C07D335/16

Light emitting material, manufacture method thereof and organic light emitting diode using the light emitting material

A method for manufacturing a light emitting material of the constitutional formula ##STR00001##
is provided. The structure is unitary, and the formula weight is determined, and the better solubility and film formation are provided, and the thin film status is stable; it possesses a very high decomposition temperature and a lower sublimation temperature, and is easy to sublime to be light emitting material of high purity, and can be applied for small molecule organic light emitting diode. In the method for manufacturing the light emitting material, p-bromothiophenol and 4-Bromo-2-fluorobenzonitrile are employed to be starting materials, and an intermediate of the light emitting material is obtained with a series of simple reactions, and finally, the light emitting material is obtained with Ullmann reaction or Suzuki reaction, and these steps are simple and the production is high.

SALT, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Disclosed are a salt represented by formula (I), a quencher, and a resist composition including the same:

##STR00001##

SALT, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Disclosed are a salt represented by formula (I), a quencher, and a resist composition including the same:

##STR00001##

SALT, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Disclosed are a salt represented by formula (1), and a quencher and a resist composition comprising the same:

##STR00001##

wherein R.sup.1, R.sup.2 and R.sup.3 each independently represent a halogen atom, an alkyl fluoride group having 1 to 6 carbon atoms or a hydrocarbon group having 1 to 18 carbon atoms, and CH.sub.2 included in the hydrocarbon group may be replaced by O or CO, m1, m2 and m3 represent an integer of 0 to 4, and when m1, m2 and/or m3 are 2 or more, a plurality of R.sup.1, a plurality of R.sup.2 and/or a plurality of R.sup.3 may be the same or different from each other, and X.sup.1 represents CO, SO or SO.sub.2.

SALT, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Disclosed are a salt represented by formula (1), and a quencher and a resist composition comprising the same:

##STR00001##

wherein R.sup.1, R.sup.2 and R.sup.3 each independently represent a halogen atom, an alkyl fluoride group having 1 to 6 carbon atoms or a hydrocarbon group having 1 to 18 carbon atoms, and CH.sub.2 included in the hydrocarbon group may be replaced by O or CO, m1, m2 and m3 represent an integer of 0 to 4, and when m1, m2 and/or m3 are 2 or more, a plurality of R.sup.1, a plurality of R.sup.2 and/or a plurality of R.sup.3 may be the same or different from each other, and X.sup.1 represents CO, SO or SO.sub.2.

Aryl acetate onium materials

Acid generators comprising a carbocyclic aryl or heteroaromatic group substituted with at least one acetate moiety are provided. These acid generators are particularly useful as a photoresist composition component.

Aryl acetate onium materials

Acid generators comprising a carbocyclic aryl or heteroaromatic group substituted with at least one acetate moiety are provided. These acid generators are particularly useful as a photoresist composition component.

Photocuring method, compound and composition used therein

An object of the present invention is to provide a photocuring method, which makes it possible to rapidly and efficiently obtain a crosslinked product (resin), a compound used in the photocuring method, and a photocuring resin composition containing the compound. The present invention relates to a photocuring method, which comprises a step 1 and a step 2 performed after the step 1, a compound used in the photocuring method, and a photocuring resin composition containing the compound. Step 1: this is a step in which in the presence of (A) compound having a carbonyl group generating a radical by photoirradiation and a carboxyl group decarboxylated by photoirradiation, (B) silane coupling agent having a mercapto group or a (meth)acryl group is reacted with (C) water under acidic conditions to obtain (D) silane compound having a mercapto group or a (meth)acryl group and at least one silanol group. Step 2: this is a step in which in the presence of the compound (A) and (E) compound having a carbonyl group generating a radical by photoirradiation and a group generating a base by being decarboxylated by photoirradiation, the compound (A) and the compound (E) are irradiated with light to create alkaline conditions in a reaction system by decarboxylating the carboxyl group of the compound (A) and generating a base from the compound (E), and radicals are generated from the compound (A) and the compound (E) to generate a crosslinked product containing a constitutional unit derived from the silane compound (D) from the silane compound (D) and, if necessary, from (F) compound having two or more polymerizable unsaturated groups.

Photocuring method, compound and composition used therein

An object of the present invention is to provide a photocuring method, which makes it possible to rapidly and efficiently obtain a crosslinked product (resin), a compound used in the photocuring method, and a photocuring resin composition containing the compound. The present invention relates to a photocuring method, which comprises a step 1 and a step 2 performed after the step 1, a compound used in the photocuring method, and a photocuring resin composition containing the compound. Step 1: this is a step in which in the presence of (A) compound having a carbonyl group generating a radical by photoirradiation and a carboxyl group decarboxylated by photoirradiation, (B) silane coupling agent having a mercapto group or a (meth)acryl group is reacted with (C) water under acidic conditions to obtain (D) silane compound having a mercapto group or a (meth)acryl group and at least one silanol group. Step 2: this is a step in which in the presence of the compound (A) and (E) compound having a carbonyl group generating a radical by photoirradiation and a group generating a base by being decarboxylated by photoirradiation, the compound (A) and the compound (E) are irradiated with light to create alkaline conditions in a reaction system by decarboxylating the carboxyl group of the compound (A) and generating a base from the compound (E), and radicals are generated from the compound (A) and the compound (E) to generate a crosslinked product containing a constitutional unit derived from the silane compound (D) from the silane compound (D) and, if necessary, from (F) compound having two or more polymerizable unsaturated groups.

ORGANIC OPTICAL MATERIAL

Provided is a novel donor-acceptor type compound which emits light even in a solid state. The present invention provides an organic optical material comprising a complex formed from (1) a conjugated molecule having (a) at least one electron donating site, (b) at least one electron accepting site, and (c) at least one conjugated site in the same molecule and (2) a compound having a proton donating property or an electron pair accepting property, the complex having a non-covalent interaction at the electron accepting site, wherein the complex is solid at ordinary temperature; and the organic optical material has a property of emitting light having a maximum fluorescence wavelength which causes a Stokes shift having a value corresponding to 5% or more of the value of a maximum absorption wavelength from the maximum absorption wavelength toward the long wavelength side.