A composition comprising a polyphenol compound (B), wherein the polyphenol compound (B) is one or more selected from the group consisting of a compound represented by the following formula (1) and a resin having a structure represented by the following formula (2):

##STR00001##

A bis-propylcatechol having a structure represented by formula (1):

##STR00001## wherein R.sup.1 is a divalent aliphatic hydrocarbon group having two or more carbon atoms or a divalent aromatic hydrocarbon group.

The disclosure provides recording materials including aromatic substituted methane-core derivatized monomers and polymers for use in volume Bragg gratings, including, but not limited to, volume Bragg gratings for holography applications. Several structures are disclosed for monomers and polymers for use in Bragg gratings applications leading to materials with higher refractive index, low birefringence, and high transparency. The disclosed derivatized monomers and polymers thereof can be used in any volume Bragg gratings materials, including two-stage polymer materials where a matrix is cured in a first step, and then the volume Bragg grating is written by way of a second curing step of a monomer.

A corrosion resistant material is described including a substrate, a first material including less than about 90% of an amino group or epoxy group, between about 0.05% and about 50% siloxane, between about 5% and about 80% nanoparticles, microparticles, or macroparticles, and between about 0.1% and about 5% of a first functionalized graphitic material, a second material including less than about 90% of a silyl group, between about 0.05% and about 50% siloxane, between about 5% and about 80% nanoparticles, microparticles, or macroparticles, and between about 0.1% and about 5% of a second functionalized graphitic material, and a third material including less than about 90% of an amino group or epoxy group and a silyl group, between about 0.05% and about 50% siloxane, between about 5% and about 80% nanoparticles, microparticles, or macroparticles, and between about 0.1% and about 5% of a third functionalized graphitic material.

A corrosion resistant material is described including a substrate, a first material including less than about 90% of an amino group or epoxy group, between about 0.05% and about 50% siloxane, between about 5% and about 80% nanoparticles, microparticles, or macroparticles, and between about 0.1% and about 5% of a first functionalized graphitic material, a second material including less than about 90% of a silyl group, between about 0.05% and about 50% siloxane, between about 5% and about 80% nanoparticles, microparticles, or macroparticles, and between about 0.1% and about 5% of a second functionalized graphitic material, and a third material including less than about 90% of an amino group or epoxy group and a silyl group, between about 0.05% and about 50% siloxane, between about 5% and about 80% nanoparticles, microparticles, or macroparticles, and between about 0.1% and about 5% of a third functionalized graphitic material.

A method of producing an epoxy compound, which comprises reacting hydrogen peroxide with a compound having a carbon-carbon double bond, in the presence of at least one of a tungsten compound and a molybdenum compound; and an onium salt comprising 20 or more carbon atoms and one or more of substituents convertible to a functional group containing an active hydrogen or a salt thereof.

A method of producing an epoxy compound, which comprises reacting hydrogen peroxide with a compound having a carbon-carbon double bond, in the presence of at least one of a tungsten compound and a molybdenum compound; and an onium salt comprising 20 or more carbon atoms and one or more of substituents convertible to a functional group containing an active hydrogen or a salt thereof.

A corrosion resistant material is described including a substrate, a first material including less than about 90% of an amino group or epoxy group, between about 0.05% and about 50% siloxane, between about 5% and about 80% nanoparticles, microparticles, or macroparticles, and between about 0.1% and about 5% of a first functionalized graphitic material, a second material including less than about 90% of a silyl group, between about 0.05% and about 50% siloxane, between about 5% and about 80% nanoparticles, microparticles, or macroparticles, and between about 0.1% and about 5% of a second functionalized graphitic material, and a third material including less than about 90% of an amino group or epoxy group and a silyl group, between about 0.05% and about 50% siloxane, between about 5% and about 80% nanoparticles, microparticles, or macroparticles, and between about 0.1% and about 5% of a third functionalized graphitic material.

A corrosion resistant material is described including a substrate, a first material including less than about 90% of an amino group or epoxy group, between about 0.05% and about 50% siloxane, between about 5% and about 80% nanoparticles, microparticles, or macroparticles, and between about 0.1% and about 5% of a first functionalized graphitic material, a second material including less than about 90% of a silyl group, between about 0.05% and about 50% siloxane, between about 5% and about 80% nanoparticles, microparticles, or macroparticles, and between about 0.1% and about 5% of a second functionalized graphitic material, and a third material including less than about 90% of an amino group or epoxy group and a silyl group, between about 0.05% and about 50% siloxane, between about 5% and about 80% nanoparticles, microparticles, or macroparticles, and between about 0.1% and about 5% of a third functionalized graphitic material.

There is provided an epoxy compound whose melt viscosity is low and which exhibits heat resistance and flame retardancy of a cured product; an epoxy resin which includes the same; curable composition and cured product; and semiconductor sealing material. The epoxy compound has a molecular structure represented by the following Formula (I): ##STR00001## in the formula, G represents a glycidyl group, and X represents a structural site represented by the following Structural Formula (x1) or (x2); ##STR00002## in Formula (x1) or (x2), k represents an integer of 1 to 3, m represents 1 or 2, Ar represents a structural site represented by the following Structural Formula (Ar1) or (Ar2), and when k or m represents 2 or greater, a plurality of Ar's may be the same as or different from each other: ##STR00003## in Formula (3) or (4), G represents a glycidyl group, and p and r each independently represent 1 or 2.