Patent classifications
C07D317/50
Stilbene derivative and preparation method thereof
A stilbene derivative, which is a compound of the following general formula I or general formula II, or an acceptable salt formed by the compound of the general formula I or the general formula II and an inorganic or organic acid; ##STR00001## wherein, in the general formula I or the general formula II, the atom represented by X is a hydrogen atom or a halogen atom; the substituent represented by R is C1-C6 alkyl, 1-6-membered heteroalkyl, C2-C4 alkenyl, C2-C4 alkynyl, C3-C6 cycloalkyl, substituted C3-C6 cycloalkyl, 3-6-membered heterocycloalkyl, substituted 3-6-membered heterocycloalkyl, 5-18-membered aryl, substituted 5-18-membered aryl, 5-18-membered heteroaryl, or substituted 5-18-membered heteroaryl.
METHOD FOR THE METAL-FREE PREPARATION OF A BIARYL BY A PHOTOSPLICING REACTION AND THEIR USES
The present invention relates to a method for the metal-free preparation of a biaryl compound by a photosplicing reaction and its use in the preparation of chemical compounds, preferably of active ingredients e.g. in the fields of pharmaceuticals and agrochemicals. In particular, it refers to a method for the regiocontrolled preparation of a biaryl compound of formula (I): ArAr by photochemically reacting a precursor compound of formula (II): ArLAr to form a biaryl compound of general formula: ArLAr(II).fwdarw.ArAr (I) wherein Ar and Ar, independently of each other, represent an unsubstituted or substituted C6-C20 aryl group or a heteroaryl group with 5-20 ring atoms selected from carbon, nitrogen, oxygen and sulfur, and L represents a group XYZ as defined herein. The biaryl compounds are generally suitable as intermediates or key building blocks in a very broad spectrum of organic chemical syntheses and their respective utilities. Their use within the field of synthesis of active ingredients is an aspect of the invention, and their use in the preparation of pharmaceutically active ingredients is particularly preferred.
METHOD FOR THE METAL-FREE PREPARATION OF A BIARYL BY A PHOTOSPLICING REACTION AND THEIR USES
The present invention relates to a method for the metal-free preparation of a biaryl compound by a photosplicing reaction and its use in the preparation of chemical compounds, preferably of active ingredients e.g. in the fields of pharmaceuticals and agrochemicals. In particular, it refers to a method for the regiocontrolled preparation of a biaryl compound of formula (I): ArAr by photochemically reacting a precursor compound of formula (II): ArLAr to form a biaryl compound of general formula: ArLAr(II).fwdarw.ArAr (I) wherein Ar and Ar, independently of each other, represent an unsubstituted or substituted C6-C20 aryl group or a heteroaryl group with 5-20 ring atoms selected from carbon, nitrogen, oxygen and sulfur, and L represents a group XYZ as defined herein. The biaryl compounds are generally suitable as intermediates or key building blocks in a very broad spectrum of organic chemical syntheses and their respective utilities. Their use within the field of synthesis of active ingredients is an aspect of the invention, and their use in the preparation of pharmaceutically active ingredients is particularly preferred.
Resist composition, method of forming resist pattern, compound, and acid diffusion-controlling agent
A resist composition that contains a base material component exhibiting changed solubility in a developing solution under action of acid and a compound (D0) represented by General Formula (d0), in which R.sup.01, R.sup.02, R.sup.03, and R.sup.04 each independently represents a hydrogen atom, a hydroxy group, a halogen atom, or an alkyl group; alternatively, R.sup.01 and R.sup.02, R.sup.02 and R.sup.03, or R.sup.03 and R.sup.04 are bonded to each other to form an aromatic ring; R.sup.05 represents a hydrogen atom or an alkyl group; Y represents a group that forms an alicyclic group together with a carbon atom *C; provided that at least one of the carbon atoms that form the alicyclic group is substituted with an ether bond, a thioether bond, a carbonyl group, a sulfinyl group, or a sulfonyl group; m represents an integer of 1 or more, and M.sup.m+ represents an m-valent organic cation. ##STR00001##
Resist composition, method of forming resist pattern, compound, and acid diffusion-controlling agent
A resist composition that contains a base material component exhibiting changed solubility in a developing solution under action of acid and a compound (D0) represented by General Formula (d0), in which R.sup.01, R.sup.02, R.sup.03, and R.sup.04 each independently represents a hydrogen atom, a hydroxy group, a halogen atom, or an alkyl group; alternatively, R.sup.01 and R.sup.02, R.sup.02 and R.sup.03, or R.sup.03 and R.sup.04 are bonded to each other to form an aromatic ring; R.sup.05 represents a hydrogen atom or an alkyl group; Y represents a group that forms an alicyclic group together with a carbon atom *C; provided that at least one of the carbon atoms that form the alicyclic group is substituted with an ether bond, a thioether bond, a carbonyl group, a sulfinyl group, or a sulfonyl group; m represents an integer of 1 or more, and M.sup.m+ represents an m-valent organic cation. ##STR00001##
NOVEL STILBENE DERIVATIVE AND PREPARATION METHOD THEREOF
A stilbene derivative, which is a compound of the following general formula I or general formula II, or an acceptable salt formed by the compound of the general formula I or the general formula II and an inorganic or organic acid;
##STR00001## wherein, in the general formula I or the general formula II, the atom represented by X is a hydrogen atom or a halogen atom; the substituent represented by R is C1-C6 alkyl, 1-6-membered heteroalkyl, C2-C4 alkenyl, C2-C4 alkynyl, C3-C6 cycloalkyl, substituted C3-C6 cycloalkyl, 3-6-membered heterocycloalkyl, substituted 3-6-membered heterocycloalkyl, 5-18-membered aryl, substituted 5-18-membered aryl, 5-18-membered heteroaryl, or substituted 5-18-membered heteroaryl.
NOVEL STILBENE DERIVATIVE AND PREPARATION METHOD THEREOF
A stilbene derivative, which is a compound of the following general formula I or general formula II, or an acceptable salt formed by the compound of the general formula I or the general formula II and an inorganic or organic acid;
##STR00001## wherein, in the general formula I or the general formula II, the atom represented by X is a hydrogen atom or a halogen atom; the substituent represented by R is C1-C6 alkyl, 1-6-membered heteroalkyl, C2-C4 alkenyl, C2-C4 alkynyl, C3-C6 cycloalkyl, substituted C3-C6 cycloalkyl, 3-6-membered heterocycloalkyl, substituted 3-6-membered heterocycloalkyl, 5-18-membered aryl, substituted 5-18-membered aryl, 5-18-membered heteroaryl, or substituted 5-18-membered heteroaryl.
Therapeutic compounds and methods of use thereof
The invention provides compounds that are useful for treating or preventing cancer.
INHIBITORS OF INDOLEAMINE 2,3-DIOXYGENASE AND METHODS OF THEIR USE
There are disclosed compounds that modulate or inhibit the enzymatic activity of indoleamine 2,3-dioxygenase (IDO), pharmaceutical compositions containing said compounds and methods of treating proliferative disorders, such as cancer, viral infections and/or inflammatory disorders utilizing the compounds of the disclosure.
INHIBITORS OF INDOLEAMINE 2,3-DIOXYGENASE AND METHODS OF THEIR USE
There are disclosed compounds that modulate or inhibit the enzymatic activity of indoleamine 2,3-dioxygenase (IDO), pharmaceutical compositions containing said compounds and methods of treating proliferative disorders, such as cancer, viral infections and/or inflammatory disorders utilizing the compounds of the disclosure.