group containing from 1 to 4 carbon atoms, a cycloaliphatic hydrocarbon group containing from 4 to 12 carbon atoms or an aromatic hydrocarbon group containing from 6 to 12 carbon atoms, b) one or more linking chains wherein each one of these linking chains links two of the structural units A; and c) a molecular weight in the range from 600 Daltons to 5000 Daltons.

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WATERBORNE CROSSLINKER COMPOSITION

The present invention relates to a multi-aziridine crosslinker composition, characterized in that the composition is an aqueous dispersion having a pH ranging from 9 to 14 and comprising a multi-aziridine compound in dispersed form, wherein said multi-aziridine compound has: a. from 2 to 6 of the following structural units A: (A) whereby R.sub.1, R.sub.2, R.sub.3 and R.sub.4 are H; m is 1, R′ and R″ are according to (1) or (2): (2) R′═H or an aliphatic hydrocarbon group containing from 1 to 14 carbon atoms, and R″=an alkyl group containing from 1 to 4 carbon atoms, CH2-O—(C═O)—R′″ or CH2-O—R″″, whereby R′″ is an alkyl group containing from 4 to 12 carbon atoms and R″″ is an alkyl group containing from 1 to 14 carbon atoms, (2) R′ and R″ form together a saturated cycloaliphatic hydrocarbon group containing from 5 to 8 carbon atoms; b. one or more linking chains wherein each one of these linking chains links two of the structural units A; and c. a molecular weight in the range from 600 to 10000 Daltons.

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(AZIRIDINYL HYDROXY)-FUNCTIONAL ORGANIC COMPOUNDS

The invention relates to particular (aziridinyl hydroxy)-functional organic component. The invention further relates to liquid compositions comprising said (aziridinyl hydroxy)-functional organic component. The invention further relates to coating compositions comprising said (aziridinyl hydroxy)-functional organic component. The invention further relates to liquid coating compositions comprising said (aziridinyl hydroxy)-functional organic component. The invention further relates to a kit-of-parts comprising in one of its parts a liquid composition comprising a particular (aziridinyl hydroxy)-functional organic component. The invention further relates to cured forms of said liquid compositions, coating compositions, and liquid coating compositions. The invention further relates to articles comprising the (aziridinyl hydroxy)-functional organic component and/or the liquid compositions and/or the liquid coating compositions and/or their cured forms. The invention further relates to various uses of the (aziridinyl hydroxy)-functional organic component and/or said liquid compositions, and/or said liquid coating compositions, and/or said kit-of-parts and/or said cured forms.

Compounds having a stabilizing effect, method for producing said compounds, composition containing said stabilizing compounds, and uses of the compounds

The invention relates to compounds of a new type which have a stabilizing effect and in particular provide stabilization with respect to oxidative thermal and/or actinic decomposition of or damage to organic materials. The compounds are represented by general formula I specified below. The invention further relates to a method for producing such compounds, to compositions containing said compound, to a method for stabilizing organic compounds by means of the stabilizing compounds, and to the use of the stabilizing compounds to stabilize organic materials.

Compounds having a stabilizing effect, method for producing said compounds, composition containing said stabilizing compounds, and uses of the compounds

The invention relates to compounds of a new type which have a stabilizing effect and in particular provide stabilization with respect to oxidative thermal and/or actinic decomposition of or damage to organic materials. The compounds are represented by general formula I specified below. The invention further relates to a method for producing such compounds, to compositions containing said compound, to a method for stabilizing organic compounds by means of the stabilizing compounds, and to the use of the stabilizing compounds to stabilize organic materials.

Anti-oxidant compounds and compositions
11142695 · 2021-10-12 ·

Trisubstituted triazine antioxidants.

Anti-oxidant compounds and compositions
11142695 · 2021-10-12 ·

Trisubstituted triazine antioxidants.

ALKALI METAL MONOHYDROGEN CYANURATE COMPOUND, CRYSTAL THEREOF, PREPARATION METHOD THEREFOR AND USE THEREOF
20210309673 · 2021-10-07 ·

An alkali metal monohydrogen cyanurate compound of the chemical formula AM(HC.sub.3N.sub.3O.sub.3).nH.sub.2O (specifically such as KLi(HC.sub.3N.sub.3O.sub.3).2H.sub.2O, RbLi(HC.sub.3N.sub.3O.sub.3).2H.sub.2O, RbNa(HC.sub.3N.sub.3O.sub.3).2H.sub.2O) and a nonlinear optical crystal thereof are related to optoelectronic functional materials. Measured using a powder frequency doubling test method, and the powder frequency doubling effect of the nonlinear optical crystal is about 2-3 times that of KH.sub.2PO.sub.4 (KDP). The ultraviolet absorption edge of the nonlinear optical crystal is shorter than 250 nm. The nonlinear optical crystal can achieve the harmonic generator of double, triple, or quadruple frequency for Nd:YAG (λ=1.064 μm). Moreover, the nonlinear optical crystal is of a single crystalline structure, is colorless and transparent, and does not deliquesce in air.

RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

A resist underlayer composition includes a polymer including a structural unit represented by Chemical Formula 1, and a solvent. A method of forming patterns uses the resist underlayer composition under a photoresist pattern to enhance the sensitivity of the photoresist to an exposure light source, thereby providing enhanced resolution and faster processing times.

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RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

A resist underlayer composition includes a polymer including a structural unit represented by Chemical Formula 1, and a solvent. A method of forming patterns uses the resist underlayer composition under a photoresist pattern to enhance the sensitivity of the photoresist to an exposure light source, thereby providing enhanced resolution and faster processing times.

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