An object of the present invention is to provide a chemical liquid purification method which makes it possible to obtain a chemical liquid having excellent defect inhibition performance. Another object of the present invention is to provide a chemical liquid. The chemical liquid purification method according to an embodiment of the present invention is a chemical liquid purification method including obtaining a chemical liquid by purifying a substance to be purified containing an organic solvent, in which a content of the stabilizer in the substance to be purified with respect to the total mass of the substance to be purified is equal to or greater than 0.1 mass ppm and less than 100 mass ppm.

This disclosure relates to the field of molecules having pesticidal utility against pests in Phyla Arthropoda, Mollusca, and Nematoda, processes to produce such molecules, intermediates used in such processes, pesticidal compositions containing such molecules, and processes of using such pesticidal compositions against such pests. These pesticidal compositions may be used, for example, as acaricides, insecticides, miticides, molluscicides, and nematicides. This document discloses molecules having the following formula (“Formula One”). ##STR00001##

This disclosure relates to the field of molecules having pesticidal utility against pests in Phyla Arthropoda, Mollusca, and Nematoda, processes to produce such molecules, intermediates used in such processes, pesticidal compositions containing such molecules, and processes of using such pesticidal compositions against such pests. These pesticidal compositions may be used, for example, as acaricides, insecticides, miticides, molluscicides, and nematicides. This document discloses molecules having the following formula (“Formula One”). ##STR00001##

A radiation-sensitive resin composition includes: a polymer including a structural unit including an acid-labile group; and a compound represented by formula (1). R.sup.1, R.sup.2, and R.sup.3 each independently represent a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms; X.sup.1, X.sup.2, and X.sup.3 each independently represent a group represented by formula (2); a sum of d, e, and f is no less than 1; R.sup.4 represents a hydrocarbon group having 1 to 20 carbon atoms and R.sup.5 represents a hydrocarbon group having 1 to 20 carbon atoms, or R.sup.4 and R.sup.5 taken together represent a heterocyclic structure having 4 to 20 ring atoms, together with the sulfur atom to which R.sup.4 and R.sup.5 bond; n is 0 or 1; A.sup.− represents a monovalent sulfonic acid anion; and Y represents —COO—, —OCO—, or —N(R.sup.7)CO—.

##STR00001##

The present disclosure relates to compounds of Formula (P) or (II′-0): (Formulae (I′), (II′-0)), and pharmaceutically acceptable salts or solvates thereof. The present disclosure also relates to pharmaceutical compositions comprising the compounds and therapeutic and diagnostic uses of the compounds and pharmaceutical compositions.

##STR00001##

The present disclosure relates to compounds of Formula (I), (II), or (II′): (I), (II), (II′), and pharmaceutically acceptable salts or solvates thereof. The present disclosure also relates to pharmaceutical compositions comprising the compounds and therapeutic and diagnostic uses of the compounds and pharmaceutical compositions.

##STR00001##

The present disclosure relates to compounds of Formula (I), (II), or (II′): (I), (II), (II′), and pharmaceutically acceptable salts or solvates thereof. The present disclosure also relates to pharmaceutical compositions comprising the compounds and therapeutic and diagnostic uses of the compounds and pharmaceutical compositions.

##STR00001##

An object of the present invention is to provide a lactone compound having excellent water stability.

Provided is a lactone compound represented by Formula (I).

##STR00001##

In Formula (I), R.sup.1 and R.sup.2 each independently represent a substituent which does not have a dissociative proton and has a Hammett's substituent constant σp value of −0.90 or more and −0.03 or less. R.sup.3 represents a substituent which does not have a dissociative proton and has a Hammett's substituent constant σp value of −0.90 or more and −0.03 or less, or a hydrogen atom. Y represents a substituent and n represents an integer of 1 to 4. In a case where n is an integer of 2 to 4, a plurality of Y's may be the same substituent or substituents different from each other.

Electrolytes and electrolyte additives for energy storage devices comprising dihydrofuranone based compounds are disclosed. The energy storage device comprises a first electrode and a second electrode, wherein at least one of the first electrode and the second electrode is a Si-based electrode, a separator between the first electrode and the second electrode, an electrolyte comprising at least two electrolyte co-solvents, wherein at least one electrolyte co-solvent comprises a dihydrofuranone based compound.

Electrolytes and electrolyte additives for energy storage devices comprising dihydrofuranone based compounds are disclosed. The energy storage device comprises a first electrode and a second electrode, wherein at least one of the first electrode and the second electrode is a Si-based electrode, a separator between the first electrode and the second electrode, an electrolyte comprising at least two electrolyte co-solvents, wherein at least one electrolyte co-solvent comprises a dihydrofuranone based compound.